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公开(公告)号：EP3391139A1
公开(公告)日：2018-10-24
申请号：EP16806058.0
申请日：2016-12-02
发明人： VLES, David, Ferdinand , ABEGG, Erik, Achilles , BENDIKSEN, Aage , BROUNS, Derk, Servatius, Gertruda , GOVIL, Pradeep K. , JANSSEN, Paul , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WILEY, James, Norman
CPC分类号： G03F1/64 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
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公开(公告)号：EP3762142A1
公开(公告)日：2021-01-13
申请号：EP19706407.4
申请日：2019-02-07
发明人： KURGANOVA, Evgenia , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOLLEBREGT, Sten , VOORTHUIJZEN, Willem-Pieter
IPC分类号： B01J23/652 , B01J23/883 , B01J23/885 , B01J23/28 , B01J23/30 , B01J27/22 , B01J21/18 , B01J37/02 , B01J35/00 , G03F1/00 , G03F7/20
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公开(公告)号：EP3391140A1
公开(公告)日：2018-10-24
申请号：EP16805144.9
申请日：2016-12-02
发明人： BROUNS, Derk Servatius Gertruda , JANSSEN, Paul , KAMALI, Mohammad Reza , PÉTER, Mária , VAN DER ZANDE, Willem Joan , VAN ZWOL, Pieter-Jan , VLES, David Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC分类号： G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983
摘要： A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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公开(公告)号：EP3365730A2
公开(公告)日：2018-08-29
申请号：EP16788043.4
申请日：2016-10-11
发明人： PÉTER, Mária , ABEGG, Erik Achilles , GIESBERS, Adrianus Johannes Maria , KLOOTWIJK, Johan Hendrik , NASALEVICH, Maxim Aleksandrovich , VAN DEN EINDEN, Wilhelmus Theodorus Anthonius Johannes , VAN DER ZANDE, Willem Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes Petrus Martinus Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC分类号： G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
摘要： Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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公开(公告)号：EP3449312A1
公开(公告)日：2019-03-06
申请号：EP17717149.3
申请日：2017-04-12
发明人： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
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公开(公告)号：EP3391138A1
公开(公告)日：2018-10-24
申请号：EP16805430.2
申请日：2016-12-02
发明人： VAN ZWOL, Pieter-Jan , DE GRAAF, Dennis , JANSSEN, Paul , PÉTER, Mária , VAN DE KERKHOF, Marcus Adrianus , VAN DER ZANDE, Willem Joan , VLES, David Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC分类号： G03F1/24 , G03F1/62 , G03F7/70916 , G03F7/70983
摘要： A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
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公开(公告)号：EP4202545A1
公开(公告)日：2023-06-28
申请号：EP23157200.9
申请日：2017-04-12
发明人： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , NIKIPELOV, Andrey, , PÉTER, Mária , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , LENDERINK, Egbert , MAXIM, Nicolae , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , RISPENS, Gijsbert , ZDRAVKOV, Alexandar, Nikolov
摘要： The invention concerns a membrane for EUV lithography. The membrane comprises a base layer. The base layer comprises one or more of the following: a stable stoichiometry of Mo and Si, a stable stoichiometry of Ru and Si, a stable stoichiometry of Zr and Si, a stable stoichiometry of La and Si, a stable stoichiometry of Y and Si, and a stable stoichiometry of Nb and Si. The membrane further comprises a capping layer providing an outer surface of the membrane. The invention further concerns a pellicle assembly comprising the membrane of the invention, a patterning device assembly comprising the pellicle assembly of the invention, and a dynamic gas lock assembly comprising the membrane of the invention.
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公开(公告)号：EP3639091A2
公开(公告)日：2020-04-22
申请号：EP18728409.6
申请日：2018-06-08
发明人： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PETER, Maria , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
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公开(公告)号：EP3345053A1
公开(公告)日：2018-07-11
申请号：EP16757252.8
申请日：2016-08-26
发明人： HOUWELING, Zomer, Silvester , CASIMIRI, Eric, Willem, Felix , DRUZHININA, Tamara , JANSSEN, Paul , KUIJKEN, Michael, Alfred, Josephus , LEENDERS, Martinus, Hendrikus, Antonius , OOSTERHOFF, Sicco , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
IPC分类号： G03F1/62
CPC分类号： G03F1/62 , G03F7/70983
摘要： A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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