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    Bit mounting devices
    12.
    发明公开
    Bit mounting devices 有权
    Vorrichtungen zur Montage einesBohrmeißels

    公开(公告)号：EP1967326A2

    公开(公告)日：2008-09-10

    申请号：EP08004113.0

    申请日：2008-03-05

    申请人： Makita Corporation

    发明人： Shibata, Yoshinori

    IPC分类号： B25B23/00

    CPC分类号： B25B23/0035 ,  B25B15/001 ,  B25B23/12 ,  Y10T279/17761 ,  Y10T279/17811 ,  Y10T279/23 ,  Y10T279/29 ,  Y10T279/3406 ,  Y10T279/3481

    摘要： A bit mounting device (10; 30) includes a holder (12) that may be mounted to a spindle of the power tool or may be a part of the spindle. A bit push member (15) is disposed within a bit receiving hole (12b) that is formed in the holder (12) for receiving a tool bit (1). The movement of the operation member (20; 31) is transmitted to the bit push member (15) via a transmission mechanism (14, 15d, 20b; 14, 15d, 31b), so that the tool bit (1) is pushed in a removing direction from the bit receiving hole (12b) by the bit push member (15).

    摘要翻译： 一个安装装置（10; 30）包括一个可安装到动力工具主轴上或可以是主轴的一部分的支架（12）。 位推动构件（15）设置在形成在用于接收工具钻头（1）的保持器（12）中的钻头容纳孔（12b）内。 操作构件（20; 31）的移动通过传动机构（14,15d，20b; 14,15d，31b）传递到钻头推动构件（15），使得工具钻头（1）被推入 通过钻头推动构件（15）从钻头容纳孔（12b）移除的方向。

    WECHSELEINRICHTUNG
    13.
    发明公开
    WECHSELEINRICHTUNG 有权

    公开(公告)号：EP1931938A1

    公开(公告)日：2008-06-18

    申请号：EP06791850.8

    申请日：2006-09-06

    申请人： Carl Zeiss Industrielle Messtechnik GmbH

    发明人： ENDERLE, Eckhard ,  BINDER, Stefan Andre

    IPC分类号： G01B7/00 ,  B23Q11/04

    CPC分类号： G01B21/047 ,  Y10S403/01 ,  Y10T29/51 ,  Y10T279/20 ,  Y10T279/23 ,  Y10T279/26 ,  Y10T279/29 ,  Y10T279/3493 ,  Y10T403/598 ,  Y10T403/599 ,  Y10T403/604 ,  Y10T483/19

    摘要： The present invention relates to a changing device for replaceably holding a sensor, sensing element or tool on a machine or a machine part or a rotating pivoting device on a machine or a machine part, preferably a coordinate measuring device. The changing device has a holding part with a first bearing and a corresponding element (22) with a counter bearing which corresponds to the first bearing (23). A releasable clamping device (25), for example a magnetic clamping device, is provided, by means of which a clamping force is produced between the first and the second bearings (26) when a corresponding element (22) is held in the holding part. A locking device with a first closure element (29) is provided on the holding part and a corresponding element, for example in the form of a slide (30), which corresponds to the closure element (29) of the holding part is provided on the corresponding element (22). By means of the locking device, the corresponding element can be mechanically coupled to the holding part in the state in which it is held on the holding part. The closure element (29) has a joint (31), and a securing element (33) in the form of a cable which is prestressed by a compression spring (35) is provided, by means of which a separation of the separating surface (31) is limited to a predetermined distance. The closure element with joint ensures that even in the event of a collision excessively large forces are not exerted on the components by the closure element (29) being lifted out of its seat at the joint (31). In the event of a collision the securing element also ensures that the corresponding element (22) remains connected to the holding part (21) and a component which is supported on the corresponding element does not drop off.

    摘要翻译： 本发明涉及一种用于可更换地保持机器或机器部件上的传感器，传感元件或工具或机器或机器部件，优选坐标测量装置上的旋转枢转装置的更换装置。 更换装置具有带第一轴承的保持部分和具有对应于第一轴承（23）的对应轴承的相应元件（22）。 提供了可释放的夹紧装置（25），例如磁性夹紧装置，借助于该可松开的夹紧装置（25），当相应的元件（22）保持在保持部分中时，在第一和第二轴承（26） 。 具有第一封闭元件（29）的锁定装置设置在保持部件上并且例如以滑动件（30）的形式的与保持部件的封闭元件（29）对应的相应元件设置在保持部件上 相应的元件（22）。 借助于锁定装置，相应的元件可以在其保持在保持部分上的状态下机械地联接到保持部分。 封闭元件（29）具有接头（31），并且设置有由压缩弹簧（35）预加应力的线缆形式的固定元件（33），借助于该固定元件将分离面（ 31）被限制在预定距离。 具有接头的封闭元件确保即使在碰撞的情况下通过封闭元件（29）在接头（31）处从其底座上抬起也不会对部件施加过大的力。 在发生碰撞的情况下，固定元件还确保相应元件（22）保持连接到保持部分（21），并且支撑在相应元件上的部件不会掉落。

    Method of holding substrate and substrate holding system
    16.
    发明公开
    Method of holding substrate and substrate holding system 失效
    保持方法和系统保持用于在基板

    公开(公告)号：EP1119023A3

    公开(公告)日：2006-06-07

    申请号：EP01107801.1

    申请日：1994-09-02

    申请人： Hitachi, Ltd.

    发明人： Tamura, Naoyuki ,  Takahashi, Kazue ,  Ito, Youichi ,  Ogawa, Yoshifumi ,  Shichida, Hiroyuki ,  Tsubone, Tsunehiko

    IPC分类号： H01L21/00

    CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

    摘要： Present invention provides a method of holding substrate and a substrate holding system where the amount of foreign substances on the back surface can be decreased, and a little amount of foreign substances may be transferred from a mounting table to a substrate. The substrate holding system comprises a ring-shaped leakage-proof surface having smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic ttraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

    Substrate holder and lithographic projection apparatus
    20.
    发明公开
    Substrate holder and lithographic projection apparatus 审中-公开
    基板支架和光刻投影设备

    公开(公告)号：EP1498777A1

    公开(公告)日：2005-01-19

    申请号：EP03077222.2

    申请日：2003-07-15

    申请人： ASML Netherlands B.V.

    发明人： Ottens, Joost Jeroen ,  van Empel, Tjarko Adriaan Rudolf ,  Zaal, Koen Jacobus Johannes Maria

    IPC分类号： G03F7/20

    CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  Y10T279/23

    摘要： A lithographic projection apparatus comprising: a radiation system (Ex,IL) for providing a projection beam (PB) of radiation; a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (1) comprising a plurality of protrusions (2) defining a protrusion configuration for providing a substantially flat plane of support for supporting a substantially flat substrate (W), the substrate holder comprising at least one clamping electrode (8) for generating an electric field, for clamping a substrate against the substrate holder by said electric field; the substrate holder further comprising a peripheral supporting edge (3) arranged to contact a substrate; and a projection system (PL) for projecting the patterned beam onto a target portion of the substrate. According to the invention, the said at least one electrode extends beyond said peripheral supporting edge.

    摘要翻译： 一种光刻投影设备，包括：用于提供辐射的投影光束（PB）的辐射系统（Ex，IL） 用于支撑图案形成装置（MA）的支撑结构（MT），所述图案形成装置用于根据期望的图案图案化投影光束; 包括多个突起（2）的衬底保持器（1），所述多个突起限定用于提供用于支撑基本平坦的衬底（W）的基本平坦的支撑平面的突起配置，所述衬底保持器包括至少一个夹紧电极（8） 电场，用于通过所述电场将衬底夹持在衬底支架上; 所述衬底保持器还包括被布置为接触衬底的外围支撑边缘（3） 和用于将图案化的光束投影到衬底的目标部分上的投影系统（PL）。 根据本发明，所述至少一个电极延伸超出所述周边支撑边缘。