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489 条记录 (耗时 0.018 秒)

    Quasi hot wall reaction chamber
    51.
    发明公开
    Quasi hot wall reaction chamber 失效
    反应室与准热壁

    公开(公告)号：EP0728850A3

    公开(公告)日：1997-06-04

    申请号：EP96102721.6

    申请日：1996-02-23

    申请人： APPLIED MATERIALS, INC.

    发明人： Lindstrom, Paul R.

    IPC分类号： C23C16/46 ,  C23C16/48 ,  H01L21/00

    CPC分类号： C23C16/481 ,  C23C16/46

    摘要： A CVD reactor (10) having a thermal source that regulates heat to a semiconductor substrate inside said reactor (10) so as to cause an even distribution of heat across the substrate during processing. In one embodiment the thermal source is in the form of a disk (12) which is parallel and concentric with a substrate wafer (13) being processed, said disk (12) being closely spaced from the wafer (13) to uniformly heat the wafer (13) to a temperature suitable for processing. The thermal source disk (12) is heated by a light source (115) which impinges light on one surface (116) of the disk (12) which is oriented away from the wafer (13) so that the other surface (118) of this disk (12) facing the wafer (13) has a uniformity of temperature thereby effecting uniformity of wafer processing.

    OPTICAL CVD PROCESS
    56.
    发明授权
    OPTICAL CVD PROCESS 失效
    光CVD法。

    公开(公告)号：EP0298126B1

    公开(公告)日：1994-06-15

    申请号：EP88900591.4

    申请日：1987-12-25

    申请人： KAWASAKI STEEL CORPORATION

    发明人： OHTA, Tomohiro ,  SASAKI, Hiroaki ,  MITOMO, Tohru ,  KUBOTA, Naoki

    IPC分类号： C23C16/48

    CPC分类号： C23C16/483 ,  H01L21/268

    摘要： In order to solve the technical problems such as an increase in a film formation speed in an optical CVD process, an improvement in film quality and elimination of restrictions imposed to a light source and a starting gas, the present invention provides an optical CVD process which can be applied particularly advantageously to the fabrication of semiconductors by conjoint use of a pulsating laser beam and continuous light, by application of a plurality of laser beams for applying a second pulsating laser beam to between pulses of a first pulse train and by introduction of an additional gas into a reaction vessel besides the starting gas in order to promote photo decomposition of the starting gas.

    Reaktorvorrichtung
    57.
    发明公开
    Reaktorvorrichtung 失效
    Reaktorvorrichtung。

    公开(公告)号：EP0588044A1

    公开(公告)日：1994-03-23

    申请号：EP93112559.5

    申请日：1993-08-05

    申请人： Heraeus Noblelight GmbH

    发明人： Baier, Michael ,  Brendel, Thomas ,  Esrom, Hilmar, Dr.

    IPC分类号： C23C16/48 ,  B01J19/12 ,  C23C18/14

    CPC分类号： C23C16/482 ,  B01J19/123

    摘要： Die Erfindung bezieht sich auf eine Reaktorvorrichtung (1) für die Bearbeitung von Bauteilen, Zwischenprodukten oder Werkstoffen (30). Erfindungsgemäß ist die Reaktorvorrichtung (1) aus wenigstens einer Lampeneinheit (2), einer Grundeinheit (3), einer Beschickungseinheit (4) und einer Versorgungs- und Entsorgungseinheit (5) baukastenartig zusammensetzbar.

    摘要翻译： 本发明涉及一种用于处理部件，中间产品或材料（30）的反应器装置（1）。 根据本发明，反应器装置（1）可以以至少一个灯单元（2），基本单元（3），进料单元（4）和供料单元（5）的模块化方式组成， 。