-
公开(公告)号:EP0179196B1
公开(公告)日:1989-01-04
申请号:EP85107231.4
申请日:1985-06-13
IPC分类号: H01L21/00 , H01L21/28 , H01L21/265
CPC分类号: H01L29/66659 , H01L21/0337 , H01L21/26586 , H01L21/2815 , H01L29/42376 , H01L29/66545 , Y10S148/082
-
82.A process for ion implantation activation in a compound semiconductor crystal 失效
标题翻译: 一种化合物半导体晶体中离子注入活化的方法公开(公告)号:EP0169020B1
公开(公告)日:1988-10-26
申请号:EP85304901.3
申请日:1985-07-09
IPC分类号: C23C14/48 , H01L21/265
CPC分类号: C23C14/0617 , C23C14/58 , C23C14/5806 , C23C14/5893 , H01L21/26546 , H01L21/3245
-
-
公开(公告)号:EP0135179B1
公开(公告)日:1988-08-03
申请号:EP84110261.9
申请日:1984-08-29
-
公开(公告)号:EP0082331B1
公开(公告)日:1988-06-08
申请号:EP82110812.3
申请日:1982-11-23
IPC分类号: H01L29/90
CPC分类号: H01L29/866
-
公开(公告)号:EP0113074B1
公开(公告)日:1988-05-25
申请号:EP83112244.5
申请日:1983-12-06
CPC分类号: H01L27/14643 , A61M2025/1059 , H01L31/101 , H03K19/14
-
87.A record disk bearing a servo pattern and record disk apparatus comprising such a record disk 失效
标题翻译: 包含这样一个记录盘的伺服模式和记录盘装置的记录盘公开(公告)号:EP0130495B1
公开(公告)日:1988-03-30
申请号:EP84107149.1
申请日:1984-06-22
发明人: Johnson, Mark
IPC分类号: G11B5/82
CPC分类号: G11B5/5526 , B82Y10/00 , G11B5/59677 , G11B5/59688 , G11B5/743 , G11B5/82 , G11B21/085 , G11B23/42
-
88.A metal organic chemical vapour deposition process for depositing silicon doped intermetallic semiconductor compounds 失效
标题翻译: 用于沉积硅掺杂的半导体半导体化合物的金属有机化学气相沉积工艺公开(公告)号:EP0148357B1
公开(公告)日:1988-02-10
申请号:EP84113329.1
申请日:1984-11-06
IPC分类号: C30B25/02 , H01L21/205
CPC分类号: H01L21/0262 , H01L21/02546 , H01L21/02576 , Y10S252/951 , Y10S438/925
-
89.Air cooling and filtering system for magnetic disk data storage device 失效
标题翻译: 用于磁盘数据存储设备的空气冷却和过滤系统公开(公告)号:EP0123130B1
公开(公告)日:1987-08-05
申请号:EP84103040.6
申请日:1984-03-20
IPC分类号: H05K7/20
CPC分类号: G11B33/142 , H05K7/206
-
90.A photoresist composition and a process using that photoresist composition 失效
标题翻译: Photolackzusammensetzung und deren Verwendung。公开(公告)号:EP0220578A2
公开(公告)日:1987-05-06
申请号:EP86114063.0
申请日:1986-10-10
CPC分类号: G03F7/095 , G03F7/008 , G03F7/0226
摘要: A photoresist composition comprising a matrix resin and two photoactive additives, one of which causes acceleration of dissolution upon irradiation and one of which causes deceleration of dissolution upon irradiation, the photoactive additives being such that the dissolution-accelerating additive is activated by at least one narrow bandwidth of radiation which does not activate the dissolution-decelerating additive. Self aligned multilayer or multi-level structures can be made by a process using that photoresist composition.
摘要翻译: 一种光致抗蚀剂组合物,其包含基质树脂和两种光活性添加剂,其中之一导致照射时加速溶解,其中一种导致照射时溶解减慢,光活性添加剂使得溶解促进添加剂被至少一个窄的 不激活溶解减速添加剂的辐射带宽。 可以通过使用该光致抗蚀剂组合物的方法制备自对准多层或多层结构。
-
-
-
-
-
-
-
-
-