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153 条记录 (耗时 0.014 秒)

    PRESSURE SENSITIVE ADHESIVE TAPE
    1.
    发明授权
    PRESSURE SENSITIVE ADHESIVE TAPE 失效
    压敏胶带

    公开(公告)号：EP0839169B1

    公开(公告)日：2004-09-22

    申请号：EP96925866.4

    申请日：1996-07-29

    申请人： SCAPA GROUP PLC

    发明人： RICHARDSON, Peter, James ,  SALTHOUSE, Peter, William ,  PRESTON, Joseph ,  STEWART, Edward, John

    IPC分类号： C09J7/02 ,  C08L23/02 ,  C09J123/02

    CPC分类号： C08L23/02 ,  C08L2666/04 ,  C09J7/243 ,  C09J7/245 ,  C09J123/02 ,  C09J2203/302 ,  C09J2423/006 ,  C09J2431/006 ,  Y10T428/28

    摘要： PURPOSE: To obtain a polyolefin resin composition excellent in heat and aging resistances and useful for films for self-adhesive tape substrates of good workability by mixing a base comprising a specified olefin resin with a high-mol. wt. hindered phenol antioxidant and a zinc compound.CONSTITUTION: A resin composition prepared by mixing 100 pts. wt. resin base comprising at least one member selected from among a polyethylene, an ethylene/vinyl acetate copolymer, an ethylene/alkyl acrylate copolymer, an ethylene/alpha-olefin copolymer and a mixture thereof with 0.1-10 pts. wt. high-mol. wt hindered phenol antioxidant and 1-20 pts. wt. zinc compound. Examples of the zinc compound to be used are desirably inorganic compounds and include zinc borate and zinc oxide. As the high-mol. wt. hindered phenol antioxidant, one having a mol. wt. of 500 or above is particularly desirable from the viewpoint of nonblooming properties, etc.

    BELT FOR POLISHING SEMICONDUCTORS
    2.
    发明公开
    BELT FOR POLISHING SEMICONDUCTORS 有权
    半导体抛光带

    公开(公告)号：EP1126952A1

    公开(公告)日：2001-08-29

    申请号：EP99950961.5

    申请日：1999-10-22

    申请人： SCAPA GROUP PLC

    发明人： LOMBARDO, Brian

    IPC分类号： B24D11/00 ,  B24B37/04 ,  B24B21/04

    CPC分类号： B24B37/11 ,  B24B21/04 ,  B24D11/005 ,  B24D11/06

    摘要： An improved belt for mechanical polishing of semiconductor wafers, which belt maintains a substantially flat surface in the span between its mounting surfaces. The belt has at least one polymer layer including a polishing layer, and at least one woven or non-woven supporting layer. The symmetrical properties of the belt are arranged to achieve a balance between down-cupping and up-cupping forces exerted on the belt in the span between its mounting in order to prevent the edges of the belt cupping up or down.

    TISSUE MARKING FABRIC
    3.
    发明公开
    TISSUE MARKING FABRIC 审中-公开
    包布纸标记

    公开(公告)号：EP1108086A1

    公开(公告)日：2001-06-20

    申请号：EP99940402.3

    申请日：1999-08-24

    申请人： SCAPA GROUP PLC

    发明人： HAY, Stewart

    IPC分类号： D21F11/00 ,  D21F1/00

    CPC分类号： D21F11/006 ,  D21F1/0027 ,  D21F1/0036

    摘要： A tissue marking fabric comprises at least two warp yarn systems (5, 6) and one or two weft yarn systems (3, 4). The warp yarn systems are interlaced at spaced intervals, and extensive floats are provided either in the upper weft yarn system (3) extending in the cross-machine direction, or in the upper warp yarn system (14).

    Woven fabrics
    5.
    发明公开
    Woven fabrics 审中-公开
    组织

    公开(公告)号：EP0964089A3

    公开(公告)日：2000-10-18

    申请号：EP99304551.7

    申请日：1999-06-10

    申请人： SCAPA GROUP PLC

    发明人： Garon, Michel ,  Ross, Gilbert ,  Boily, Robert

    IPC分类号： D03D11/00 ,  D21F1/00

    CPC分类号： D21F1/0054 ,  D21F1/0036

    摘要： A woven fabric comprises at least two layers (10,12) of cross-machine direction yarns, one layer (10) having yarns (11) of larger dimensions, e.g. diameter, and the other layer (12) having yarns (13) of smaller dimensions and/or 'shaped' (i.e. of non-circular cross-section). A seaming spiral (18) is connected to the fabric by a seam binding yarn (19) secured by at least some machine-direction yarns being looped about the seam binding yarn (19). The final yarn (14) of the layer of smaller dimensioned or shaped yarns (13) is displaced towards the opposite side of the fabric. The last two larger dimensioned yarns (15,16) may be displaced towards the smaller dimensioned or shaped yarn layer (12), and the third yarn (17) of the larger dimensioned yarn layer may have an intermediate diameter.

    TREATMENT OF INDUSTRIAL FABRICS
    8.
    发明公开
    TREATMENT OF INDUSTRIAL FABRICS 有权
    处理工业织物的

    公开(公告)号：EP1019578A1

    公开(公告)日：2000-07-19

    申请号：EP98942921.2

    申请日：1998-09-15

    申请人： SCAPA GROUP PLC

    发明人： STRÖM, Jan

    IPC分类号： D21F1/00 ,  D06M10/00

    CPC分类号： D06M10/005 ,  D06M10/001 ,  D06M10/04 ,  D21F1/0027

    摘要： A method of treating industrial fabrics such as papermachine clothing, wherein at least one surface of the fabric, or of the yarns, fibres, strips or membranes from which such a fabric is made, is modified by using high energy electromagnetic radiation, from excimer or ablation lasers. This may be used to alter the hydrophilic/hydrophobic properties of the surface by etching on a micron scale. Selective masking at any desired scale may be used.

    FABRIC SEAM
    9.
    发明公开
    FABRIC SEAM 有权
    织物接缝

    公开(公告)号：EP1002155A1

    公开(公告)日：2000-05-24

    申请号：EP98937623.1

    申请日：1998-08-06

    申请人： SCAPA GROUP PLC

    发明人： HOLDEN, David

    IPC分类号： D21F1/00

    CPC分类号： D21F1/0054 ,  Y10T428/24785 ,  Y10T428/249922 ,  Y10T442/30 ,  Y10T442/3179

    摘要： A seam construction for a woven dryer fabric comprises a helical spiral or array of loops (43) stitched or woven into the fabric by means of loop engaging yarns (42) extending the machine direction of the fabric, the neutral plane (44) of the fabric being displaced towards the paper contacting side of the fabric, by reason of yarns (41) in the paper contacting side of the fabric being of smaller diameter than the yarns (40) on the machine side of the fabric, and a pair of cross-machine yarns (44, 45) of equal diameter being located as terminal yarns adjacent the loops (43).

    摘要翻译： 用于织造干燥器织物的接缝结构包括通过沿织物的机器方向延伸的环接合纱线（42）缝合或编织到织物中的螺旋形螺旋或阵列环（43），该织物的中性平面（44） 由于织物的纸接触侧的纱线（41）的直径小于织物机器侧上的纱线（40）的直径，因此织物向织物的纸接触侧移动，并且一对十字 等直径的机器纱（44,45）位于与环（43）相邻的终端纱线上。