公开(公告)号：EP0734459A1

公开(公告)日：1996-10-02

申请号：EP95901341.0

申请日：1994-11-22

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： KIRCHHOFF, Volker ,  GOEDICKE, Klaus ,  NEUMANN, Manfred ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried

IPC分类号： H05H1 ,  C23C14

CPC分类号： C23C14/32

摘要： The object of the invention is to achieve a high and stable deposition rate over a long period of time in order to apply preferably reactive layers of electrically insulating compounds. Reactivity, energetic activation and layer composition and structure should be regulated and kept constant by acting on the plasma density. For that purpose, vapour propagates from the vaporiser (1) through a plasma produced between electrodes (1, 1') and interacts therewith. The electrodes are made of a material to be vaporised or of a component and/or doting material of the layer to be applied. The plasma is maintained in the vapour of the material to be vaporised and/or in an inert gas. This process is suitable for improving the surface of semi-finished products and assembly units, in particular for applying oxide layers with barrier effect on plastic foils in the packaging industry.

公开(公告)号：EP0755461B1

公开(公告)日：1997-11-05

申请号：EP95915754.6

申请日：1995-04-07

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  GOEDICKE, Klaus ,  SCHILLER, Siegfried ,  RESCHKE, Jonathan ,  MORGNER, Henry ,  MILDE, Falk ,  FIETZKE, Fred

IPC分类号： C23C14/32 ,  H01J37/32

CPC分类号： H01J37/32422 ,  C23C14/32 ,  C23C14/562 ,  H01J37/32706

摘要： The process and appropriate device is designed to facilitate the coating at a high rate of large-area electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings comparatively economically. The substrates are primarily strip-like and are especially plastic foils more than a metre wide. According to the invention, negative and positive voltage pulses are alternately applied in a prior art vacuum coating device to the electrically conductive substrate or, in the case of electrically insulating substrates, to an electrode arranged behind it, e.g. the cooling roller, relative to the plasma or to an electrode at approximately plasma potential. The shape, voltage and duration of the pulses is suitable for the coating purpose and the material. The process is particularly suitable for applying wear and corrosion protection and barrier coatings for use, for example, in the packaging industry.

公开(公告)号：EP0581774A1

公开(公告)日：1994-02-09

申请号：EP92904217.0

申请日：1992-02-04

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： SCHILLER, Siegfried ,  NEUMANN, Manfred ,  ZEISSIG, Gerhard ,  MORGNER, Henry

IPC分类号： C23C14

CPC分类号： C23C14/30 ,  C23C14/10

摘要： L'invention concerne un procédé et une installation pour le dépôt de couches de SiOx sur un substrat par évaporation de SiO2 avec utilisation d'un évaporateur linéaire à faisceau d'électrons à piège magnétique, consistant en ce que le faisceau d'électrons est guidé vers le produit à évaporer le long d'une ligne de déflexion parallèle à l'axe longitudinal du piège magnétique et défléchi de manière discontinue le long de la ligne de déflexion, de telle manière qu'il se forme une série de points d'évaporation (5) à densité de puissance élevée, le champ magnétique entre le produit à évaporer et le substrat à revêtir atteignant une valeur maximum de densité de flux magnétique de 50 à 100 G et le produit de l'écart et de la densité de flux magnétique moyenne entre le produit à évaporer et le substrat représentant au moins 15 G x m.

公开(公告)号：EP0870070B1

公开(公告)日：2000-05-31

申请号：EP96946089.8

申请日：1996-12-13

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  SCHILLER, Siegfried ,  MORGNER, Henry ,  SCHILLER, Nicolas ,  STRAACH, Steffen

IPC分类号： C23C14/06 ,  C23C14/00 ,  B65G11/00

CPC分类号： C23C14/08 ,  C23C14/0021 ,  C23C14/32 ,  Y10T428/31663

摘要： According to the invention, in plasma-activated high-rate evaporation of an oxide former, monomers are applied in addition to oxygen in such a way that the evaporated oxide formers and the oxygen and the monomers have a preferential direction on the substrate and pass through a high-density plasma zone. More than 50 wt % of the coating on the substrate consists of inorganic molecules and under 50 wt % of partially cross-linked organic molecules. The process is used for packaging, window glazing, mirrors, decorative surfaces or façade linings.

公开(公告)号：EP0870070A2

公开(公告)日：1998-10-14

申请号：EP96946089.0

申请日：1996-12-13

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  SCHILLER, Siegfried ,  MORGNER, Henry ,  SCHILLER, Nicolas ,  STRAACH, Steffen

IPC分类号： C23C14

CPC分类号： C23C14/08 ,  C23C14/0021 ,  C23C14/32 ,  Y10T428/31663

摘要： According to the invention, in plasma-activated high-rate evaporation of an oxide former, monomers are applied in addition to oxygen in such a way that the evaporated oxide formers and the oxygen and the monomers have a preferential direction on the substrate and pass through a high-density plasma zone. More than 50 wt % of the coating on the substrate consists of inorganic molecules and under 50 wt % of partially cross-linked organic molecules. The process is used for packaging, window glazing, mirrors, decorative surfaces or façade linings.

公开(公告)号：EP0755461A1

公开(公告)日：1997-01-29

申请号：EP95915754.0

申请日：1995-04-07

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  GOEDICKE, Klaus ,  SCHILLER, Siegfried ,  RESCHKE, Jonathan ,  MORGNER, Henry ,  MILDE, Falk ,  FIETZKE, Fred

IPC分类号： H05H1 ,  C23C14 ,  H01J37

CPC分类号： H01J37/32422 ,  C23C14/32 ,  C23C14/562 ,  H01J37/32706

摘要： The process and appropriate device is designed to facilitate the coating at a high rate of large-area electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings comparatively economically. The substrates are primarily strip-like and are especially plastic foils more than a metre wide. According to the invention, negative and positive voltage pulses are alternately applied in a prior art vacuum coating device to the electrically conductive substrate or, in the case of electrically insulating substrates, to an electrode arranged behind it, e.g. the cooling roller, relative to the plasma or to an electrode at approximately plasma potential. The shape, voltage and duration of the pulses is suitable for the coating purpose and the material. The process is particularly suitable for applying wear and corrosion protection and barrier coatings for use, for example, in the packaging industry.

公开(公告)号：EP0581774B1

公开(公告)日：1994-11-02

申请号：EP92904217.4

申请日：1992-02-04

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： SCHILLER, Siegfried ,  NEUMANN, Manfred ,  ZEISSIG, Gerhard ,  MORGNER, Henry

IPC分类号： C23C14/30 ,  C23C14/10 ,  C23C14/54

CPC分类号： C23C14/30 ,  C23C14/10

摘要： The invention relates to a process and device for depositing SiOx coatings on a substrate by the evaporation of SiO2 using an electron beam linear evaporator with a magnetic trap by guiding the electron beam along a deflection line parallel to the longitudinal axis of the magnetic trap to the material to be evaporated and deflecting it discretely along the deflection line in such a way that a series of evaporation points (5) with a high power density is formed, whereby the magnetic field between the material to be evaporated and the substrate to be coated reaches 50 to 100 G and the product of the distance and the average magnetic flux density between the material to be evaporated and the substrate is at least 15 G x m.

公开(公告)号：EP0734459B1

公开(公告)日：1999-02-03

申请号：EP95901341.8

申请日：1994-11-22

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： KIRCHHOFF, Volker ,  GOEDICKE, Klaus ,  NEUMANN, Manfred ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried

IPC分类号： C23C14/08 ,  C23C14/32 ,  C23C14/35 ,  H01J37/32 ,  H01J37/34

CPC分类号： C23C14/32

摘要： The object of the invention is to achieve a high and stable deposition rate over a long period of time in order to apply preferably reactive layers of electrically insulating compounds. Reactivity, energetic activation and layer composition and structure should be regulated and kept constant by acting on the plasma density. For that purpose, vapour propagates from the vaporiser (1) through a plasma produced between electrodes (1, 1') and interacts therewith. The electrodes are made of a material to be vaporised or of a component and/or doting material of the layer to be applied. The plasma is maintained in the vapour of the material to be vaporised and/or in an inert gas. This process is suitable for improving the surface of semi-finished products and assembly units, in particular for applying oxide layers with barrier effect on plastic foils in the packaging industry.

公开(公告)号：EP0666933B1

公开(公告)日：1996-06-12

申请号：EP93918893.4

申请日：1993-08-18

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  SCHILLER, Siegfried ,  MORGNER, Henry

IPC分类号： C23C14/32 ,  C23C14/30

CPC分类号： C23C14/10 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/3266 ,  H01J2237/3137

摘要： It is known that improved coating properties can be obtained by plasma action in vacuum deposition, especially by vaporisation. Substantially higher coating rates can be attained in vapour deposition, but, with high plasma densities, they result in excessive scattering of the electron beam and reduce the power density. According to the invention, a plasma source, preferably a hollow cathode arc source, is arranged in the immediate vicinity of the substrate. Between the evaporator and the substrate there is a device for generating a magnetic field so that the region of high plasma density is separated from the evaporator and the electron beam by the magnetic field. The boundary field lines of this magnetic field run along an arc curving with respect to the substrate.

公开(公告)号：EP0666933A1

公开(公告)日：1995-08-16

申请号：EP93918893.0

申请日：1993-08-18

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  SCHILLER, Siegfried ,  MORGNER, Henry

IPC分类号： C23C14 ,  H01J37

CPC分类号： C23C14/10 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/3266 ,  H01J2237/3137

摘要： It is known that improved coating properties can be obtained by plasma action in vacuum deposition, especially by vaporisation. Substantially higher coating rates can be attained in vapour deposition, but, with high plasma densities, they result in excessive scattering of the electron beam and reduce the power density. According to the invention, a plasma source, preferably a hollow cathode arc source, is arranged in the immediate vicinity of the substrate. Between the evaporator and the substrate there is a device for generating a magnetic field so that the region of high plasma density is separated from the evaporator and the electron beam by the magnetic field. The boundary field lines of this magnetic field run along an arc curving with respect to the substrate.