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    Vakuum-Beschichtungsanlage
    82.
    发明公开
    Vakuum-Beschichtungsanlage 有权
    VAKUUM-Beschichtungsanlage

    公开(公告)号：EP1050597A2

    公开(公告)日：2000-11-08

    申请号：EP00107653.8

    申请日：2000-04-10

    申请人： Satis Vacuum Industries Vertriebs - AG

    发明人： Siegrist, Beat

    IPC分类号： C23C14/24 ,  C23C14/50 ,  G02B1/00

    CPC分类号： C23C14/505

    摘要： Die Vakuum-Beschichtungsanlage zum Aufdampfen von Vergütungsschichten auf optische Substrate, wie Kunststoff-Brillengläser, welche auf domförmige Trägermittel (1) aufspannbar sind, die in einem evakuierbaren Rezipienten (2) oberhalb von Verdampfungsquellen (20) mit einer Drehachse (3) drehfest umlaufen, umfasst innenseitig des Rezipienten (2) einen, mit der Drehachse (3) drehfest verbundenen, der einschiebbaren und verriegelbaren Aufnahme des Substrat-Trägers (1) dienenden Rahmen (4). Hierbei ist der Rahmen (4) über geneigte Speichen (5,6) an der Drehachse (3) abgestützt, wobei mit dem Rahmen drei Speichen (5,6) verbunden sind, von denen zwei Speichen (5) in Umfangsrichtung um 180° versetzt angeordnet sind und sich die dritte Speiche (6) symmetrisch dazwischen befindet.

    摘要翻译： 一种用于形成在光学基底上的层的真空沉积装置，其分散在围绕设置在蒸气源（20）上方的可抽空的容器（2）中的可旋转轴（3）旋转的圆顶状载体结构（1）上。 轴（3）保持在容器（2）的内部，衬底托架被安装件（4）包围。 支架支撑在轴（3）上的倾斜轮辐（5,6）上。 两个轮辐（5）在圆周方向上以180度定向，并且第三轮辐（6）对称地放置在两个轮辐（5）之间。

    VAKUUMBESCHICHTUNGSANLAGE UND KOPPLUNGSANORDNUNG
    84.
    发明公开
    VAKUUMBESCHICHTUNGSANLAGE UND KOPPLUNGSANORDNUNG 有权
    真空涂布设备和耦合器件

    公开(公告)号：EP1025277A1

    公开(公告)日：2000-08-09

    申请号：EP98943617.5

    申请日：1998-09-25

    申请人： Unaxis Trading AG

    发明人： HANS, Michael ,  ZAECH, Martin

    IPC分类号： C23C14/56 ,  B01J3/03 ,  C23C14/50

    CPC分类号： C23C14/505 ,  B01J3/03 ,  C23C14/566 ,  C23C14/568

    摘要： A central distribution chamber (4), which can be evacuated and which has a robotic transportation system (43), is arranged on a vacuum coating installation. Several processing stations (59, 65, 67) are flange-mounted on the distribution chamber. A work piece holder serving as a material to be treated is transported in the distribution chamber and processed in the processing stations (59-67), wherein a plurality of work piece supports are provided. A drive mechanism (A) is provided for the releasable connection to the work piece supports at least in the processing stations of the installation.

    DREHVORRICHTUNG ZUR PLASMA-IMMERSIONS-GESTÜTZTEN BEHANDLUNG VON SUBSTRATEN
    88.
    发明公开
    DREHVORRICHTUNG ZUR PLASMA-IMMERSIONS-GESTÜTZTEN BEHANDLUNG VON SUBSTRATEN 有权
    转向装置用于衬底的等离子体浸没式辅助治疗

    公开(公告)号：EP0966552A1

    公开(公告)日：1999-12-29

    申请号：EP98962180.0

    申请日：1998-10-26

    申请人： ROBERT BOSCH GMBH

    发明人： NEIDHARDT, Ronald ,  FORGET, Jeanne ,  KOHLHOF, Karl ,  SCHOSER, Siegmar

    IPC分类号： C23C14 ,  C23C16

    CPC分类号： C23C14/48 ,  C23C14/505 ,  C23C16/4584

    摘要： The invention relates to a rotating drive especially suited for carrying out a plasma immersion supported treatment of three dimensional work pieces. This rotating device (10) has rotatable rods (1, 11) on which a high voltage is only applied Said rods serve as sample holders and are mounted such that they can be removed. The high voltage is supplied to the lower end of the rods via a central high voltage feed (9), whereas the actual driving elements (7, 17) for rotating the rods (1, 11) are electrically insulated from said rods by suitable ceramic insulating bodies (2, 3, 12, 13).

    SHEET-FORM MAGNETRON SPUTTERING DEVICE
    89.
    发明公开
    SHEET-FORM MAGNETRON SPUTTERING DEVICE 失效
    MAGNETRONSPUTTERVORRICHTUNG IN FORE EINES BLECHES

    公开(公告)号：EP0933444A1

    公开(公告)日：1999-08-04

    申请号：EP98932581.6

    申请日：1998-07-17

    申请人： Shibaura Mechatronics Corporation

    发明人： IKEDA, Jiro ,  KINOKIRI, Kyoji

    IPC分类号： C23C14/56 ,  C23C14/50 ,  C23C14/34 ,  C23C14/35 ,  C23C14/04 ,  G11B7/26 ,  G11B7/28

    CPC分类号： C23C14/505 ,  C23C14/042 ,  C23C14/35 ,  C23C14/56 ,  G11B7/26 ,  H01J37/3408

    摘要： The purpose of this invention is to provide a magnetron sputtering apparatus capable of attaching masks on disk substrates and capable of conducting sputtering while disk substrates are being rotated on the central axis without complicated mechanisms or complicated processes.
    For this purpose, in the sputtering apparatus of this invention, a magnetic field generating means is provided above the sputtering chamber so as to apply magnetic field in the sputtering chamber 11 providing discharge space. A target 21 is arranged at the upper portion of this sputtering chamber 11 so that the magnetic field by said magnetic field generating means is applied. A disk transport chamber is provided which is connected to said sputtering chamber 11 through the opening 32 formed on the bottom wall 30. In this disk transport chamber 12, a disk pusher 34 is provided which places thereon the disk substrate 31 for depositing sputter film, transports to the opening 32 of said sputtering chamber 11 and rotates said disk substrate 31 on the plane of said disk pusher. In the sputtering chamber 11, a rotation center mask 27 is provided which makes contact with the upper center portion of said disk substrate 31 placed on said disk pusher 34, and rotates with the rotation of said disk substrate 31.

    摘要翻译： 本发明的目的是提供一种磁控管溅射装置，其能够在圆盘基板在中心轴线上旋转而在复杂的机构或复杂的过程中能够在盘基板上附加掩模并且能够进行溅射。 为此，在本发明的溅射装置中，在溅射室的上方设置有磁场产生装置，以便在提供放电空间的溅射室11内施加磁场。 在该溅射室11的上部设有靶21，使得施加由所述磁场产生装置产生的磁场。 提供了一个通过形成在底壁30上的开口32连接到溅射室11的盘传送室。在这个盘传送室12中，设有一盘盘推动器34，盘推动器34放置有用于沉积溅射膜的盘基片31， 运送到所述溅射室11的开口32，并使盘基板31在所述盘推动器的平面上旋转。 在溅射室11中，设置旋转中心掩模27，该旋转中心掩模27与放置在盘推动器34上的盘基片31的上中心部分接触，并随着盘基片31的旋转而旋转。

    Modular fixture for coating apparatus
    90.
    发明公开
    Modular fixture for coating apparatus 失效
    Halter mit modularem AufbaufürBeschichtungsanlage

    公开(公告)号：EP0863226A1

    公开(公告)日：1998-09-09

    申请号：EP97117928.8

    申请日：1997-10-16

    申请人： UNITED TECHNOLOGIES CORPORATION

    发明人： Burns, Steven M. ,  Nehez, William A.

    IPC分类号： C23C14/50 ,  C23C14/04

    CPC分类号： C23C14/50 ,  C23C14/042 ,  C23C14/505

    摘要： The present invention relates to an apparatus for simultaneously coating a plurality of workpieces (54). The apparatus includes a module (10) fixture having a plurality of bushing (48) and spindle (64) arrangements for supporting the workpieces to be coated. The bushing and spindle arrangements allow each workpiece to rotate about its longitudinal axis (122) and tilt along an axis (14) which intersects the rotational axis of the fixture. By providing such a bushing and spindle arrangement, it is possible to coat surfaces of the workpiece which are substantially perpendicular to other surfaces of the workpiece. A process for simultaneously coating the workpieces is also described. The process comprises the steps of mounting a plurality of workpieces to the fixture so that the workpieces can roll about their longitudinal axes and so that the workpieces are positioned at an angle with respect to the rotational axis of the fixture, rotating the fixture about its rotational axis so as to cause said workpieces to roll, and exposing the workpieces to a coating material as the fixture is being rotated.

    摘要翻译： 本发明涉及同时涂覆多个工件（54）的装置。 该装置包括具有多个衬套（48）和用于支撑要涂覆的工件的主轴（64）装置的模块（10）固定装置。 衬套和主轴装置允许每个工件围绕其纵向轴线（122）旋转并且沿着与固定装置的旋转轴线相交的轴线（14）倾斜。 通过提供这种衬套和主轴布置，可以涂覆基本上垂直于工件的其它表面的工件的表面。 还描述了同时涂覆工件的工艺。 该方法包括以下步骤：将多个工件安装到固定装置上，使得工件能够围绕其纵向轴线滚动，并且使得工件相对于固定装置的旋转轴线成一角度定位， 以使所述工件滚动，并且随着固定装置的旋转，将工件暴露于涂料。