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23 条记录 (耗时 0.023 秒)

    Chemical amplification-type resist composition and production process thereof
    3.
    发明公开
    Chemical amplification-type resist composition and production process thereof 有权
    化学放大型抗蚀剂组合物及其生产方法

    公开(公告)号：EP1748318A3

    公开(公告)日：2011-02-02

    申请号：EP06015686.6

    申请日：2006-07-27

    申请人： FUJIFILM Corporation

    发明人： Tarutani, Shinji

    IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/09

    CPC分类号： G03F7/0382 ,  B01D61/145 ,  G03F7/0392 ,  G03F7/09 ,  Y10S430/115 ,  Y10S430/136

    摘要： A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer is changed under an action of an acid; (C) a basic compound; (D) a surfactant; and (E) a solvent, the production process comprising: preparing a solution containing the component (A); and mixing the solution containing the component (A) with the components (B) to (E), and a chemical amplification-type resist composition produced by the production process.
    The production process ensures that the generation of a defect, particularly fine scum or microbridge, in the resist pattern after development can be suppressed. Another advantage is that the resist composition shows an excellent storage stability.

    Pattern forming method
    5.
    发明公开
    Pattern forming method 审中-公开
    图案形成方法

    公开(公告)号：EP2003509A3

    公开(公告)日：2010-09-22

    申请号：EP08010891.3

    申请日：2008-06-16

    申请人： FUJIFILM Corporation

    发明人： Tarutani, Shinji ,  Wada, Kenji ,  Tsubaki, Hideaki

    IPC分类号： G03F7/40

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/2022 ,  G03F7/2041

    摘要： A pattern forming method, includes: exposing a resist film with actinic rays or radiation a plurality of times; and heating the resist film at a first temperature in at least one interval between the exposures.

    摘要翻译： 一种图案形成方法，包括：用光化射线或辐射多次曝光抗蚀剂膜; 以及在曝光之间的至少一个间隔中在第一温度下加热抗蚀剂膜。

    Positive resist composition and pattern forming method
    7.
    发明公开
    Positive resist composition and pattern forming method 审中-公开
    正面抗性和Verfahren zur Herstellung von Mustern

    公开(公告)号：EP2020615A1

    公开(公告)日：2009-02-04

    申请号：EP08013663.3

    申请日：2008-07-30

    申请人： FUJIFILM Corporation

    发明人： Tarutani, Shinji ,  Tsubaki, Hideaki ,  Wada, Kenji

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/2022 ,  G03F7/2041 ,  Y10S430/111

    摘要： A positive resist composition, includes: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under an action of an acid; (C) a compound capable of decomposing under an action of an acid to generate an acid; and (D) a compound which itself acts as a base for the acids generated from the component (A) and the component (C) but decomposes upon irradiation with actinic rays or radiation to lose a basicity for the acids generated from the component (A) and the component (C).

    摘要翻译： 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在碱性显影剂中的溶解度在酸的作用下增加的树脂; （C）能够在酸的作用下分解以产生酸的化合物; 和（D）本身作为由组分（A）和组分（C）产生的酸的碱的化合物，但是在用光化射线或辐射照射时分解，以失去由组分（A）产生的酸的碱度 ）和组分（C）。

    Positive resist composition and pattern forming method
    8.
    发明公开
    Positive resist composition and pattern forming method 审中-公开
    积极的抵抗和Verfahren zur Strukturformung

    公开(公告)号：EP2017674A1

    公开(公告)日：2009-01-21

    申请号：EP08013019.8

    申请日：2008-07-18

    申请人： Fujifilm Corporation

    发明人： Tarutani, Shinji ,  Wada, Kenji ,  Tsubaki, Hideaki

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/38

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38

    摘要： A positive resist composition, includes: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under an action of an acid, the resin containing 80 mol% or more of an aromatic group-free copolymerization component; and (C) a compound capable of decomposing under an action of an acid to generate an acid, wherein an absolute value of difference in pKa between the acid generated from the component (A) and the acid generated from the component (C) is 2 or less, and an absolute value of difference in molecular weight between the acid generated from the component (A) and the acid generated from the component (C) is 50 or less.

    摘要翻译： 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在碱性显影剂中的溶解度在酸的作用下增加的树脂，所述树脂含有80摩尔％以上的无芳族基团的共聚成分; 和（C）能够在酸的作用下分解以产生酸的化合物，其中由组分（A）产生的酸与由组分（C）产生的酸之间的pKa之差的绝对值为2 由组分（A）产生的酸与由组分（C）产生的酸之间的分子量差的绝对值为50以下。

    Method for producing curable composition for imprints
    10.
    发明公开
    Method for producing curable composition for imprints 审中-公开
    一种制备可固化组合物的的压印过程

    公开(公告)号：EP2490072A3

    公开(公告)日：2013-09-11

    申请号：EP12155082.6

    申请日：2012-02-13

    申请人： Fujifilm Corporation

    发明人： Enomoto, Yuichiro ,  Kodama, Kunihiko ,  Tarutani, Shinji

    IPC分类号： G03F7/00 ,  G03F7/16

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/16

    摘要： Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C).