A photoresist composition and a process using that photoresist composition
    90.
    发明公开
    A photoresist composition and a process using that photoresist composition 失效
    Photolackzusammensetzung und deren Verwendung。

    公开(公告)号:EP0220578A2

    公开(公告)日:1987-05-06

    申请号:EP86114063.0

    申请日:1986-10-10

    IPC分类号: G03F7/02 G03F7/08 G03F7/10

    摘要: A photoresist composition comprising a matrix resin and two photo­active additives, one of which causes acceleration of dissolution upon irradiation and one of which causes deceleration of dissolution upon irradiation, the photoactive additives being such that the dissolution-­accelerating additive is activated by at least one narrow bandwidth of radiation which does not activate the dissolution-decelerating additive. Self aligned multilayer or multi-level structures can be made by a process using that photoresist composition.

    摘要翻译: 一种光致抗蚀剂组合物,其包含基质树脂和两种光活性添加剂,其中之一导致照射时加速溶解,其中一种导致照射时溶解减慢,光活性添加剂使得溶解促进添加剂被至少一个窄的 不激活溶解减速添加剂的辐射带宽。 可以通过使用该光致抗蚀剂组合物的方法制备自对准多层或多层结构。