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81.发明公开METHOD FOR PRODUCING SILICA-BASED GLASS SUBSTRATE FOR IMPRINT MOLD, AND METHOD FOR PRODUCING IMPRINT MOLD 审中-公开用于生产在硅衬底上基础上玻璃冲压成型模具及其制造方法冲压FORM
公开(公告)号：EP2508492A1
公开(公告)日：2012-10-10
申请号：EP10834550.5
申请日：2010-11-30
发明人： KOIKE Akio , MIYASAKA Junko
CPC分类号： G03F7/0002 , B29C33/3842 , B82Y10/00 , B82Y40/00 , C03B19/14 , C03B2201/42 , C03C3/06 , C03C15/00 , C03C2201/42 , C03C2203/44
摘要： The present invention relates to a method for producing a silica glass substrate for an imprint mold, containing: obtaining a glass body from a glass-forming raw material containing an SiO 2 precursor; machining the glass body into a glass substrate having a predetermined shape; and removing an affected layer on a surface of the glass substrate, to produce a silica glass substrate for an imprint mold having a fictive temperature distribution in a region from the surface to a depth of 10 µm on the side to be subjected to a transfer pattern formation of the glass substrate being within ±30°C.
摘要翻译： 本发明涉及一种用于制造的石英玻璃基片用于向压印模具，包含：前体由玻璃形成原料含有SiO 2获得一个玻璃体; 加工所述玻璃体为具有预定形状的玻璃基板; 与玻璃基板的表面上的加工变质层的去除，以产生的石英玻璃基片用于以压印具有的区域中的假想温度分布从表面至10微米的深度上侧模要进行的转印图案 形成在玻璃基板的是±30℃以内
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公开(公告)号：EP2305612A4
公开(公告)日：2012-07-25
申请号：EP08790746
申请日：2008-06-30
申请人： TOYO GLASS CO LTD
发明人： ICHINOSE TOMOMI , ACHIWA TORU
IPC分类号： C03B37/016 , C03B19/12
CPC分类号： C03B37/016 , C03B19/12 , C03B37/027 , C03B2203/26 , C03C1/006 , C03C2201/40 , C03C2201/42 , C03C2203/26
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83.发明授权Titania-doped quartz glass and making method, euv lithographic member and photomask substrate 有权掺杂有用于EUV光刻掩模衬底的二氧化钛的石英玻璃的制造过程组件，以及
公开(公告)号：EP1795506B1
公开(公告)日：2011-02-23
申请号：EP06256239.2
申请日：2006-12-07
发明人： Maida, Shigeru, c/o Specialty Chemicals Research Center, , Yamada, Motoyuki, c/o Advanced Functional Materials Research Center,
CPC分类号： C03B19/1407 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1446 , C03B19/1453 , C03B19/1484 , C03B2201/42 , C03C3/06 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2201/42 , G03F1/24 , G03F1/60 , G21K2201/067
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84.发明公开Titania-doped quartz glass and making method, euv lithographic member and photomask substrate 有权掺杂有用于EUV光刻掩模衬底的二氧化钛的石英玻璃的制造过程组件，以及
公开(公告)号：EP1795506A1
公开(公告)日：2007-06-13
申请号：EP06256239.2
申请日：2006-12-07
发明人： Maida, Shigeru, c/o Shin-Etsu Chemical Co. Ltd. , Yamada, Motoyuki, Shin-Etsu Chemical Co. Ltd.
CPC分类号： C03B19/1407 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1446 , C03B19/1453 , C03B19/1484 , C03B2201/42 , C03C3/06 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2201/42 , G03F1/24 , G03F1/60 , G21K2201/067
摘要： A titania-doped quartz glass containing 3-12 wt% of titania at a titania concentration gradient less than or equal to 0.01 wt%/µm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
A method for preparing the titania-doped quartz glass by flame hydrolysis is also defined.摘要翻译： 掺杂二氧化钛的石英玻璃在二氧化钛浓度梯度小于或等于12:01重量％/微米含二氧化钛的3-12重量％，在厚度为具有明显的透射率的至少30％的440纳米波长的光的6.35毫米 正在寻求均匀性的确它提供了一个高的表面精度的要求用于EUV光刻部件，典型地是EUV光刻光掩模衬底。 因此定义一种制备由火焰水解的掺杂二氧化钛的石英玻璃的制造方法。
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公开(公告)号：EP1761469A1
公开(公告)日：2007-03-14
申请号：EP05757800.7
申请日：2005-06-30
发明人： KOIKE, Akio, c/o Asahi Glass Company, Limited , IWAHASHI, Yasutomi c/o Asahi Glass Company Limited , TAKIMOTO, Yasuyuki c/o Asahi Glass Company Limited , KIKUGAWA, Shinya, c/o Asahi Glass Company, Limited
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： It is to provide a silica glass containing TiO2, having a wide temperature range where wherein the coefficient of thermal expansion becomes is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass%, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200°C, a coefficient of thermal expansion from 0 to 100°C of 0±150 ppb/°C , and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.
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86.发明公开Functionalized sol-gel material, sol-gel film derived therefrom, and method for preparing the same 有权Funktionalisiertes溶胶凝胶材料，daraus hergestellte Sol-Gel Schicht und Verfahren zu dessen Herstellung
公开(公告)号：EP1616841A2
公开(公告)日：2006-01-18
申请号：EP04022465.1
申请日：2004-09-21
发明人： Jang, Guan-Way , Lin, Ya-Hui , Tsai, I-Chia , Tien, Pei , Sheen, Yuung-Ching
IPC分类号： C01G25/02 , C01G23/053 , C01G17/00 , C01G19/00 , C01F17/00 , C01B13/32 , C04B35/624 , C01B33/16
CPC分类号： C04B35/624 , C03C1/006 , C03C1/008 , C03C2201/31 , C03C2201/3423 , C03C2201/40 , C03C2201/42 , C03C2203/26 , C03C2203/27 , C03C2203/28 , C04B2235/3229 , C04B2235/3232 , C04B2235/3244 , C04B2235/3287 , C04B2235/3293 , C04B2235/3418 , C04B2235/441
摘要： A method of preparing a sol-gel material is described. A metal alkoxide and an organically modified Si-alkoxide having a predetermined functional group are dissolved in a first solvent and a second solvent to form a first solution and a second solution, respectively. The first solution and the second solution are then mixed and heated. As a result, the metal alkoxide reacts with the organically modified Si-alkoxide, and a functionalized sol-gel material is formed thereby. Furthermore, the solid content of the functionalized sol-gel material is increased by transferring the same into another solvent. Therefore, a thick sol-gel film is fabricated by means of the transferred functionalized sol-gel material.
摘要翻译： 描述了制备溶胶 - 凝胶材料的方法。 将金属醇盐和具有预定官能团的有机改性的Si-醇盐溶解在第一溶剂和第二溶剂中以分别形成第一溶液和第二溶液。 然后将第一溶液和第二溶液混合并加热。 结果，金属醇盐与有机改性的Si-醇盐反应，由此形成官能化的溶胶 - 凝胶材料。 此外，通过将官能化溶胶 - 凝胶材料的固体含量转移到另一溶剂中而增加。 因此，通过转移的官能化溶胶 - 凝胶材料制造厚溶胶 - 凝胶膜。
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87.发明公开
公开(公告)号：EP1481288A2
公开(公告)日：2004-12-01
申请号：EP03744207.6
申请日：2003-03-04
申请人： CORNING INCORPORATED
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , B82Y40/00 , C03B19/1446 , C03B19/1484 , C03B2201/42 , C03B2207/62 , C03B2207/66 , C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/40 , G03F1/24 , G03F7/70958
摘要： Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
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公开(公告)号：EP1402093A1
公开(公告)日：2004-03-31
申请号：EP02782422.6
申请日：2002-07-03
发明人： MOLINS, Laurent
CPC分类号： C03C13/00 , C03C3/06 , C03C2201/32 , C03C2201/42 , D01F9/08 , Y10T428/29 , Y10T428/2933
摘要： The invention concerns a silica yarn, woven or non-woven textiles made from said yarn, comprising 30 to 1500 ppm by weight of aluminium and 10 to 200 ppm by weight of titanium in oxidised form, the sum of the mass of the different chemical elements of Si and O being less than 5000 ppm by weight, the following elements being absent or present in very low amounts: boron, sodium, calcium, potassium, lithium. The textiles comprising said yarn exhibit excellent resistance to high temperature, and thus maintain their flexibility for long time at more than 600 °C. They are useful in particular for applications requiring good flexibility at high temperature such as for oven joints.
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公开(公告)号：EP0973957A1
公开(公告)日：2000-01-26
申请号：EP98908711.9
申请日：1998-02-25
申请人： CORNING INCORPORATED
CPC分类号： C03C3/06 , C03C25/1061 , C03C2201/42 , C03C2203/40 , C03C2203/50
摘要： This invention relates to production of high purity fused silica glass doped with titania using titanium chelates. Useful chelates include titanium acetylacetonate, and titanium ethyl acetoacetate among others.
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公开(公告)号：EP0797548B1
公开(公告)日：2000-01-12
申请号：EP96931931.8
申请日：1996-10-10
CPC分类号： H01K1/32 , C03C3/06 , C03C2201/36 , C03C2201/42
摘要： The electric incandescent lamp has a quartz glass lamp vessel (1) or envelope (4') around the lamp vessel, which has a red coloured dope in the area at the side of the incandescent body (3). The quartz glass with red dope contains samariumII oxide, aluminium oxide, titanium dioxide, and silicon dioxide, the analysis of the glass in its oxidized form being Sm¿2?O3 1 to 3 % by weight, Al2O3 up to 3 % by weight, TiO2, rest SiO2, the molar ratio Al/Sn being at least about 2 and the molar ratio Sm/Ti being from 2 to 8.
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