公开(公告)号：EP1303789A4

公开(公告)日：2005-09-28

申请号：EP01951075

申请日：2001-06-15

申请人： ARCH SPEC CHEM INC

发明人： MALIK SANJAY ,  FERREIRA LAWRENCE ,  EISELE JEFFREY ,  WHEWELL ALAN

IPC分类号： C08F212/14 ,  C08F220/12 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/73 ,  C08F12/24 ,  C08F220/68 ,  G03C5/16 ,  G03C5/56

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

摘要： A resist composition containing a polymer of t-butyl cinnamate, a photacid generator, and a solvent. Optionally, the resist composition may include a basic compound. The polymer of t-butyl cinnamate has the monomeric units (I) wherein a=0.3 to 0.9, b=0.1 to 0.7, and c=0 to 0.3; R =H, methyl, or CH2OR ; R =H or C1-C4 alkyl group; R =H, methyl, CH2OR , CH2CN, or CH2X; X=Cl, I, Br, F, or CH2COOR ; R =C1-C4 alkyl group; and R = isobornyl, cyclohexyl methyl, cyclohexyl ethyl, benzyl, or phenethyl.

公开(公告)号：EP1053509A4

公开(公告)日：2001-10-17

申请号：EP99905805

申请日：1999-02-05

申请人： ARCH SPEC CHEM INC

发明人： BLAKENEY ANDREW J ,  MEDINA ARTURO N ,  TOUKHY MEDHAT A ,  FERREIRA LAWRENCE ,  JEFFRIES ALFRED T III ,  NAIINI AHMAD

IPC分类号： C07C39/15 ,  C07D317/64 ,  G03F7/022 ,  G03F7/023 ,  C07C39/12 ,  C07C39/16 ,  C07C39/17 ,  C07C245/12 ,  C07D319/14 ,  C07D319/16 ,  G03F7/30

CPC分类号： G03F7/022 ,  C07C39/15 ,  C07D317/64

摘要： A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formula (II), wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.

公开(公告)号：EP1501916A4

公开(公告)日：2005-09-14

申请号：EP03736483

申请日：2003-04-24

申请人： ARCH SPEC CHEM INC

发明人： LEON VINCENT G ,  ELDERKIN MICHELLE ,  FERREIRA LAWRENCE

IPC分类号： B08B3/08 ,  C09K13/00 ,  C11D7/26 ,  C11D7/28 ,  C11D7/32 ,  C11D7/34 ,  C11D11/00 ,  G03F7/42 ,  H01L21/02 ,  H01L21/304 ,  C11D7/52

CPC分类号： H01L21/02063 ,  C11D7/265 ,  C11D7/28 ,  C11D7/32 ,  C11D7/3245 ,  C11D7/34 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/007 ,  G03F7/42 ,  G03F7/422 ,  H01L21/02071

摘要： A non corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water, and (b) a synergistic combination of at least one tricaboxylic acid and at least one caraboxylic acid. Preferably, the at least one carboxylic acid has a eKa value ranging from 3 to 6. A method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue, and (b) contacting the substrate with a cleaning composition comprising water, and a synergistic combination of at least one tricaboxylic acid and at least one carboxylic acid.

摘要翻译： 非腐蚀性清洁组合物，其是基于水性的，无危害的并且不会对环境造成伤害，并且主要用于从底物中除去新鲜和老化的等离子体蚀刻残留物。 组合物包含（a）水; 和（b）至少一种三羧酸和至少一种羧酸的协同组合。 优选地，所述至少一种羧酸具有3至6的pKa值。另外，用于从基底去除蚀刻残留物的方法。 该方法包括以下步骤：（a）向衬底提供蚀刻残留物; 和（b）使基材与包含水的清洁组合物接触; 以及至少一种三羧酸和至少一种羧酸的协同组合。

公开(公告)号：EP1299774A4

公开(公告)日：2005-06-08

申请号：EP02725542

申请日：2002-04-05

申请人： ARCH SPEC CHEM INC

发明人： FERREIRA LAWRENCE ,  BLAKENEY ANDREW J ,  SPAZIANO GREGORY DOMINIC ,  DIMOV OGNIAN ,  KOCAB THOMAS J ,  HATFIELD JOHN P

IPC分类号： C07C309/10 ,  C07C321/28 ,  C07C323/20 ,  C07C381/12 ,  C07D207/40 ,  C07D209/94 ,  C07D333/46 ,  G03F7/004 ,  G03F7/039 ,  C07C303/00 ,  C07C309/01 ,  C07C309/02 ,  C07C309/06 ,  C07C309/63

CPC分类号： C07C381/12 ,  C07C309/10 ,  G03F7/0045 ,  G03F7/0395 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

摘要： A photoacid compound having general structure: R-O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.

摘要翻译： 具有通式结构的光酸化合物：R-O（CF 2）n SO 3 X其中n是约1至4的整数; R选自取代或未取代的C 1 -C 12直链或支链烷基或链烯基，取代或未取代的芳烷基，取代或未取代的芳基，取代或未取代的双环烷基，取代或未取代的三环烷基，氢，烷基磺酸， 未取代的全氟烷基，通式结构F（（CF 2）p O）m（CF 2）q - ，其中p为约1至4，m为约0至3且q为约1至4，并且取代或未取代的部分氟化 烷基，卤代氟烷基，全氟烷基磺酸或缩水甘油基; X选自有机阳离子和共价键合的有机基团。

公开(公告)号：EP1086156A4

公开(公告)日：2005-02-02

申请号：EP99916667

申请日：1999-04-14

申请人： ARCH SPEC CHEM INC

发明人： MALIK SANJAY ,  BLAKENEY ANDREW J ,  FERREIRA LAWRENCE ,  SIZENSKY JOSEPH J ,  MAXWELL BRIAN E

IPC分类号： C08F8/14 ,  C08F12/24 ,  C08F257/02 ,  C08F261/02 ,  C08F261/12 ,  C08G8/14 ,  C08G8/30 ,  G03F7/004 ,  G03F7/039 ,  C08F8/00 ,  C08F212/14 ,  G03F7/30 ,  G03F7/40

CPC分类号： C08F257/02 ,  C08F261/02 ,  C08F261/12 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106

摘要： The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, quoting a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.