摘要:
The invention concerns to a method of producing a Fresnel Zone Plate (1) for applications in high energy radiation including the following steps: supply of a substrate (2) transparent for high energy radiation, deposition of a layer (3) of a metal, a metal alloy or a metal compound on a planar surface (4) of the substrate (2), calculating a three dimensional geometrical profile (5) with a mathematical model, setting up a dosage profile (6) for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile (5) and milling a three dimensional geometrical profile (5) with concentric zones into the layer (3) with ion beam lithography by means of focused ion beam.
摘要:
X-ray optical system composed of modules wit thin reflection foils or rectangular small channels. The optical system (3) is composed of minimum 5 segments (2), each segment (2) is assembled from minimum one module (1) and the diagonals of all modules (1) in a segment (2) are always in parallel with the symmetry axis (5) of the segment (2) and the segment (2) is a sector with a central angle from 18° to 72°, in the narrowest part of which is the dysfunctional or "dead"z one (6). The X-ray optical system has this dead zone (6), which can be filled with thin, rotationally symmetric foils (7), laid out in another geometric layout so that a common focus of the whole optical system (3) is formed. The X-ray optical system (3) has individual segments (2) laid out so that the aperture of the X-ray optical system (3) approaches the circular aperture and the symmetry axis (5) of a segment (2) always intersects the optical axis (4) of the optical system (3).
摘要:
In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm.
摘要:
An X-ray system is arranged for providing X-ray exposure to a target volume. The aforesaid X-ray system comprises an X-ray source and at least one focusing lens. The provided exposure is distributed over a volume of the target in a substantially uniform manner.
摘要:
The present invention relates to a monochromator (30) for monochromatizing a beam of γ-photons, x-ray photons having an energy higher than 10 keV or neutrons of an energy below 1 eV, wherein the monochromator (30) comprises a plurality of first (18a, 20a, 22a) and second (18b, 20b, 22b) Laue-crystals and refractive deflection means (24), said refractive deflection means (24) being arranged in series with said first Laue-crystals (18a, 20a, 22a).
摘要:
An X-ray waveguide showing a small propagation loss and having a waveguide mode with its phase controlled is provided. The X-ray waveguide including: a core (404) for guiding an X-ray in a wavelength band that a real part of the refractive index of a material is 1 or less; and a cladding (402, 403) for confining the X-ray in the core, in which: the X-ray is confined in the core by total reflection at a interface between the core and the cladding; in the core multiple materials (405, 406) having different real parts of the refractive index are periodically arranged; and a waveguide mode of the X-ray waveguide is such that the number of antinodes or nodes of an electric field intensity distribution or a magnetic field intensity distribution of the X-ray coincides with the number of periods of the periodic structure in a direction perpendicular to a waveguiding direction of the X-ray in the core.
摘要:
A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.