公开(公告)号：EP0503236A2

公开(公告)日：1992-09-16

申请号：EP92100744.9

申请日：1992-01-17

Applicant: International Business Machines Corporation

Inventor： Batchelder, John Samuel ,  Hobbs, Philip Charles Danby ,  Taubenblatt, Marc Alan

IPC: G01N21/55 ,  G02B21/00 ,  H01L21/66 ,  G01N21/88 ,  G02B3/00

CPC classification number: G01N21/9505 ,  G01J3/44 ,  G01J2003/421 ,  G01J2009/0207 ,  G01N21/3563 ,  G01N21/359 ,  G01N2021/1725 ,  G01N2021/1782 ,  G01N2021/8822 ,  G01N2201/0638 ,  G01N2201/1087 ,  G02B3/00 ,  G02B21/0016

Abstract: Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers (110) uses an optical device (112) made from a material having a high index of refraction and held in very close proximity to the wafer (110). The optical device (112) may either be a prism (130) or a plano-convex lens (112). The plano-convex lens (112) may be held in contact with the wafer (110) or separated from the wafer via an air bearing (112') or an optical coupling fluid (214) to allow the sample to be navigated beneath the lens (112). The lens (112) may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.

Abstract translation: 装置和用于在半导体的内部特征的近红外执行高分辨率光学成像（晶片（110）的方法，使用从具有折射指数高的材料制成并保持在非常靠近晶片光学装置（112） 110）。 所述光学装置（112）可以是任一棱镜（130）或一个平凸透镜（112）。 的平凸透镜（112）可以在与晶片（110）保持接触或经由空气轴承（112“）上或在光学耦合流体（214）从该晶片分离，以允许样品被导航透镜下方 （112）。 所述透镜（112）可以以多种光学仪器的使用：诸如亮视野显微镜，一个纹影显微镜，暗场显微镜，林尼克干涉仪，拉曼光谱仪，并吸收分光。

公开(公告)号：EP0163466B1

公开(公告)日：1990-09-05

申请号：EP85303510.3

申请日：1985-05-20

Applicant: THERMA-WAVE INC.

Inventor： Rosencwaig, Allan ,  Opsal, Jon

IPC: G01B11/06 ,  G01N21/17 ,  G01N25/00 ,  G01B17/00 ,  G01N29/00

CPC classification number: G01N21/1702 ,  G01B11/0658 ,  G01N21/21 ,  G01N21/55 ,  G01N25/72 ,  G01N2201/1087

公开(公告)号：EP0319797A3

公开(公告)日：1990-05-23

申请号：EP88119684.4

申请日：1988-11-25

Applicant: MITSUI MINING & SMELTING CO., LTD.

Inventor： Moriya, Kazuo

IPC: G01N21/88 ,  G06T7/60

CPC classification number: G06T7/0004 ,  G01N21/9505 ,  G01N2021/1785 ,  G01N2021/4735 ,  G01N2021/8887 ,  G01N2201/102 ,  G01N2201/1087 ,  G06T2207/10056 ,  G06T2207/30148

Abstract: A method and apparatus for measuring a defect distribution comprising introducing a narrowed laser beam into an object to be observed, receiving scattering lights generated at the defect portions of the object by a photoelectric conversion element, and measuring automatically the density and density distribution of the defects inside the object on the basis of the output image data of the photoelectric conversion element.

公开(公告)号：EP0163466A3

公开(公告)日：1987-11-04

申请号：EP85303510

申请日：1985-05-20

Applicant: THERMA-WAVE INC.

Inventor： Rosencwaig, Allan ,  Opsal, Jon

IPC: G01B11/06 ,  G01N21/17 ,  G01N25/00 ,  G01B17/00 ,  G01N29/00

CPC classification number: G01N21/1702 ,  G01B11/0658 ,  G01N21/21 ,  G01N21/55 ,  G01N25/72 ,  G01N2201/1087

Abstract: Two independent detection systems are provided for measuring thermal waves generated in a sample (22) by a periodic, localized heating cause by a laser beam (34) modulated by a modulator (32). One detection system generates output signals that are primarily a function of the surface temperature of the sample. The other detection system generates signals that are primarily a function of the integral of the temperature beneath the sample surface. The two independent thermal wave measurements permit analysis of both thickness and compositional variables. Both detection systems are implemented efficiently by one apparatus consisting of an He-Ne laser (50) directing a probe beam (52) through a polarising splitter (54) and a dichroic mirror (36) and the objective (38) of the heating beam (34) onto a spot at the heated spot of the sample (22). The probe beam (52) is reflected at an intensity that depends on the surface temperature and is deflected by an angle that depends on the integral of temperature beneath the surface. The reflected beam passes back to the splitter (54) where it is reflected to a split photodetector (80) from which the differential output indicates integral of temperature and sum output indicates surface temperature to a processor (58) determining thickness and compositional variables therefrom.

公开(公告)号：EP0163466A2

公开(公告)日：1985-12-04

申请号：EP85303510.3

申请日：1985-05-20

Applicant: THERMA-WAVE INC.

Inventor： Rosencwaig, Allan ,  Opsal, Jon

IPC: G01B11/06 ,  G01N21/17 ,  G01N25/00 ,  G01B17/00 ,  G01N29/00

CPC classification number: G01N21/1702 ,  G01B11/0658 ,  G01N21/21 ,  G01N21/55 ,  G01N25/72 ,  G01N2201/1087

Abstract: Two independent detection systems are provided for measuring thermal waves generated in a sample (22) by a periodic, localized heating cause by a laser beam (34) modulated by a modulator (32). One detection system generates output signals that are primarily a function of the surface temperature of the sample. The other detection system generates signals that are primarily a function of the integral of the temperature beneath the sample surface. The two independent thermal wave measurements permit analysis of both thickness and compositional variables. Both detection systems are implemented efficiently by one apparatus consisting of an He-Ne laser (50) directing a probe beam (52) through a polarising splitter (54) and a dichroic mirror (36) and the objective (38) of the heating beam (34) onto a spot at the heated spot of the sample (22). The probe beam (52) is reflected at an intensity that depends on the surface temperature and is deflected by an angle that depends on the integral of temperature beneath the surface. The reflected beam passes back to the splitter (54) where it is reflected to a split photodetector (80) from which the differential output indicates integral of temperature and sum output indicates surface temperature to a processor (58) determining thickness and compositional variables therefrom.

Abstract translation: 提供了用于通过由调制器（32）调制的激光束的原因（34）测量由周期性的，局部加热的样品（22）中产生的热波的两个独立的检测系统。 一个检测系统基因率输出信号并主要是样品的表面温度的函数。 其他检测系统基因率信号并主要是在样品表面下的温度的积分的函数。 在两个独立的热波的测量允许两者的厚度和组成变量的分析。 两个检测系统是由加热束中的一个设备，它包括一个氦氖激光器（50）通过一个极性伊辛分离器（54）和一个二向色镜（36）引导探测光束（52）和所述物镜（38）高效地实现 （34）到设置在样品（22）的加热的点的光点。 探测光束（52）被反射在强度确实取决于表面温度，并且通过在角度偏转那样依赖于温度的积分表面之下。 反射光束传递回在那里被反射到分裂光电检测器（80），从该差分输出指示积分温度和总和输出的分离器（54）指示表面温度到处理器（58）确定的采矿厚岬和组成变量那里从。

公开(公告)号：EP2620762B1

公开(公告)日：2017-02-01

申请号：EP11826797.0

申请日：2011-09-16

Applicant: Olympus Corporation

Inventor： TANABE, Tetsuya

IPC: G02B21/00 ,  G01N15/14 ,  G01N21/64

CPC classification number: G01N21/85 ,  G01N15/1434 ,  G01N21/6452 ,  G01N21/6458 ,  G01N2021/6419 ,  G01N2021/6421 ,  G01N2201/1087 ,  G02B21/0052 ,  G02B21/0076 ,  G02B21/008

公开(公告)号：EP0679325A1

公开(公告)日：1995-11-02

申请号：EP94905056.0

申请日：1994-01-13

Applicant: SCHUTZE, Raimund

Inventor： SCHUTZE, Raimund

IPC: G01N33 ,  C12M1 ,  G01N1 ,  G01N15 ,  G01N21 ,  G02B21 ,  H05H3

CPC classification number: G01N15/0205 ,  C12M41/46 ,  G01N2201/103 ,  G01N2201/1087

Abstract: The description relates to a device for handling, treating and observing small particles, especially biological particles. A first laser (4) generates light beams in a first wavelength range which are focussed by a first optical device (12, 13; 14, 15) and form an optical trap. A slide (22) holds corresponding particles. There is also a light source (17) for observation purposes and observation and recording devices for observing the particles and recording their behaviour. A second laser (3) generates light beams in a second wavelength range which are focussed so that particles on the slide may be treated. The optical devices for the light beams can be positioned and adjusted independently of each other and thus the light beams can be focussed in the same object plane of the slide at the start of treatment and observation independently of their wavelengths.

公开(公告)号：EP0503236A3

公开(公告)日：1995-07-05

申请号：EP92100744.9

申请日：1992-01-17

Applicant: International Business Machines Corporation

Inventor： Batchelder, John Samuel ,  Hobbs, Philip Charles Danby ,  Taubenblatt, Marc Alan

IPC: G01N21/55 ,  G02B21/00 ,  H01L21/66 ,  G01N21/88 ,  G02B3/00

CPC classification number: G01N21/9505 ,  G01J3/44 ,  G01J2003/421 ,  G01J2009/0207 ,  G01N21/3563 ,  G01N21/359 ,  G01N2021/1725 ,  G01N2021/1782 ,  G01N2021/8822 ,  G01N2201/0638 ,  G01N2201/1087 ,  G02B3/00 ,  G02B21/0016

Abstract: Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers (110) uses an optical device (112) made from a material having a high index of refraction and held in very close proximity to the wafer (110). The optical device (112) may either be a prism (130) or a plano-convex lens (112). The plano-convex lens (112) may be held in contact with the wafer (110) or separated from the wafer via an air bearing (112') or an optical coupling fluid (214) to allow the sample to be navigated beneath the lens (112). The lens (112) may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.

Abstract translation: 用于在半导体晶片（110）的内部特征的近红外中执行高分辨率光学成像的设备和方法使用由具有高折射率并保持在非常靠近晶片的材料制成的光学器件（112） 110）。 光学装置（112）可以是棱镜（130）或平凸透镜（112）。 平凸透镜（112）可以通过空气轴承（112'）或光学耦合流体（214）保持与晶片（110）接触或与晶片分离，以允许样品在透镜下方 （112）。 透镜（112）可以用于诸如明场显微镜，Schlieren显微镜，暗场显微镜，Linnik干涉仪，拉曼分光镜和吸收分光镜等多种光学仪器中。

公开(公告)号：EP0263621A2

公开(公告)日：1988-04-13

申请号：EP87308443.8

申请日：1987-09-24

Applicant: Weiser, Sidney

Inventor： Weiser, Sidney

IPC: G01N21/55

CPC classification number: G01N21/55 ,  G01N2201/1045 ,  G01N2201/1087

Abstract: A specific small area of a crystal sample (11) is scanned by a laser beam in a spiral pattern (2a, 2b). The laser beam is reflected different amounts for different beam positions to produce a reflectance pattern indicative of crystallographic orientation. The reflected beam radiation may be determined with a photodetector (12) and the reflectance pattern may be interpreted with circuitry (13) which also controls steering of the beam.

Abstract translation: 晶体样品（11）的具体小区域由激光束在螺旋形图案扫描（2A，2B）。 激光束被反射不同数量的不同的波束位置，产生指示晶体取向的反射率图案。 的反射光束的辐射可以是确定与一个光电检测器（12）和反射率图案开采可与电路（13），因此控制电子束的转向来解释。

公开(公告)号：EP0207485A2

公开(公告)日：1987-01-07

申请号：EP86108894.6

申请日：1986-06-30

Applicant: DIATRON CORPORATION

Inventor： Dandliker, Walter B. ,  Barr, Howard S. ,  Katzenstein, Henry S. ,  Watson, W. Keith R.

IPC: G01N21/64 ,  H04N5/30 ,  G02F1/03 ,  G02B21/16

CPC classification number: G01N21/6408 ,  G01N21/6456 ,  G01N21/6458 ,  G01N2201/1087 ,  G02B21/16

Abstract: A fluorometer for measuring a particular fluorescence emanating from a specimen, including producing a burst of concentrated light energy and directing the concentrated light energy toward the specimen to produce a fluorescence from the specimen including the particular fluorescence. Preferably producing an image of the fluoresence. Detecting the fluorescence and producing a signal in accordance with the fluorescence. Controlling the passage of the image of the fluorescence for detecting within a particular time period so as to optimize the detection of the particular fluorescence. Timing the operation to sequence the detection of the fluorescence within the particular time period after the production of the burst of concentrated light energy. Scanning the fluorescence from the specimen for forming signals representative of the fluorescence from the specimen. Analyzing the signals to enhance the portion of the signal representing the particular fluorescence relative to the portion of the signal.