公开(公告)号：EP0513080A1

公开(公告)日：1992-11-19

申请号：EP91903029.0

申请日：1991-01-31

申请人： QUEDLINBURGER FORTECH GMBH ,  FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. ,  VON ARDENNE ANLAGENTECHNIK GMBH

发明人： GABER, Klaus ,  PANZER, Siegfried ,  SCHMIDT, Jörg ,  SCHILLER, Siegfried ,  KÜHN, Gerhard ,  SCHOLZE, Friederun ,  ELLERT, Harald ,  LINDNER, Kerstin ,  SCHOLZE, Thomas ,  PFLAUMBAUM, Joachim ,  BURTH, Ulrich ,  GREILICH, Jörg

IPC分类号： A01C1 ,  G21K5 ,  H01J37

CPC分类号： G21K5/10 ,  A01C1/00 ,  H01J37/18

摘要： Un procédé et un dispositif permettent de traiter des matériaux en vrac par des faisceaux électroniques. Le matériau en vrac est dosé pour obtenir un flux continu au moyen d'étages de compression (3) se prêtant au vide, dispersé dans une chambre d'irradiation dosée (1), guidé en chute libre à travers un champ d'irradiation (11) et évacué de la chambre d'irradiation (1) par un système d'étages de compression (4). On peut ainsi traiter par des faisceaux électroniques des matériaux biologiques de manière particulièrement avantageuse, afin de détruire par example des parasites de semences.

公开(公告)号：EP0710429B1

公开(公告)日：1999-06-23

申请号：EP94920881.3

申请日：1994-07-13

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： KIRCHHOFF, Volker ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried ,  GOEDICKE, Klaus

IPC分类号： H05H1/46 ,  H01J37/32

CPC分类号： H01J37/32018 ,  H01J37/32036 ,  H05H1/46

摘要： The generator must be statically and dynamically matched to the electrodes in the high power and frequency range in order to perform dipolar low-pressure glow processes. The prior art processes either require considerable complexity or are not usable in the range. According to the invention, the operating time during the positive and/or negative half-wave is controlled in such a way that no power is fed to the glow device, at least during the time of a part of a negative and/or positive half-wave. The invention is applicable to plasma surface treatment, the separation of layers from the plasma and plasma-enhanced surface cleaning.

公开(公告)号：EP0755461B1

公开(公告)日：1997-11-05

申请号：EP95915754.6

申请日：1995-04-07

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  GOEDICKE, Klaus ,  SCHILLER, Siegfried ,  RESCHKE, Jonathan ,  MORGNER, Henry ,  MILDE, Falk ,  FIETZKE, Fred

IPC分类号： C23C14/32 ,  H01J37/32

CPC分类号： H01J37/32422 ,  C23C14/32 ,  C23C14/562 ,  H01J37/32706

摘要： The process and appropriate device is designed to facilitate the coating at a high rate of large-area electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings comparatively economically. The substrates are primarily strip-like and are especially plastic foils more than a metre wide. According to the invention, negative and positive voltage pulses are alternately applied in a prior art vacuum coating device to the electrically conductive substrate or, in the case of electrically insulating substrates, to an electrode arranged behind it, e.g. the cooling roller, relative to the plasma or to an electrode at approximately plasma potential. The shape, voltage and duration of the pulses is suitable for the coating purpose and the material. The process is particularly suitable for applying wear and corrosion protection and barrier coatings for use, for example, in the packaging industry.

公开(公告)号：EP0725843A1

公开(公告)日：1996-08-14

申请号：EP94929464.0

申请日：1994-10-11

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： GOEDICKE, Klaus ,  SCHEFFEL, Bert ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried ,  KIRCHHOFF, Volker ,  WERNER, Torsten

IPC分类号： C23C14 ,  H01J37

CPC分类号： C23C14/562 ,  C23C14/24 ,  C23C14/30 ,  H01J37/3053

摘要： A process and system for plasma-activated electron-beam vaporisation are disclosed. Known processes are not suitable to achieve very high coating rates under an intensive plasma influence. The spectrum of materials capable of being deposited should be very large, even in the case of insulating layers. The efficiency of the process should be high. According to the invention, the material to be vaporised is vaporised by means of electron beams (71) from at least two vaporisation crucibles (1; 1). An electric voltage is applied to the vaporisation crucibles, so that their vapour-generating areas act as electrodes of an electric discharge. The material to be vaporised acts as a cathode or anode. The vaporisation crucibles (1; 1) are connected to earth potential through ohmic resistances (R1; R2). This process and system are preferably suitable for reactive coating large surfaces, as well as for reactive coating components, tools and steel strips (substrate 3).

公开(公告)号：EP0632846A1

公开(公告)日：1995-01-11

申请号：EP93905159.0

申请日：1993-03-03

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： GOEDICKE, Klaus ,  METZNER, Christoph ,  SCHMIDT, Jörg ,  HEISIG, Ullrich ,  SCHILLER, Siegfried ,  RESCHKE, Jonathan

IPC分类号： C23C14 ,  C23C16

CPC分类号： C23C14/223 ,  C23C14/22

摘要： An arrangement is disclosed for coating small parts, such as scres and bolts, in a highly efficient manner as bulk goods, by high-vacuum metallizing or by vacuum sputtering, also under the effect of a plasma. A drum (1) that rotates at a high speed around a horizontal axis and upon whose inner wall the parts to be coated are held by centrifugal force is arranged inside a container. The surface of the inner wall is designed so that the parts to be coated (3) are securely held and moved together with the wall. Coating means are arranged in the drum. A scraper device (4), whose spacing from the inner wall can be adjusted at programmable time intervals, is provided in the drum and its contact surface is oriented in the direction opposite to the direction of rotation.

公开(公告)号：EP0581774A1

公开(公告)日：1994-02-09

申请号：EP92904217.0

申请日：1992-02-04

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： SCHILLER, Siegfried ,  NEUMANN, Manfred ,  ZEISSIG, Gerhard ,  MORGNER, Henry

IPC分类号： C23C14

CPC分类号： C23C14/30 ,  C23C14/10

摘要： L'invention concerne un procédé et une installation pour le dépôt de couches de SiOx sur un substrat par évaporation de SiO2 avec utilisation d'un évaporateur linéaire à faisceau d'électrons à piège magnétique, consistant en ce que le faisceau d'électrons est guidé vers le produit à évaporer le long d'une ligne de déflexion parallèle à l'axe longitudinal du piège magnétique et défléchi de manière discontinue le long de la ligne de déflexion, de telle manière qu'il se forme une série de points d'évaporation (5) à densité de puissance élevée, le champ magnétique entre le produit à évaporer et le substrat à revêtir atteignant une valeur maximum de densité de flux magnétique de 50 à 100 G et le produit de l'écart et de la densité de flux magnétique moyenne entre le produit à évaporer et le substrat représentant au moins 15 G x m.

公开(公告)号：EP0666934B1

公开(公告)日：1997-03-26

申请号：EP93918891.8

申请日：1993-08-18

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： SCHILLER, Siegfried ,  KIRCHHOFF, Volker ,  ZEISSIG, Gerhard ,  SCHILLER, Nicolas ,  GOEDICKE, Klaus ,  NEUMANN, Manfred

IPC分类号： C23C14/54 ,  C23C14/32

CPC分类号： C23C14/54 ,  C23C14/0021

摘要： Measurements of certain non-optical properties, in particular mechanical properties, during the industrial production of layers, enabling said layers to be reproducibly formed, in particular when the hardness, wear resistance and barrier effect required are high, cannot be carried out in situ. The values of the optical layer properties are to be used as regulating signals. Immediately after the substrate runs through the vaporisation zone, the reflection and/or transmission and the absorption capacity in the wavelength range Δμ = 150 nm to 800 nm are measured, and the refraction index and the optical absorption coefficient are derived therefrom. The thus determined values are compared with an experimentally determined set value. A regulating signal derived therefrom regulates the plasma at a constant reactive gas partial pressure and maintains constant the optical properties of the layer. This process is useful for vaporising wear-resistant, hard layers or barrier layers, for example metal oxide layers, on glass, plastics and other materials; for example in the building industry fo manufacturing glass for façades, and in the packaging industry.

公开(公告)号：EP0664839B1

公开(公告)日：1996-03-27

申请号：EP93918892.6

申请日：1993-08-18

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： KIRCHHOF, Volker ,  METZNER, Christoph ,  GOEDICKE, Klaus ,  SCHILLER, Siegfried ,  KERN, Heinz

IPC分类号： C23C14/54 ,  C23C14/30

CPC分类号： C23C14/544 ,  C23C14/30

摘要： A process and arrangement are disclosed for stabilising an electron-beam vaporisation process, so that locally homogeneous layers having constant properties, in particular in long-time operation, are obtained. The intensity of at least one spectral line of the vapour generated by the electron-gun and if required the intensity of the radiation emitted by the reactive gas are detected at at least two sites in the vapour propagation chamber and at least in one area of the surface of the vaporised material. The signal thus obtained is further processed for regulating the parameters of the electron-gun. The process is preferably used for improving the surface of semi-finished products and finished parts, for example in metallurgy, machine construction, optics, packaging and glass industries.

公开(公告)号：EP0666934A1

公开(公告)日：1995-08-16

申请号：EP93918891.0

申请日：1993-08-18

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： SCHILLER, Siegfried ,  KIRCHHOFF, Volker ,  ZEISSIG, Gerhard ,  SCHILLER, Nicolas ,  GOEDICKE, Klaus ,  NEUMANN, Manfred

IPC分类号： C23C14

CPC分类号： C23C14/54 ,  C23C14/0021

摘要： Measurements of certain non-optical properties, in particular mechanical properties, during the industrial production of layers, enabling said layers to be reproducibly formed, in particular when the hardness, wear resistance and barrier effect required are high, cannot be carried out in situ. The values of the optical layer properties are to be used as regulating signals. Immediately after the substrate runs through the vaporisation zone, the reflection and/or transmission and the absorption capacity in the wavelength range DELTA lambda = 150 nm to 800 nm are measured, and the refraction index and the optical absorption coefficient are derived therefrom. The thus determined values are compared with an experimentally determined set value. A regulating signal derived therefrom regulates the plasma at a constant reactive gas partial pressure and maintains constant the optical properties of the layer. This process is useful for vaporising wear-resistant, hard layers or barrier layers, for example metal oxide layers, on glass, plastics and other materials; for example in the building industry fo manufacturing glass for façades, and in the packaging industry.

公开(公告)号：EP0631666A1

公开(公告)日：1995-01-04

申请号：EP93905160.0

申请日：1993-03-03

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： PANZER, Siegfried ,  SCHILLER, Siegfried ,  SCHILLER, Nicolas

IPC分类号： G01N23 ,  G01N33

CPC分类号： G01N33/206