公开(公告)号：EP3151065A4

公开(公告)日：2018-05-09

申请号：EP15800335

申请日：2015-05-11

申请人： NIPPON LIGHT METAL CO

发明人： KOHMURA KAZUO ,  ONO YOSUKE ,  TANEICHI DAIKI ,  SATO YASUYUKI ,  HIROTA TOSHIAKI ,  KOGA KIYOKAZU

IPC分类号： G03F1/64 ,  B65D85/86 ,  G03F1/62

CPC分类号： G03F1/64 ,  G03F1/62 ,  G03F1/66 ,  G03F7/70691 ,  G03F7/70866 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： Provided is a support frame for pellicles which includes an aluminum alloy-made frame body with a pellicle film bonded to a front surface of the frame body, and with a glass substrate bonded to a back surface of the frame body. A front-side recessed groove extending in a circumferential direction of the frame body is formed on the front surface of the frame body, and a front-side suction hole extending from an outer peripheral surface of the frame body to an inner surface of the front-side recessed groove is formed on the frame body.

公开(公告)号：EP2998983A3

公开(公告)日：2016-06-08

申请号：EP15192315.8

申请日：2007-12-21

申请人： Nikon Corporation

发明人： Ono, Kazuya

IPC分类号： H01L21/027 ,  H01L21/68 ,  G03F7/20

CPC分类号： G03F7/70758 ,  G03F7/70691 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70808 ,  G03F7/709 ,  H01L21/682

摘要： A stage apparatus is provided with a fixed section having a prescribed moving surface, and a first moving body which can move along the moving surface in a plurality of directions including a first direction. The stage apparatus is also provided with substages which move in a first direction to the moving surface in a synchronization with movement of the first moving body; a first measuring apparatus, which is arranged on the substages at least partially and detects information relating to relative position in the first direction between the substages and the moving surface; and second measuring apparatuses, which are arranged on the substages at least partially and detect information relating to relative position in a second direction which substantially orthogonally intersects with the first direction between the substage and the first moving body and is along the moving surface.

公开(公告)号：EP2998983A2

公开(公告)日：2016-03-23

申请号：EP15192315.8

申请日：2007-12-21

申请人： Nikon Corporation

发明人： Ono, Kazuya

IPC分类号： H01L21/027 ,  H01L21/68 ,  G03F7/20

CPC分类号： G03F7/70758 ,  G03F7/70691 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70808 ,  G03F7/709 ,  H01L21/682

摘要： A stage apparatus is provided with a fixed section having a prescribed moving surface, and a first moving body which can move along the moving surface in a plurality of directions including a first direction. The stage apparatus is also provided with substages which move in a first direction to the moving surface in a synchronization with movement of the first moving body; a first measuring apparatus, which is arranged on the substages at least partially and detects information relating to relative position in the first direction between the substages and the moving surface; and second measuring apparatuses, which are arranged on the substages at least partially and detect information relating to relative position in a second direction which substantially orthogonally intersects with the first direction between the substage and the first moving body and is along the moving surface.

摘要翻译： 舞台装置具备具有规定的移动面的固定部和能够沿着移动面在包含第一方向的多个方向上移动的第一移动体。 舞台设备还设置有与第一移动体的移动同步地沿第一方向移动到移动表面的子阶段; 第一测量装置，所述第一测量装置至少部分地布置在所述子平台上并检测与所述子平台和所述移动表面之间的所述第一方向上的相对位置有关的信息; 以及第二测量装置，其至少部分地布置在所述子平台上，并且检测与在所述子平台和所述第一移动体之间基本上与所述第一方向正交相交并且沿着所述移动表面的第二方向上的相对位置有关的信息。

公开(公告)号：EP2831673A4

公开(公告)日：2015-11-11

申请号：EP13769488

申请日：2013-03-25

申请人： KLA TENCOR CORP

发明人： CHILESE FRANCIS CHARLES ,  POHLMANN ULRICH ,  WOLTER DETLEF ,  WALSH JOSEPH FLEMING

IPC分类号： G03F1/84 ,  G03F7/20

CPC分类号： G03F7/70691 ,  B25J11/0095 ,  G03F1/84 ,  G03F7/70741

摘要： Systems and methods to control particle generation in a reticle inspection system are presented. The number of particles added to a reticle during an entire load-inspect-unload sequence of a reticle inspection system is reduced by performing all reticle contact events in a controlled, flowing air environment. In one embodiment, the reticle is fixed to a carrier by clamping outside of the vacuum environment, and the carrier, rather than the reticle, is coupled to the reticle stage of the inspection system. In this manner, the high levels of back-side particulation associated with electrostatic chucking are avoided. In addition, the carrier is configured to be coupled to the reticle stage in any of four different orientations separated by ninety degrees.

摘要翻译： 介绍了在掩模版检测系统中控制粒子产生的系统和方法。 通过在受控流动的空气环境中执行所有掩模版接触事件，在掩模版检查系统的整个负载检查 - 卸载顺序期间添加到掩模版的颗粒数量减少。 在一个实施例中，通过夹紧在真空环境之外将掩模版固定到载体上，并且载体而不是掩模版被耦合到检查系统的掩模版平台。 以这种方式，避免了与静电吸附相关的高水平的背面微粒。 另外，载体被配置成以分开九十度的四个不同取向中的任一个耦合到标线片台。

公开(公告)号：EP2787387A1

公开(公告)日：2014-10-08

申请号：EP12854234.7

申请日：2012-12-03

申请人： LG Chem, Ltd.

发明人： SHIN, Bu Gon

IPC分类号： G02F1/1337 ,  G02F1/13

CPC分类号： G03F7/70733 ,  G03F1/00 ,  G03F1/50 ,  G03F1/54 ,  G03F7/24 ,  G03F7/70691

摘要： Provided are a mask, a method of manufacturing the same, a light irradiation device, a method of radiating light, and a method of manufacturing an orientationally ordered photo-alignment layer. By the mask, collimated light or nearly collimated light may be irradiated with uniform illumination to a surface of an object to be irradiated. Further, by the mask, light may be effectively incident even on the object to be irradiated in the curved shape.

摘要翻译： 本发明提供掩模，其制造方法，光照射装置，照射光的方法以及制造取向排列的光取向层的方法。 通过掩模，准直光或近似准直光可以以均匀照明照射到待照射物体的表面。 此外，通过掩模，光可以以弯曲形状有效地入射在即将照射的物体上。

公开(公告)号：EP2469339A1

公开(公告)日：2012-06-27

申请号：EP11188863.2

申请日：2011-11-11

申请人： ASML Netherlands BV

发明人： Vermeulen, Johannes ,  De Groot, Antonius ,  Cadee, Theodorus ,  DeE Boeij, Jeroen

IPC分类号： G03F7/20

CPC分类号： G03F7/70758 ,  G03F7/70691

摘要： Lithography apparatus comprising a projection system (PS), a carrier (WT); and a drive system (16) for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y, wherein: the drive system comprises: a shuttle (2) constructed and arranged to move parallel to the Y-axis; a shuttle connector (4) for connecting the shuttle to the carrier, the shuttle connector being such as to allow movement of the carrier in a direction parallel to the X-axis relative to the shuttle; and a shuttle driver (16) for driving movement of the shuttle parallel to the Y-axis, wherein: the shuttle is located to one side only of the carrier in a direction parallel to the X-axis and only one of the shuttle is connected to the carrier; and the shuttle driver and shuttle connector are configured to supply at least 10% of the Y-component of forces applied to the carrier by the drive system.

摘要翻译： 包括投影系统（PS），载体（WT）的光刻设备; 以及驱动系统（16），用于相对于所述投影系统在由正交轴X和Y定义的平面中移动所述载体，其中：所述驱动系统包括：梭（2），构造和布置成平行于所述Y -轴; 梭子连接器（4），用于将梭子连接到载体上，梭子连接器允许载体沿平行于X轴的方向相对于梭子移动; 以及用于驱动梭子平行于Y轴运动的梭子驱动器（16），其中：梭子仅在与X轴平行的方向上位于运载器的一侧，并且只有一个梭子连接 给承运人; 并且梭驱动器和梭式连接器构造成供应由驱动系统施加到载体的力的Y分量的至少10％。

公开(公告)号：EP0893738B1

公开(公告)日：2011-09-21

申请号：EP98305740.7

申请日：1998-07-17

申请人： CANON KABUSHIKI KAISHA

发明人： Kataoka, Yoshiharu

IPC分类号： G03F7/20

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7026

公开(公告)号：EP1716456B1

公开(公告)日：2011-03-16

申请号：EP05702775.7

申请日：2005-01-25

申请人： Koninklijke Philips Electronics N.V.

发明人： BAKKER, Arjan, F.

IPC分类号： G03F7/20 ,  G01B9/02

CPC分类号： G03F7/70691

摘要： A system for positioning a product, comprising a chuck (71) for supporting the product, an intermediate stage (79) supporting said chuck (71), and a stationary base (72) supporting said intermediate stage (79). The chuck (71) can move with respect to the intermediate stage (79) in a first direction X (80), and the intermediate stage (79) can move with respect to said stationary base in a second direction Y (81). The system furthermore comprises at least one laser interferometer (73,74,75,76,77,78) for measuring the position of the chuck (71) relative to the stationary base (72). The main part (73,74,75,76,77,78) of said laser interferometer is attached to said intermediate stage (79), so that it can measure the distance between a reflector (83,84,85) on the chuck (71) and a reflector (82,87) on the stationary base (72).

公开(公告)号：EP1821336A4

公开(公告)日：2011-03-09

申请号：EP05807063

申请日：2005-11-18

申请人： NIPPON KOGAKU KK

发明人： YASUDA MASAHIKO ,  SUGIHARA TARO

IPC分类号： H01L21/027 ,  G01B11/00 ,  G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70341 ,  G03F7/70691 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70975 ,  G03F9/7011 ,  G03F9/7088 ,  Y10T29/49002

摘要： A part of a plate (50) of a predetermined shape detachably mounted on a moving body (WST) is detected by an alignment system (ALG) while the position of the moving body is measured by a measurement unit (18 or the like) that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate (50) is obtained. Therefore, even if there are no alignment marks (fiducial marks) on the moving body (WST) for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

公开(公告)号：EP1709490A4

公开(公告)日：2009-03-25

申请号：EP03800269

申请日：2003-12-19

申请人： IBM

发明人： AUSSCHNITT CHRISTOPHER

IPC分类号： G03F9/00 ,  B81C99/00 ,  G01B9/00 ,  G03F7/20

CPC分类号： G03F7/70691 ,  B81C99/0065 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633

摘要： A method is described for measuring a dimension on a substrate, wherein a target pattern (455) is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction. The target pattern (455) formed on the substrate is then illuminated so that at least one non-zero diffracted order is detected. The response of the non-zero diffracted order to variation in the printed characteristic dimension relative to nominal is used to determine the dimension of interest, such as critical dimension or overlay, on the substrate. An apparatus (40) for performing the method of the present invention includes an illumination source (410), a detector (460) for detecting a non-zero diffracted order, and means for positioning the source (410) relative to the target (455) so that one or more non-zero diffracted orders from the target (455) are detected at the detector (460).