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    BLOCK COPOLYMERS WITH SURFACE-ACTIVE JUNCTION GROUPS, COMPOSITIONS AND PROCESSES THEREOF
    2.
    发明公开
    BLOCK COPOLYMERS WITH SURFACE-ACTIVE JUNCTION GROUPS, COMPOSITIONS AND PROCESSES THEREOF 审中-公开
    具有表面活性结合基团的嵌段共聚物，组合物及其制备方法

    公开(公告)号：EP3259292A1

    公开(公告)日：2017-12-27

    申请号：EP16706819.6

    申请日：2016-02-18

    申请人： AZ Electronic Materials Luxembourg S.à.r.l. ,  International Business Machines Corporation

    发明人： VORA, Ankit ,  HIRAHARA, Eri ,  CHENG, Joy ,  BASKARAN, Durairaj ,  POLISHCHUK, Orest ,  TJIO, Melia ,  PAUNESCU, Margareta ,  SANDERS, Daniel ,  LIN, Guanyang

    IPC分类号： C08F293/00 ,  B82Y30/00

    摘要： The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain, wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z)b)a is a junction group, which comprises a surface active pendant moiety Y(Z)b wherein: a is an integer from 1 to 4 denoting the number of surface active pendant moieties Y(Z)b on X, b is an integer from 1 to 5 denoting the number of Z moieties on the linking moiety Y, X is a linking group between the A polymer block, the B polymer block and the moiety Y, Y is a linking group or a direct valence bond between X and Z; and Z is a moiety independently selected from, a fluorine containing moiety, a Si1-Si8 siloxane containing moiety or a hydrocarbon moiety with at least 18 carbons, and further wherein the junction group X(Y(Z)b)a has a surface energy less than that that of the block A and less than that of the block B. The invention also relates to a composition comprising the novel copolymer and its use in direct self-assembly processes.

    DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS USING SEGMENTED PREPATTERNS
    4.
    发明公开
    DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS USING SEGMENTED PREPATTERNS 有权
    嵌段共聚物的定向自组装使用分段初步样品

    公开(公告)号：EP2379441A2

    公开(公告)日：2011-10-26

    申请号：EP10715538.4

    申请日：2010-04-23

    申请人： International Business Machines Corporation

    发明人： CHENG, Joy ,  NA, Young-Hye ,  LAI, Kafai ,  RETTNER, Charles, Thomas ,  SANDERS, Daniel, Paul ,  LI, Wai-Kin

    IPC分类号： B81C1/00

    CPC分类号： B81C1/00031 ,  B81C1/00404 ,  B81C2201/0149 ,  H01L21/0337 ,  H01L21/31144

    摘要： An opening in a substrate is formed, e.g., using optical lithography, with the opening having sidewalls whose cross section is given by segments that are contoured and convex. The cross section of the opening may be given by overlapping circular regions, for example. The sidewalls adjoin at various points, where they define protrusions. A layer of polymer including a block copolymer is applied over the opening and the substrate, and allowed to self-assemble. Discrete, segregated domains form in the opening, which are removed to form holes, which can be transferred into the underlying substrate. The positions of these domains and their corresponding holes are directed to predetermined positions by the sidewalls and their associated protrusions. The distances separating these holes may be greater or less than what they would be if the block copolymer (and any additives) were to self-assemble in the absence of any sidewalls.