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80 条记录 (耗时 0.019 秒)

    SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER GAS DISCHARGE LASER SYSTEM
    41.
    发明公开
    SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
    系统和方法自动气体优化在两腔排气流激光系统

    公开(公告)号：EP2727199A1

    公开(公告)日：2014-05-07

    申请号：EP12803599.5

    申请日：2012-06-05

    申请人： Cymer, LLC

    发明人： O'BRIEN, Kevin, M. ,  THORNES, Joshua, J. ,  RIGGS, Daniel, J. ,  JIANG, Rui

    IPC分类号： H01S3/22

    CPC分类号： H01S3/036 ,  H01S3/104 ,  H01S3/2251 ,  H01S3/2366

    摘要： A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled until the discharge voltage meets/exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again until the voltage and pressure meet/exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled until the discharge voltage meets/exceeds the minimum value and the output energy meets/exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.

    Very narrow band injection seeded F2 lithography laser
    47.
    发明公开
    Very narrow band injection seeded F2 lithography laser 审中-公开
    非常窄带注入F2光刻激光器

    公开(公告)号：EP1944841A2

    公开(公告)日：2008-07-16

    申请号：EP08000225.6

    申请日：2000-09-19

    申请人： Cymer, Inc.

    发明人： Ershov, Alexander, I. ,  Onkels, Eckehard, D. ,  Das, Palash, P. ,  Partlo, William, N. ,  Hofmann, Thomas

    IPC分类号： H01S3/10

    CPC分类号： H01S3/10092 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/139 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2325 ,  H01S3/2333 ,  H01S3/2366

    摘要： An apparatus comprises a seed laser and an amplifier laser in communication with a processing device utilizing output light produced by the seed laser and amplifier laser device. The apparatus further comprises a laser controller for outputting a laser trigger signal. The seed laser excites a laser gas by a seed laser discharge caused by application of a seed laser discharge voltage across seed laser electrodes. The seed laser electrodes are disposed in a seed laser chamber where the laser gas is contained, from a seed laser discharge circuit. The seed laser discharge excites the laser gas in response to an input of the laser trigger signal to generate a seed laser light, and oscillates the seed laser light with a wavelength band being narrowed by a band narrowing unit including a grating. An amplifier amplifies the seed laser light by an amplifier discharge caused by amplification of an amplifier discharge voltage across amplify electrodes. The amplify electrodes are disposed in an amplifier chamber where the laser gas is sealed by means of an amplifier discharge circuit in response to an input of the laser trigger signal to emit an amplified laser output light to the processing device. A delay circuit sets a delay from light emission of the seed laser light to a start of the amplification discharge. The laser controller changes the delay time to synchronize the amplification discharge with the seed laser light.

    摘要翻译： 一种设备包括种子激光器和放大器激光器，所述放大器激光器利用由种子激光器和放大器激光器设备产生的输出光与处理设备通信。 该设备还包括用于输出激光触发信号的激光控制器。 种子激光器通过在种子激光器电极上施加种子激光器放电电压而引起的种子激光放电来激发激光气体。 种子激光器电极从种子激光器放电电路设置在容纳激光气体的种子激光器室中。 种子激光放电响应于激光触发信号的输入而激励激光气体以产生种子激光，并且通过由包括光栅的带变窄单元使波长带变窄的种子激光振荡。 放大器通过由放大电极间的放大器放电电压的放大引起的放大器放电来放大种子激光。 响应于激光触发信号的输入，放大电极被放置在放大器腔室中，其中激光气体借助于放大器放电电路被密封，以将放大的激光输出光发射到处理装置。 延迟电路设定从种子激光的发光到放大放电开始的延迟。 激光控制器改变延迟时间以使放大放电与种子激光同步。

    LPP EUV DRIVE LASER
    48.
    发明公开
    LPP EUV DRIVE LASER 审中-公开

    公开(公告)号：EP1861903A2

    公开(公告)日：2007-12-05

    申请号：EP06736026.3

    申请日：2006-02-22

    申请人： Cymer, Inc.

    发明人： BROWN, Daniel, J., W. ,  ERSHOV, Alexander, I. ,  FLEUROV, Vladimir, B. ,  FOMENKOV, Igor, V. ,  PARTLO, William, N.

    IPC分类号： H01S3/22

    CPC分类号： H01S3/225 ,  H01S3/094 ,  H01S3/10015 ,  H01S3/10023 ,  H01S3/109 ,  H01S3/1611 ,  H01S3/1653 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2333 ,  H01S3/2366 ,  H01S3/2375 ,  H01S3/2383 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    摘要： An apparatus and method is disclosed which may comprise an EUV drive laser system comprising: a solid state seed laser master oscillator laser; a gas discharge excimer laser gain generator producing a drive laser output light beam. The solid state seed laser may comprise a third harmonic Nd: YLF laser, which may be tunable. The gas discharge excimer gain generator laser may comprise a XeF excimer laser power amplifier or power oscillator. The solid state laser may comprise a tunable laser tuned by changing the temperature of a laser crystal comprising the solid state laser, or by utilizing a wavelength selection element, e.g., a Lyot filter or an etalon.

    摘要翻译： 公开了一种设备和方法，其可以包括EUV驱动激光器系统，其包括：固态种子激光器主振荡器激光器; 产生驱动激光输出光束的气体放电准分子激光增益发生器。 固态种子激光器可以包括三次谐波Nd：YLF激光器，其可以是可调谐的。 气体放电准分子增益发生器激光器可以包括XeF准分子激光功率放大器或功率振荡器。 固态激光器可以包括通过改变包括固态激光器的激光晶体的温度或通过利用波长选择元件（例如Lyot滤波器或标准具）而调谐的可调谐激光器。

    LASER THIN FILM POLY-SILICON ANNEALING SYSTEM
    50.
    发明公开
    LASER THIN FILM POLY-SILICON ANNEALING SYSTEM 有权
    激光薄膜多晶硅AUSHEIZSYSTEM

    公开(公告)号：EP1687877A2

    公开(公告)日：2006-08-09

    申请号：EP04810724.7

    申请日：2004-11-12

    申请人： TCZ GMBH

    发明人： PARTLO, William, N. ,  DAS, Palash, P. ,  HUDYMA, Russell ,  THOMAS, Michael

    IPC分类号： H01S3/22

    CPC分类号： H01S3/0818 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/0738 ,  B23K26/705 ,  H01L21/02532 ,  H01L21/02675 ,  H01S3/225 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2366

    摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.