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公开(公告)号：EP3391139A1
公开(公告)日：2018-10-24
申请号：EP16806058.0
申请日：2016-12-02
发明人： VLES, David, Ferdinand , ABEGG, Erik, Achilles , BENDIKSEN, Aage , BROUNS, Derk, Servatius, Gertruda , GOVIL, Pradeep K. , JANSSEN, Paul , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WILEY, James, Norman
CPC分类号： G03F1/64 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
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公开(公告)号：EP3762142A1
公开(公告)日：2021-01-13
申请号：EP19706407.4
申请日：2019-02-07
发明人： KURGANOVA, Evgenia , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOLLEBREGT, Sten , VOORTHUIJZEN, Willem-Pieter
IPC分类号： B01J23/652 , B01J23/883 , B01J23/885 , B01J23/28 , B01J23/30 , B01J27/22 , B01J21/18 , B01J37/02 , B01J35/00 , G03F1/00 , G03F7/20
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公开(公告)号：EP3449312A1
公开(公告)日：2019-03-06
申请号：EP17717149.3
申请日：2017-04-12
发明人： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
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公开(公告)号：EP4202545A1
公开(公告)日：2023-06-28
申请号：EP23157200.9
申请日：2017-04-12
发明人： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , NIKIPELOV, Andrey, , PÉTER, Mária , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , LENDERINK, Egbert , MAXIM, Nicolae , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , RISPENS, Gijsbert , ZDRAVKOV, Alexandar, Nikolov
摘要： The invention concerns a membrane for EUV lithography. The membrane comprises a base layer. The base layer comprises one or more of the following: a stable stoichiometry of Mo and Si, a stable stoichiometry of Ru and Si, a stable stoichiometry of Zr and Si, a stable stoichiometry of La and Si, a stable stoichiometry of Y and Si, and a stable stoichiometry of Nb and Si. The membrane further comprises a capping layer providing an outer surface of the membrane. The invention further concerns a pellicle assembly comprising the membrane of the invention, a patterning device assembly comprising the pellicle assembly of the invention, and a dynamic gas lock assembly comprising the membrane of the invention.
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公开(公告)号：EP3639091A2
公开(公告)日：2020-04-22
申请号：EP18728409.6
申请日：2018-06-08
发明人： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PETER, Maria , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
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公开(公告)号：EP4160315A1
公开(公告)日：2023-04-05
申请号：EP22202401.0
申请日：2016-02-01
发明人： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：EP4121819A1
公开(公告)日：2023-01-25
申请号：EP21706970.7
申请日：2021-02-25
发明人： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus , ENGELEN, Johannes, Bernardus, Charles , NOTENBOOM, Arnoud, Willem , OVERKAMP, Jim, Vincent , JANSSEN, Kjeld, Gertrudus, Hendrikus , PIJNENBURG, Johannes, Adrianus, Cornelis, Maria , VAN DUIVENBODE, Jeroen , NIEUWENHUIS, Erik, Johannes , VAN BERKEL, Koos
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
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公开(公告)号：EP4020087A1
公开(公告)日：2022-06-29
申请号：EP22153676.6
申请日：2016-02-01
发明人： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：EP4022392A1
公开(公告)日：2022-07-06
申请号：EP20765216.5
申请日：2020-08-20
发明人： NIKIPELOV, Andrey , BALTUSSEN, Sander , BANINE, Vadim, Yevgenyevich , DOLGOV, Alexandr , DONMEZ NOYAN, Inci , HOUWELING, Zomer, Silvester , NOTENBOOM, Arnoud, Willem , VAN DE KERKHOF, Marcus, Adrianus , VAN DER WOORD, Ties, Wouter , VERMEULEN, Paul, Alexander , VLES, David, Ferdinand , VORONINA, Victoria , YEGEN, Halil, Gökay
IPC分类号： G03F1/62 , G03F7/20 , C01B32/158 , D01F9/12 , D01F11/12
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公开(公告)号：EP4004647A1
公开(公告)日：2022-06-01
申请号：EP20743705.4
申请日：2020-07-24
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