公开(公告)号：EP1433366A1

公开(公告)日：2004-06-30

申请号：EP02764463.2

申请日：2002-10-04

申请人： Université de Sherbrooke

发明人： BOULOS, Maher, I. ,  JUREWICZ, Jerzy, W.

IPC分类号： H05H1/30

CPC分类号： H05H1/30

摘要： An induction plasma torch comprises a tubular torch body, a gas distributor head located at the proximal end of the torch body for supplying at least one gaseous substance into the chamber within the torch body, a higher frequency power supply connected to a first induction coil mounted coaxial to the tubular torch body, a lower frequency solid state power supply connected to a plurality of second induction coils mounted coaxial to the tubular torch body between the first induction coil and the distal end of this torch body. The first induction coil provides the inductive energy necessary to ignite the gaseous substance to form a plasma. The second induction coils provide the working energy necessary to operate the plasma torch. The second induction coils can be connected to the solid state power supply in series and/or in parallel to match the impedance of this solid state power supply.

公开(公告)号：EP1360880A1

公开(公告)日：2003-11-12

申请号：EP01989367.6

申请日：2001-12-05

申请人： Robert Bosch GmbH

发明人： GROSSE, Stefan ,  HENKE, Sascha ,  SPINDLER, Susanne

IPC分类号： H05H1/30 ,  H01J37/32

CPC分类号： H01J37/32357 ,  C23C16/513 ,  C23C16/515 ,  H01J37/32706 ,  H05H1/30

摘要： A plasma unit with an inductively-coupled, high-frequency plasma beam source (5), comprising a burner body (25), defining a plasma generation chamber (27), an outlet opening (26) for the plasma beam (20), a coil (17) partly surrounding the plasma generation chamber (27), an inlet (10), for introduction of a gas or and/or precursor material into the plasma generation chamber (27) and a high frequency generator (16), connected to said coil (17), for initiating the plasma and injecting an electrical power into the plasma (21) is disclosed. The plasma beam source (5) further comprises an electrical component, by means of which the intensity of the plasma beam (20) may be intermittently altered in a periodic manner. The invention further relates to a method for the generation of a functional coating on a substrate (19) by means of the plasma unit.

摘要翻译： 一种具有电感耦合的高频等离子体束源（5）的等离子体单元，包括限定等离子体生成室（27），等离子体束（20）的出口开口（26）的等离子体生成室（27）的燃烧器主体（25） 部分包围等离子体发生室（27）的线圈（17），用于将气体或和/或前体材料引入等离子体发生室（27）和高频发生器（16）的入口（10） 到所述线圈（17），用于启动等离子体并将电功率注入等离子体（21）中。 等离子体束源（5）还包括电子元件，借助于该电子元件，等离子束（20）的强度可以周期性地间歇性地改变。 本发明还涉及借助于等离子体单元在衬底（19）上产生功能涂层的方法。

公开(公告)号：EP1305604A1

公开(公告)日：2003-05-02

申请号：EP01947049.1

申请日：2001-07-04

申请人： Varian Australia Pty. Ltd.

发明人： HAMMER, Michael, Ron

IPC分类号： G01N21/73 ,  H05H1/30

CPC分类号： H05H1/46 ,  H05H1/30 ,  H05H2001/4622

摘要： A plasma source for a spectrometer for spectrochemical analysis of a sample is characterised by use of the magnetic field component of applied microwave energy for exciting a plasma. The source includes a waveguide cavity (10) fed with TE10 mode microwave power. A plasma torch (16) passes through the cavity (10) and is axially aligned with a magnetic field maximum (18) of the applied microwave electromagnetic field. Magnetic field concentration structures such as triangular section metal bars (20) may be provided. In an alternative embodiment a resonant iris may be provided within a waveguide and the plasma torch positioned relative thereto such that the microwave electromagnetic field at the resonant iris excites the plasma.

公开(公告)号：EP1292176A2

公开(公告)日：2003-03-12

申请号：EP02019754.7

申请日：2002-09-04

申请人： TePla AG

发明人： Konavko, Rudolph ,  Konavko, Arkady ,  Schmid, Hermann

IPC分类号： H05H1/30

CPC分类号： H05H1/30 ,  H05H2001/3484

摘要： Die Erfindung betrifft eine Vorrichtung zum Erzeugen eines chemisch aktiven Strahls (Aktivgasstrahls 6) mittels eines durch elektrische Entladung in einem Prozessgas (1) generierten Plasmas.
Die Aufgabe, eine neue Möglichkeit zum Erzeugen eines chemisch aktiven Strahls mittels eines durch elektrische Entladung generierten Plasmas zu finden, bei der bei erhöhter Prozessgasgeschwindigkeit der Aktivgasstrahl (6) auf der zu bearbeitenden Oberfläche (7) eine hohe chemische Aktivität entfaltet und bereits am Ausgang der Vorrichtung elektrisch neutral ist, so dass er keine Gefährdung für Bedienpersonal, Umgebung und bearbeitete Oberfläche darstellt, wird erfindungsgemäß gelöst, indem die Entladungskammer (2) ein konisch verjüngtes Ende (21) zur Erhöhung der Geschwindigkeit des Aktivgasstrahls (6) aufweist und dem verjüngten Ende (21) der Entladungskammer (2) ein Begrenzungskanal (4) zur Verhinderung der Ausbreitung der Entladungszone (22) in den freien Raum für die zu bearbeitende Oberfläche (7) nachgeordnet ist, wobei der Begrenzungskanal (4) im Wesentlichen zylinderförmig ausgebildet und geerdet ist und dessen Länge um den Faktor 5 bis 10 größer als sein Querschnitt ist.

摘要翻译： 等离子体在具有增加活性气体射流（6）的速度的圆锥形变窄端（21）的圆柱形放电室（2）中产生。 邻接狭窄端是限制通道（4），其防止从排放区（22）扩展到自由空间。 限制通道为圆柱形，接地，长度为其直径的5至10倍。

公开(公告)号：EP1284589A2

公开(公告)日：2003-02-19

申请号：EP02017831.5

申请日：2002-08-08

申请人： MTU Aero Engines GmbH ,  DaimlerChrysler AG

发明人： Bayer, Erwin, Dr. ,  Laure, Stefan ,  Steinwandel, Jürgen, Dr.

IPC分类号： H05H1/30

CPC分类号： H05H1/30

摘要： Die Erfindung betrifft ein Verfahren zum Plasmaschweißen mittels eines freien radiofrequenzinduzierten Plasmastrahls. Gemäß der Erfindung wird der rf-induzierte Plasmastrahl mittels folgender Verfahrensschritte erzeugt:

Erzeugung eines stationären Hochdruck-Plasmas (2) durch Zündung eines ersten Prozessgases in einem Pilot-Plasmabrenner (1) und Einleiten des Plasmagases (2) in ein rf-transparentes Arbeitsrohr (3) umfassend eine Gaseintrittsöffnung (4) und eine Gasaustrittsöffnung (5), wobei das rf-transparente Rohr (3) von einer Koppelspule (13) umwickelt ist,
Einleiten eines zweiten Prozessgases (6) in das rf-transparente Rohr (3) bei einem Druck p ≥ 1 bar, wobei das zweite Prozessgas (6) durch die Gaseintrittsöffnung (4) derart in das rf-transparente Rohr (3) eingeleitet wird, dass es eine tangentiale Strömungskomponente aufweist,
Erzeugung eines rf-Plasmas (7) im rf-transparenten Rohr (3) mittels elektrodenlosem Zünden des Gasgemischs (2, 6),
Erzeugung eines Plasmastrahls (8) mittels Einleiten des Plasmas (7) in den Arbeitsraum (9) durch eine an der Gasaustrittsöffnung (5) des Rohrs (3) angeordnete metallische Expansionsdüse (10).

摘要翻译： 使用自由射频感应等离子体束的等离子体焊接包括通过点燃先导式等离子体燃烧器（1）中的第一工艺气体来形成固定的高压等离子体（2），并将等离子体气体引入射频透明操作管（3） 包括气体入口（4）和气体出口（5）; 在压力p≥1巴下将第二工艺气体（6）引入管中，使其具有切向流动分量; 使用气体混合物（2,6）的无电点火在管中形成射频等离子体（7）; 以及通过在所述管的所述气体出口上的金属膨胀喷嘴（10）将所述射频等离子体引入所述工作室（9）中而形成等离子体束（8）。 优点：金属膨胀喷嘴被冷却。 使用150kHz至150MHz的频率范围内的无线电波作为电感耦合的结果产生射频等离子体。 透明操作管由纯的形式的SiO 2或Al 2 O 3制成而没有掺杂剂。

公开(公告)号：EP0851572B1

公开(公告)日：2002-11-20

申请号：EP97121984.5

申请日：1997-12-12

申请人： The Perkin-Elmer Corporation

发明人： Morrisroe, Peter J. ,  Gagne, Peter H.

IPC分类号： H03B5/12 ,  H05H1/30

CPC分类号： H05H1/36 ,  H03B5/1203 ,  H03B5/1228 ,  H03B5/129 ,  H03B5/1296 ,  H03B2200/0062 ,  H03B2200/0098

公开(公告)号：EP0867105B1

公开(公告)日：2002-07-24

申请号：EP96940951.5

申请日：1996-12-10

申请人： MDS Inc.

发明人： FRENCH, John, Barry ,  JONG, Raymond ,  ETKIN, Bernard

IPC分类号： H05H1/30

CPC分类号： H05H1/30 ,  H05H2001/3468 ,  H05H2001/3478

摘要： A torch for Inductively Coupled Plasma Spectrometry (ICPS) is formed from quartz and has inner and outer tubes defining an annular channel. The end of the inner tube is within an end portion of the outer tube, to define a chamber for a plasma ball. An inlet for a main gas flow opens tangentially into the annular channel. The annular channel is configured so as to maximize the swirl component of this flow. To this end, a connection to the inlet is provided with an annular toroidal shape, having a cross section to or larger than the inlet. Further, the inlet is mounted relatively close to the end of the inner tube, so as to minimise decay of the swirl component as the gas flows along the annular channel, the length of the annular channel being sufficient to ensure that the flow leaving the annular channel is uniform and has a uniform swirl component. This arrangement enables a significantly reduced consumption of gas to generate a plasma ball, and can give improved performance, in terms of a higher detection rate in a spectrometer.

公开(公告)号：EP1190605A1

公开(公告)日：2002-03-27

申请号：EP00937329.1

申请日：2000-05-09

申请人： Daewon Paptin Foam Co., Ltd.

发明人： BARK, Yoo Byung ,  TAKTAKKISHVILI, M. I. ,  GRITSININ, S. I. ,  KOSSYI, Igor

IPC分类号： H05H1/30

CPC分类号： H01J37/3222 ,  H05H1/30

摘要： A microwave plasma burner is disclosed in which a high temperature plasma is generated. The microwave plasma burner includes a wave inducing tube (210) for receiving and guiding microwaves from an antenna (110) of a magnetron (100) within a wave guide resonator (200), so as to generate a high temperature plasma by causing vibrations of an injected gas by the help of the microwaves while discharging the injected gas. The microwave plasma burner according to the present invention gives the following effects. A strong high temperature plasma can be generated with a structure not involving vacuum. The flames are generated by the heat which is generated by the vibrations of air, and therefore, a separate igniting device is not required. High temperature flames are generated, and therefore, the burner of the present invention can be used for welding and cutting. A complete combustion occurs due to the heat which is generated by the vibrations, and therefore, any air pollution can be prevented. A desired gas can be selected, and therefore, any oxidation can be prevented during a welding.

公开(公告)号：EP1077020A1

公开(公告)日：2001-02-21

申请号：EP99916986.5

申请日：1999-05-04

申请人： Chapel et Cie. ,  Dürr, Henri

发明人： DÜRR, Henri

IPC分类号： H05H1/30

CPC分类号： H03B5/1835 ,  H05H1/30

摘要： The invention concerns a device for high frequency treatment of a liquid, solid or gaseous product comprising at least one treatment inductance (2) enclosing a tubular conduit (1) designed to be passed through by a stream of the product to be treated, said inductance (2) being powered by a high-frequency generator (3) via coupling means (22, 24). The inductance (2) has non-contiguous windings and the high-frequency generator (3) comprises a single oscillator power tube (4) connected to the high voltage distribution line, an oscillatory circuit with distributed constant (15) whereof the characteristics L, C determine the oscillation frequency required from the generator, said oscillatory circuit (15) being connected to the oscillator tube (4) anode via an insulating capacitor (14) relative to the high voltage supply continuous component, the high voltage distribution line being connected to the tube (4) cathode (5) via an element (6, 17, 18) determining the voltage and the high frequency signal phase, forming part of a complex reaction circuit connected between the oscillatory circuit (15) and the oscillating lamp (4) cathode (5).

公开(公告)号：EP0985331A1

公开(公告)日：2000-03-15

申请号：EP98928393.2

申请日：1998-05-29

申请人： CENTRE NATIONAL DELA RECHERCHE SCIENTIFIQUE

发明人： TRASSY, Christian

IPC分类号： H05H1/30

CPC分类号： B22F9/082 ,  B01J2219/0894 ,  B22F1/0085 ,  C01F7/424 ,  H05H1/30

摘要： The invention concerns an inductive plasma torch comprising an external tube, an intermediate tube and a central injector (16) including at least a central tube (20, 21) injecting reagent and a peripheral sheathing tube (22). A gas similar to plasma gas is injected into the space between the central tube (20, 21) and the sheathing tube (22), in conditions suited for obtaining a laminar flow, said flow remaining laminar up to the plasma torch central zone. The sheathing tube emerges substantially at the first turn of the inductor coil.