公开(公告)号：EP3391139A1

公开(公告)日：2018-10-24

申请号：EP16806058.0

申请日：2016-12-02

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： VLES, David, Ferdinand ,  ABEGG, Erik, Achilles ,  BENDIKSEN, Aage ,  BROUNS, Derk, Servatius, Gertruda ,  GOVIL, Pradeep K. ,  JANSSEN, Paul ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  PÉTER, Mária ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VOORTHUIJZEN, Willem-Pieter ,  WILEY, James, Norman

IPC分类号： G03F1/62 ,  G03F7/20 ,  G03F1/22

CPC分类号： G03F1/64 ,  G03F1/22 ,  G03F1/62 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

公开(公告)号：EP4160315A1

公开(公告)日：2023-04-05

申请号：EP22202401.0

申请日：2016-02-01

申请人： ASML Netherlands B.V.

发明人： BROUNS, Derk, Servatius, Gertruda ,  DE GRAAF, Dennis ,  DE KRUIF, Robertus, Cornelis, Martinus ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  NOTENBOOM, Arnoud, Willem ,  SMITH, Daniel, Andrew ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien ,  WILEY, James, Norman

IPC分类号： G03F7/20 ,  G03F1/62 ,  G03F1/84 ,  G03F1/64

摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

公开(公告)号：EP4020087A1

公开(公告)日：2022-06-29

申请号：EP22153676.6

申请日：2016-02-01

申请人： ASML Netherlands B.V.

发明人： BROUNS, Derk, Servatius, Gertruda ,  DE GRAAF, Dennis ,  DE KRUIF, Robertus, Cornelis, Martinus ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  NOTENBOOM, Arnoud, Willem ,  SMITH, Daniel, Andrew ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien ,  WILEY, James, Norman

IPC分类号： G03F7/20 ,  G03F1/62 ,  G03F1/66 ,  G03F1/84

摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.