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    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
    11.
    发明公开
    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
    一种用于形成薄膜包衣层组合物液浸和方法用于形成光致抗蚀剂图案

    公开(公告)号：EP2315078A1

    公开(公告)日：2011-04-27

    申请号：EP11154169.4

    申请日：2005-01-14

    申请人： JSR Corporation

    发明人： Kimura, Toru ,  Nishimura, Yukio ,  Utaka, Tomohiro ,  Nemoto, Hiroaki ,  Nakamura, Atsushi ,  Chiba, Takashi ,  NAKAGAWA, Hiroki

    IPC分类号： G03F7/11 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    摘要翻译： 提供一种浸没式上层膜的组合物表现出在曝光波长为248nm（KrF受）和193纳米（ARF）足够的透明性，可以形成在光致抗蚀剂的保护膜的薄膜不与所述光致抗蚀剂电影互混，不向水中溶出 液浸曝光过程中使用，以保持稳定的电影，并且可以以对碱性显影液容易地溶解。 这是通过一个透镜和光致抗蚀剂电影之间设置水照射适用于涂层上的光致抗蚀剂膜当液浸曝光装置的使用的所有的组合物，所述组合物包含的树脂形成水稳定的膜中照射并在后续的显影剂溶解， 和含有具有6个或更少碳原子，并且该树脂的一价醇的溶剂包含具有醇羟基侧链上的至少±位置上的碳原子含有氟代基团的树脂组分。

    UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN
    14.
    发明公开
    UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN 审中-公开
    对于产生光浸液和方法最上层的薄膜形成用组合物抗蚀剂结构

    公开(公告)号：EP1708027A1

    公开(公告)日：2006-10-04

    申请号：EP05703585.9

    申请日：2005-01-14

    申请人： JSR Corporation

    发明人： KIMURA, Toru, c/o JSR Corporation ,  NISHIMURA, Yukio, c/o JSR Corporation ,  UTAKA, Tomohiro, c/o JSR Corporation ,  NEMOTO, Hiroaki, JSR Corporation ,  NAKAMURA, Atsushi, c/o JSR Corporation ,  CHIBA, Takashi, c/o JSR Corporation ,  NAKAGAWA, Hiroki, c/o JSR Corporation

    IPC分类号： G03F7/11 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    摘要翻译： 提供一种浸没式上层膜的组合物表现出在曝光波长为248nm（KrF受）和193纳米（ARF）足够的透明性，可以形成在光致抗蚀剂的保护膜的薄膜不与所述光致抗蚀剂电影互混，不向水中溶出 液浸曝光过程中使用，以保持稳定的电影，并且可以以对碱性显影液容易地溶解。 这是通过一个透镜和光致抗蚀剂电影之间设置水照射适用于涂层上的光致抗蚀剂膜当液浸曝光装置的使用的所有的组合物，所述组合物包含的树脂形成水稳定的膜中照射并在后续的显影剂溶解， 和含有具有6个或更少碳原子，并且该树脂的一价醇的溶剂包含具有醇羟基侧链上的至少±位置上的碳原子含有氟代基团的树脂组分。