摘要:
Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.
摘要:
A carrier system is provided with a wafer stage (WST) which holds a mounted wafer (W) and is also movable along an XY plane, a chuck unit (153) which holds the wafer from above in a non-contact manner above a predetermined position and is vertically movable, and a plurality of vertical movement pins (140), which can support from below the wafer held by the chuck unit (153) on the wafer stage (WST) when the wafer stage (WST) is positioned at the predetermined position above and can also move vertically. Then, flatness of the wafer (W) is measured by a Z position detection system (146), and based on the measurement results, the chuck unit(153) and the vertical movement pins (140) that hold (support) the wafer (W) are independently driven.
摘要:
A loading/unloading robot includes an arm unit attached to a support unit that is capable of being raised and lowered and a hand unit for conveying a loaded/unloaded object, attached to the arm unit. The support unit includes a base portion capable of revolving around a raising/lowering axis and a head portion rotatably attached to the base portion. The arm unit includes arms that are rotatably attached to the head portion. Front ends of the arms move forward and backward along a forward/backward direction that passes the head portion. The hand unit includes a loading/unloading hand rotatably attached to the arm. A center distance from the rotational axis of the head portion to the rotational axes of rear arms is shorter than a center distance from an axis of revolution of the base portion to the rotational axis of the head portion.
摘要:
The present invention relates to an end effector including: blade members for holding substrates, each configured to hold the substrate, and configured such that each interval between the blade members can be changed; a blade support unit configured to support the blade members, the blade support unit being configured to be driven integrally with the blade members by the robot; and blade drive means configured to change the interval between the blade members by moving at least one of the blade members relative to another blade member.
摘要:
A loading/unloading robot comprising: a support unit installed so as to be capable of being raised and lowered; an arm unit attached to the support unit; and a hand unit for conveying an object to be loaded and unloaded, attached to the arm unit, wherein the support unit includes a base portion that can be revolved around a raising/lowering axis that extends in a raising/lowering direction and a head portion rotatably attached to the base portion, the arm unit includes an arm that is rotatably attached to the head portion, a front end of the arm moves forward and backward along a forward/backward direction that passes the head portion, the hand unit includes a loading/unloading hand rotatably attached to the front end of the arm, the head portion includes a base-end portion supported on an upper surface of the base portion that is a head portion installation surface, a front portion including an arm installation surface on which the arm is attached, and a stepped portion that integrally joins the base-end portion and the front portion, a height of an upper surface of the front portion that is the arm installation surface is lower than a height of an upper surface of the base-end portion, and a height of the arm installation surface is equal to or lower than a height of the upper surface of the base portion that is the head portion installation surface.
摘要:
In a carrier system, a chuck unit (153) is used to hold a placed wafer (W) from above, and vertical-motion pins (140) use suction to hold the wafer (W) from below. Then, chuck unit (153) and vertical-motion pins (140) are subsequently lowered until a bottom surface of the wafer comes into contact with a wafer table (WTB). During the lowering, the holding force exerted by chuck unit (153) and the arrangement of chuck members (124) are optimally adjusted such that, as a result of the restraint of wafer (W) by chuck unit (153) and vertical-motion pins (140), localized surplus-restraint is imparted to wafer (W), and warping does not occur.
摘要:
A loading/unloading robot comprising: a support unit installed so as to be capable of being raised and lowered; an arm unit attached to the support unit; and a hand unit for conveying an object to be loaded and unloaded, attached to the arm unit, wherein the support unit includes a base portion that can be revolved around a raising/lowering axis that extends in a raising/lowering direction and a head portion rotatably attached to the base portion, the arm unit includes an arm that is rotatably attached to the head portion, a front end of the arm moves forward and backward along a forward/backward direction that passes the head portion, the hand unit includes a loading/unloading hand rotatably attached to the front end of the arm, the head portion includes a base-end portion supported on an upper surface of the base portion that is a head portion installation surface, a front portion including an arm installation surface on which the arm is attached, and a stepped portion that integrally joins the base-end portion and the front portion, a height of an upper surface of the front portion that is the arm installation surface is lower than a height of an upper surface of the base-end portion, and a height of the arm installation surface is equal to or lower than a height of the upper surface of the base portion that is the head portion installation surface.
摘要:
A wafer table structure providing a single wafer table surface suitable for handling both wafers and film frames includes a base tray having a set of compartments formed therein by way of a set of ridges formed in or on an interior base tray surface; a hardenable fluid permeable compartment material disposed within the set of base tray compartments; and a set of openings formed in the base tray interior surface by which the hardened compartment material is exposable to negative or positive pressures. The base tray includes a first ceramic material (e.g., porcelain), and the hardenable compartment material includes a second ceramic material. The base tray and the compartment material are simultaneously machinable by way of a standard machining process to thereby planarize exposed outer surfaces of the base tray and the hardened compartment material at an essentially identical rate for forming a highly or ultra-planar wafer table surface.
摘要:
Provided is a wafer stocker that can prevent the inflow of an external atmosphere, maintain a wafer storage space at a desired atmosphere with a relatively small amount of gas, and prevent dust from being attached to a wafer surface. A shutter portion, including multiple shield plates having the same height as an interval between shelf plates disposed in a storage container, is disposed with a slight space from a body portion, and by supplying clean gas into the storage container, a clean atmosphere of a higher pressure than an external environment is maintained, and a shutter portion is opened and closed by moving up and down the shield plate independently from the shelf plate that supports a wafer.
摘要:
This application is to provide an industrial robot in which a main body portion, to which the base end side of an arm is rotatably joined, can be made thin. For instance, this industrial robot is equipped with hands, on which objects-to-be-transferred are to be mounted, an arm, with which the hand is rotatably joined to the front end side thereof, and a main body portion 7, with which the base end side of the arm is rotatably joined; the main body portion 7 is provided with an elevating unit 20, to which the base end side of the arm is rotatably joined on the top surface side thereof, a housing 21, which holds the elevating unit 20 to be raised/lowered and in which at least part of the bottom end of the elevating unit 20 is housed, and an elevating mechanism 22 for raising/lowering the elevating unit 20. The elevating mechanism 22 is housed in the housing 21 such that it aligns with the elevating unit when viewed in the top-bottom direction.