公开(公告)号：EP2003504A3

公开(公告)日：2009-05-27

申请号：EP08010596.8

申请日：2008-06-11

申请人： FUJIFILM Corporation

发明人： Tsubaki, Hideaki

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/32

CPC分类号： G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  Y10S430/114 ,  Y10S430/146

摘要： A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.

公开(公告)号：EP2020615A1

公开(公告)日：2009-02-04

申请号：EP08013663.3

申请日：2008-07-30

申请人： FUJIFILM Corporation

发明人： Tarutani, Shinji ,  Tsubaki, Hideaki ,  Wada, Kenji

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/2022 ,  G03F7/2041 ,  Y10S430/111

摘要： A positive resist composition, includes: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under an action of an acid; (C) a compound capable of decomposing under an action of an acid to generate an acid; and (D) a compound which itself acts as a base for the acids generated from the component (A) and the component (C) but decomposes upon irradiation with actinic rays or radiation to lose a basicity for the acids generated from the component (A) and the component (C).

摘要翻译： 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在碱性显影剂中的溶解度在酸的作用下增加的树脂; （C）能够在酸的作用下分解以产生酸的化合物; 和（D）本身作为由组分（A）和组分（C）产生的酸的碱的化合物，但是在用光化射线或辐射照射时分解，以失去由组分（A）产生的酸的碱度 ）和组分（C）。

公开(公告)号：EP2017674A1

公开(公告)日：2009-01-21

申请号：EP08013019.8

申请日：2008-07-18

申请人： Fujifilm Corporation

发明人： Tarutani, Shinji ,  Wada, Kenji ,  Tsubaki, Hideaki

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/38

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38

摘要： A positive resist composition, includes: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under an action of an acid, the resin containing 80 mol% or more of an aromatic group-free copolymerization component; and (C) a compound capable of decomposing under an action of an acid to generate an acid, wherein an absolute value of difference in pKa between the acid generated from the component (A) and the acid generated from the component (C) is 2 or less, and an absolute value of difference in molecular weight between the acid generated from the component (A) and the acid generated from the component (C) is 50 or less.

摘要翻译： 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在碱性显影剂中的溶解度在酸的作用下增加的树脂，所述树脂含有80摩尔％以上的无芳族基团的共聚成分; 和（C）能够在酸的作用下分解以产生酸的化合物，其中由组分（A）产生的酸与由组分（C）产生的酸之间的pKa之差的绝对值为2 由组分（A）产生的酸与由组分（C）产生的酸之间的分子量差的绝对值为50以下。

公开(公告)号：EP1975718A2

公开(公告)日：2008-10-01

申请号：EP08005508.0

申请日：2008-03-25

申请人： FUJIFILM Corporation

发明人： Hoshino, Wataru ,  Tsubaki, Hideaki ,  Yoshidome, Masahiro

IPC分类号： G03F7/11 ,  G03F7/20 ,  G03F7/00 ,  G03F7/40

CPC分类号： G03F7/2041 ,  G03F7/0035 ,  G03F7/11 ,  G03F7/40 ,  Y10T428/24802

摘要： A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.

摘要翻译： 用于形成抗蚀剂图案的表面处理剂包括：如本说明书中定义的由式（1）表示的化合物，其中表面处理剂用于在第一抗蚀剂上形成第一抗蚀剂图案之间的步骤 在第一抗蚀剂图案上形成第二抗蚀剂膜以形成第二抗蚀剂图案，并且图案形成方法使用表面处理剂。

公开(公告)号：EP1906238A2

公开(公告)日：2008-04-02

申请号：EP07017721.7

申请日：2007-09-11

申请人： FUJIFILM Corporation

发明人： Tsubaki, Hideaki

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0048 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/094 ,  Y10S430/106 ,  Y10S430/115

摘要： A photosensitive composition contains: a compound capable of generating an acid upon irradiation with actinic rays or radiation; a basic compound represented by the formula (I-a) as defined herein; a basic compound represented by the formula (I-b) as defined herein; and a surfactant represented by the formula (II) as defined herein.

摘要翻译： 一种光敏组合物含有：在光化射线或辐射照射下能够产生酸的化合物; 如本文所定义的由式（I-a）表示的碱性化合物; 如本文所定义的由式（I-b）表示的碱性化合物; 和如本文所定义的由式（II）表示的表面活性剂。