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165 条记录 (耗时 0.02 秒)

    PLASMAREAKTOR
    73.
    发明授权
    PLASMAREAKTOR 有权

    公开(公告)号：EP1051729B1

    公开(公告)日：2002-04-10

    申请号：EP99903659.3

    申请日：1999-01-20

    申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

    发明人： WILD, Christof ,  KOIDL, Peter

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32229 ,  H01J37/32192 ,  H01J37/32247

    摘要： The invention relates to a plasma reactor (1) used especially for diamond chemical vapour deposition or, for example, for plasma surface treatment or plasma etching. The plasma reactor (1) comprises a reactor housing (2) configured as a resonator to which a high-frequency coaxial line (5) joined to a high-frequency generator (6) is connected for introducing microwaves. In the reactor housing a substrate holder (3) for a substrate to be coated is located. In the transitional area between the high-frequency coaxial line (5) and the reactor housing (2) a vacuum-tight window (12) of a material permeable to microwaves is arranged and the reactor housing has connections (10, 11) for supplying and withdrawing a process gas. In the plasma reactor (1) provided for in the invention the high-frequency coaxial line (5) is divided at its input end outside the reactor housing and directed against the essentially annular microwave window (12) on the periphery of the reactor housing.

    PLASMAREAKTOR
    75.
    发明公开
    PLASMAREAKTOR 有权
    等离子体反应器

    公开(公告)号：EP1051729A1

    公开(公告)日：2000-11-15

    申请号：EP99903659.3

    申请日：1999-01-20

    申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DERANGEWANDTEN FORSCHUNG E.V.

    发明人： WILD, Christof ,  KOIDL, Peter

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32229 ,  H01J37/32192 ,  H01J37/32247

    摘要： The invention relates to a plasma reactor (1) used especially for diamond chemical vapour deposition or, for example, for plasma surface treatment or plasma etching. The plasma reactor (1) comprises a reactor housing (2) configured as a resonator to which a high-frequency coaxial line (5) joined to a high-frequency generator (6) is connected for introducing microwaves. In the reactor housing a substrate holder (3) for a substrate to be coated is located. In the transitional area between the high-frequency coaxial line (5) and the reactor housing (2) a vacuum-tight window (12) of a material permeable to microwaves is arranged and the reactor housing has connections (10, 11) for supplying and withdrawing a process gas. In the plasma reactor (1) provided for in the invention the high-frequency coaxial line (5) is divided at its input end outside the reactor housing and directed against the essentially annular microwave window (12) on the periphery of the reactor housing.

    MICROWAVE APPLICATOR FOR AN ELECTRON CYCLOTRON RESONANCE PLASMA SOURCE
    77.
    发明公开
    MICROWAVE APPLICATOR FOR AN ELECTRON CYCLOTRON RESONANCE PLASMA SOURCE 失效
    微波反射器的电子回旋共振等离子体源

    公开(公告)号：EP0914496A1

    公开(公告)日：1999-05-12

    申请号：EP97934029.0

    申请日：1997-07-01

    申请人： APPLIED MICROWAVE PLASMA CONCEPTS, INC.

    发明人： DANDL, Raphael, A.

    IPC分类号： H05H1 ,  C23C16 ,  H01J37 ,  H01L21 ,  C23C14

    CPC分类号： H01J37/3222 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32247 ,  H01J37/32678 ,  H01J37/32688

    摘要： A method and apparatus are disclosed employing a microwave applicator (12) for use with an electron cyclotron resonance (ECR) plasma source (20) for processing applications. A magnetic field is generated by magnets (32, 34) circumferentially arranged about a chamber (22) that is symmetrical about its longitudinal axis (24). The microwave applicator (12), which comprises one or more pairs of slotted antenna arrays (60), injects and distributes microwave power about the entire periphery of a plasma forming portion of the chamber. The antenna arrays (60) include a plurality of radiating stubs (62) for radiating microwave power. The stubs are positioned along the arrays at predetermined intervals for efficiently distributing microwave power uniformly about the periphery of the plasma forming portion.

    PLASMAREAKTOR
    80.
    发明公开
    PLASMAREAKTOR 失效
    等离子体反应器

    公开(公告)号：EP0806052A1

    公开(公告)日：1997-11-12

    申请号：EP95940955.0

    申请日：1995-12-08

    申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

    发明人： WILD, Christof ,  FÜNER, Michael ,  KOIDL, Peter

    IPC分类号： H01J37

    CPC分类号： H01J37/32229 ,  H01J37/32192 ,  H01J37/32247

    摘要： The invention concerns a plasma reactor for generating and maintaining plasma. The plasma reactor comprises a resonant cavity (11) whose cross-section tapers in summit regions (13, 16) in which the wall (14) of the resonant cavity (11) is closed to such an extent that an excited field mode in the region of the cross-sectional tapered portions displays main peaks (15, 31) whose maximum field intensity is increased with respect to the field intensity of adjacent secondary peaks. A reaction unit (18) is provided in the region of a main peak (31) with a substrate (21) which is to be processed and which can be coated in the gas phase of the plasma (32). As a result of the field intensity distribution brought about by a resonant cavity (11) of the given shape, with main peaks (15, 31) which are greatly increased with respect to secondary peaks, process parameters such as gas pressure and coupled electromagnetic power can be selected very largely independently of one another when the plasma (32) is in a stable situation, without the plasma (32) igniting undesirably in the region of secondary peaks. Furthermore, the comparatively homogeneous field intensity distribution in the main peak (31) maintaining the plasma (32) causes the substrate (21) to be processed uniformly.