公开(公告)号：EP1239509A1

公开(公告)日：2002-09-11

申请号：EP02004970.6

申请日：2002-03-05

Applicant: Nikon Corporation

Inventor： Sogard, Michael

IPC: H01J37/141 ,  H01J37/18 ,  H01J37/301

CPC classification number: H01J37/18 ,  H01J37/141 ,  H01J37/301

Abstract: A lens assembly for use with an electron beam optical system operating in a vacuum. The lens assembly includes a housing forming a sealed enclosure and at least one lens disposed within the housing. The housing includes a port for connection to a vacuum source for creating a vacuum in the sealed enclosure. A method of creating a vacuum within the lens assembly is also disclosed.

Abstract translation: 一种与在真空中工作的电子束光学系统一起使用的透镜组件。 透镜组件包括形成密封外壳的壳体和设置在壳体内的至少一个透镜。 壳体包括用于连接到真空源的端口，用于在密封外壳中产生真空。 还公开了在透镜组件内产生真空的方法。

公开(公告)号：EP0776026B1

公开(公告)日：2001-10-31

申请号：EP96304288.2

申请日：1996-06-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jeon, Jae-sun ,  Yang, Yun-mo ,  Kim, Won-yeong ,  Chae, Seung-ki

IPC: H01L21/00

CPC classification number: H01L21/67748 ,  C23C14/566 ,  H01J37/18 ,  H01J37/3244 ,  H01J37/32743 ,  H01J2237/184 ,  H01L21/67017 ,  H01L21/67201 ,  H01L21/67739 ,  Y10S414/139

公开(公告)号：EP0856872A3

公开(公告)日：2000-12-13

申请号：EP98101410.3

申请日：1998-01-27

Applicant: NIKON CORPORATION

Inventor： Morita,Kenji, Nikon Corporation ,  Nakasuji,Mamoru, Nikon Corporation

IPC: H01L21/00 ,  G03F7/20

CPC classification number: G03F7/70716 ,  H01J37/18 ,  H01J2237/204 ,  H01J2237/3175

Abstract: Apparatus and methods are disclosed for increasing the throughput of a charged-particle-beam exposure apparatus while maintaining alignment and exposure accuracy. The apparatus comprises a main chamber where exposure of sensitive substrates is performed using a charged-particle beam. At least one transport system moves and prepares the sensitive substrates for exposure in the main chamber. The transport system comprises at least one chamber. An evacuation device and a venting device are used to vary the pressure in the chambers as required. At least one switching valve is situated between the main chamber and a chamber in the transport system to isolate these chambers from one another. A flexible conduit connects the main chamber to the transport system. The apparatus and methods have especial utility for the processing of sub-micron level semiconductors.

公开(公告)号：EP1034377A1

公开(公告)日：2000-09-13

申请号：EP98955258.3

申请日：1998-11-18

Applicant: Danilatos, Gerasimos Daniel

Inventor： Danilatos, Gerasimos Daniel

IPC: F04F5/20 ,  F04F5/46 ,  H01J37/301

CPC classification number: H01J37/18 ,  F04F5/20 ,  F04F5/465 ,  H01J37/301 ,  H01J2237/188 ,  H01J2237/2605

Abstract: An aperture (5) connects a first chamber (1) with a second chamber (2), and is surrounded by an annular nozzle (7) formed by inner and outer walls (6, 8), which connects the first chamber (1) with a third chamber (3). A supersonic annular gas jet (9) is ejected by the annular nozzle (7) into the first chamber (1), creating a Venturi pumping action at the core of the jet in the vicinity of the aperture (5). The second chamber (2) may thus be maintained at a substantially lower pressure than the first chamber (1). Inner wall (6) and outer wall (8) may be relatively movable for varying gas flow, and the first chamber (1) may include baffles or skimmers to modify gas flow, e.g., to create a high density molecular beam. An electron or ion beam (4) may be transferred from the second chamber (2) to the first chamber (1), e.g., as part of an environmental scanning electron microscope.

公开(公告)号：EP0880798A1

公开(公告)日：1998-12-02

申请号：EP97908672.0

申请日：1997-02-14

Applicant: Eaton Corporation

Inventor： BRAILOVE, Adam, A. ,  ROSE, Peter, H. ,  BLAKE, Julian, G. ,  YANG, Zhongmin ,  PURSER, Kenneth, H.

IPC: H01J27 ,  H01J37 ,  H01L21

CPC classification number: H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705 ,  H01L21/67069 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838

Abstract: A system and method for conductively and/or convectively transferring heat away from a workpiece that has been processed by a processing system, such as an ion implantation system. The conductive transfer of heat from the workpiece is effectuated by disposing the workpiece in relatively close proximity with a floor of a load lock, which is maintained at a relatively cool temperature. The chamber pressure is disposed at a selected pressure by a pressure regulator and a vacuum pressure is applied to the backside of the workpiece closest to draw the workpiece into contact with the chamber floor, thereby effecting heat transfer from the workpiece to the cooling surface.

公开(公告)号：EP0680071A3

公开(公告)日：1996-04-03

申请号：EP95302587.1

申请日：1995-04-19

Applicant: APPLIED MATERIALS, INC.

Inventor： Rice, Michael ,  Askarinam, Eric

IPC: H01J37/32 ,  H01J37/18 ,  F16J15/32

CPC classification number: H01L21/67126 ,  H01J37/18 ,  H01J37/32431 ,  H01J2237/166 ,  Y10S277/913

Abstract: The disclosure relates to a vacuum seal that can be used in a plasma etch reactor to seal the chamber interior (10) from the outside environment consists of a protective collar (66) that is injection molded or machined of a high strength, high temperature and corrosion resistant thermoplastic material. The collar has an elastomeric gasket (68) installed therein and is used in combination with a second elastomeric gasket (76) to achieve a fluid-tight seal between two rigid surfaces (74,72) made of silicon and quartz, respectively.

公开(公告)号：EP0594084A1

公开(公告)日：1994-04-27

申请号：EP93116733.2

申请日：1993-10-15

Applicant: HITACHI, LTD.

Inventor： Todokoro, Hideo ,  Otaka, Tadashi

IPC: H01J37/28

CPC classification number: H01J37/18 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/04756 ,  H01J2237/057 ,  H01J2237/18 ,  H01J2237/204 ,  H01J2237/244

Abstract: In a scanning electron microscope a retarding static field for an electron beam is produced between an objective lens (17) and a sample (18), by closing a switch (S2) for applying a superimposed voltage (6) to the sample (18), when the following three conditions are met: in the first condition, a switch (S1) for applying an acceleration voltage (5) is closed. In the second condition, both of a valve (G1) and a valve (G2) are opened which are provided between a cathode (1) and the sample (18). In the third condition, when the sample (18) is mounted on a sample stage (19) by a sample replacing mechanism (77), a valve (G3) through which the sample passes is closed. The sample stage (19) is electrically connected via a discharge resistor (R) to a sample holder (21), and when the switch (S2) is opened, electric charges accumulated on the sample (18) are discharged through the sample holder (21) and the sample stage (19). As a result, when the sample (18) is mounted onto or released from the sample stage, the application of voltage to the sample (18) is automatically interrupted.

Abstract translation: 在扫描电子显微镜中，通过闭合用于向样品（18）施加叠加电压（6）的开关（S2），在物镜（17）和样品（18）之间产生用于电子束的延迟静电场， 当满足以下三个条件时：在第一条件下，用于施加加速电压（5）的开关（S1）闭合。 在第二条件下，打开设置在阴极（1）和样品（18）之间的阀（G1）和阀（G2）。 在第三条件下，当样品（18）通过样品置换机构（77）安装在样品台（19）上时，样品通过的阀（G3）关闭。 样品台（19）通过放电电阻（R）与样品架（21）电连接，当开关（S2）打开时，累积在样品（18）上的电荷通过样品架（ 21）和样品台（19）。 结果，当将样品（18）安装到样品台上或从样品台释放时，自动中断向样品（18）施加电压。

公开(公告)号：EP0392704B1

公开(公告)日：1993-10-20

申请号：EP90303380.1

申请日：1990-03-29

Applicant: CAMBRIDGE VACUUM ENGINEERING LTD.

Inventor： Trillwood, Richard E.

IPC: B23K15/00

CPC classification number: H01L21/67748 ,  B23K15/06 ,  H01J37/18 ,  H01L21/67126 ,  Y10S414/139

公开(公告)号：EP0461683A2

公开(公告)日：1991-12-18

申请号：EP91115536.4

申请日：1984-02-23

Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA

Inventor： Fukuta, Kenji, c/o TOYOTA JIDOSHA KABUSHIKI KAISHA ,  Kaneko, Takaoki, c/o TOYOTA JIDOSHA K.K. ,  Takahashi, Yoshinobu, c/o TOYOTA JIDOSHA K.K.

IPC: B29C59/14 ,  B01J3/00 ,  H01J37/18 ,  H01J37/32

CPC classification number: H01J37/32357 ,  B01J2219/0894 ,  B01J2219/1942 ,  B29C59/14 ,  B29K2023/00 ,  H01J37/18 ,  H01J2237/1825 ,  H01J2237/336

Abstract: An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber, comprises a plurality of long plasma-irradiating tubular pipes, each of which is provided along the length thereof with numerous small holes for injecting plasma, and at least one plasma-irradiating straight pipe disposed with its free end opening toward a section to which the plasma is hard to flow. At least one second plasma-irradiating pipe is located movably to an optional position within the reaction chamber. A method for surface plasma-treatment comprises dividing a microwave generated in a magnetron in a plurality of microwaves by a distributor, introducing the divided microwaves into a plurality of plasma generating mechanisms, respectively, and introducing plasmas generated in the respective plasma generating mechanisms into the reaction chamber through a plurality of plasma introducing ports, respectively, formed in the wall of the reaction chamber.

Abstract translation: 一种用于等离子体处理的装置，其能够通过在真空反应室内用微波放电等离子体照射工件的表面来等离子体处理树脂材料的工作，包括多个长等离子体照射管状管 其长度具有用于注入等离子体的许多小孔，以及至少一个等离子体照射直管，其具有朝向等离子体难以流动的部分的自由端开口。 至少一个第二等离子体照射管可移动地定位在反应室内的任选位置。 一种用于表面等离子体处理的方法包括通过分配器将在磁控管中产生的微波分解成多个微波，分别将分割的微波引入多个等离子体产生机构中，并将在各个等离子体产生机构中产生的等离子体引入到 反应室分别通过形成在反应室的壁中的多个等离子体引入口。

公开(公告)号：EP0209969B1

公开(公告)日：1991-07-24

申请号：EP86303919.4

申请日：1986-05-22

Applicant: VARIAN ASSOCIATES, INC.

Inventor： Turner, Norman Leonard ,  Pollock, John D.

IPC: H01J37/317 ,  H01J37/18

CPC classification number: H01J37/3171 ,  H01J37/18 ,  Y10S414/139