摘要:
A heating device having a heating element patterned into a robust MEMs substrate, wherein the heating element is electrically isolated from a fluid reservoir or bulk conductive sample, but close enough in proximity to an imagable window/area having the fluid or sample thereon, such that the sample is heated through conduction. The heating device can be used in a microscope sample holder, e.g., for SEM, TEM, STEM, X-ray synchrotron, scanning probe microscopy, and optical microscopy.
摘要:
A support pedestal device for an electrostatic chuck includes a base housing defining an internal cavity, and a base insert disposed proximate the internal cavity of the base housing. A fluid pathway is formed in the internal cavity and includes a plurality of linear-parallel cooling channels separated by corresponding plurality of linear-parallel cooling fins, a fluid supply channel, and a fluid return channel. A cooling fluid flows through the fluid supply channel, through the plurality of linear-parallel cooling channels, and back through the fluid return channel to cool the support pedestal device.
摘要:
A method of examining a specimen in a Charged Particle Microscope, comprising the following steps: - Providing a specimen on a specimen holder; - Heating the specimen to a temperature of at least 250°C; - Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen; - Using a detector to detect a flux of electrons emanating from the specimen in response to said irradiation,
wherein said detector comprises: - A scintillator module, which produces photons in response to impingement by electrons in said flux; - A photon sensor, for sensing said photons,
and is configured to: - Preferentially register a first category of photons, associated with impingement of electrons on said scintillator module; - Selectively suppress a second category of photons, comprising thermal radiation from the heated specimen.
摘要:
Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.
摘要:
The invention relates to a device for spot size measurement at wafer level in a multi charged particle beam lithography system. The device comprises a knife edge structure on top of a scintillating material, such a YAG material. The knife edge structure is arranged in a Si wafer which has a top plane at a sharp angle to a (1 1 0) plane of the Si. In an embodiment the angle is in the range from 2 to 4 degrees, preferably in the range from 2.9 - 3.1 degrees. The invention relates in addition to a method for manufacturing a device for spot size measurement at wafer level in a multi charged particle beam lithography system.
摘要:
A lid assembly for semiconductor processing is provided. In at least one embodiment, the lid assembly includes a first electrode comprising an expanding section that has a gradually increasing inner diameter. The lid assembly also includes a second electrode disposed opposite the first electrode. A plasma cavity is defined between the inner diameter of the expanding section of the first electrode and a first surface of the second electrode.
摘要:
The invention provides a sample heating holder for electron beam microscopes or analyzers and a sample heating method using the holder, which can prevent stably the occurrence of contaminants on the sample surface without entailing ultrahigh vacuum evacuation or destructing the sample surface. The sample heating holder for an electron beam microscope or analyzer has excellent performance in the suppression of the growth of carbon contaminations and the occurrence of a thermal drift during observation and analysis, and includes a positive temperature coefficient (PTC) thermistor as a heating element.
摘要:
A gas charge container includes a sample holder which holds a needle-shaped material, a deutrium gas supply portion which charges a deutrium gas into the needle-shaped material held by the sample holder, and a heating portion which heats the needle-shaped material held by the sample holder. The needle-shaped material is cooled by blocking the heat generated by the heating portion after the needle-shaped material is heated by the heating portion.