公开(公告)号：EP2057674A2

公开(公告)日：2009-05-13

申请号：EP07811299.2

申请日：2007-08-13

申请人： Axcelis Technologies, Inc.

发明人： EIRIKSSON, Ari ,  MITCHELL, Robert ,  PHARAND, Michel ,  LAFONTAINE, Marvin ,  PUROHIT, Ashwin ,  WEED, Steve ,  ARSENAULT, Wayne ,  PATHAK, Shantanu ,  BECKEL, Donovan

IPC分类号： H01L21/683 ,  H01L21/687

CPC分类号： H01L21/6831 ,  H01L21/68764

摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic fluid seals associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.

公开(公告)号：EP1611592A2

公开(公告)日：2006-01-04

申请号：EP04713445.7

申请日：2004-02-20

申请人： Axcelis Technologies, Inc.

发明人： MITCHELL, Robert

IPC分类号： H01J37/20

CPC分类号： H01J37/20 ,  H01J37/3171 ,  H01J2237/202

摘要： An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member disposed within the implantation chamber, movably coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The translation member includes a linear motor.

公开(公告)号：EP2304765B1

公开(公告)日：2012-07-04

申请号：EP09788820.0

申请日：2009-06-23

申请人： Axcelis Technologies, Inc.

发明人： MITCHELL, Robert ,  VANDERBERG, Bo

IPC分类号： H01J37/317 ,  H01J37/147 ,  H01J37/304

CPC分类号： H01J37/1471 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24578

摘要： An ion beam angle detection apparatus (440), comprising a linear drive assembly (460) fixedly attached to a moveable profiler assembly (450), wherein the profiler assembly comprises, a profiler having a profiler aperture (454) formed within a profiler top plate (455) and a profiler sensor assembly, a moveable angle mask assembly (446) comprising a moveable angle mask with a mask aperture (448), wherein the angle mask assembly is non-fixedly attached to the profiler assembly, the mask aperture is movable relative to the profiler aperture by energizing an mask linear drive (464) fixedly attached to the profiler assembly and the profiler aperture is movable through a length greater than the elongated length of the ion beam (456).

公开(公告)号：EP2304765A1

公开(公告)日：2011-04-06

申请号：EP09788820.0

申请日：2009-06-23

申请人： Axcelis Technologies, Inc.

发明人： MITCHELL, Robert ,  VANDERBERG, Bo

IPC分类号： H01J37/317 ,  H01J37/147 ,  H01J37/304

CPC分类号： H01J37/1471 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24578

摘要： An ion beam angle detection apparatus (440), comprising a linear drive assembly (460) fixedly attached to a moveable profiler assembly (450), wherein the profiler assembly comprises, a profiler having a profiler aperture (454) formed within a profiler top plate (455) and a profiler sensor assembly, a moveable angle mask assembly (446) comprising a moveable angle mask with a mask aperture (448), wherein the angle mask assembly is non-fixedly attached to the profiler assembly, the mask aperture is movable relative to the profiler aperture by energizing an mask linear drive (464) fixedly attached to the profiler assembly and the profiler aperture is movable through a length greater than the elongated length of the ion beam (456).

公开(公告)号：EP1625609A2

公开(公告)日：2006-02-15

申请号：EP04752974.8

申请日：2004-05-21

申请人： Axcelis Technologies, Inc.

发明人： MITCHELL, Robert ,  WEED, Allan ,  GUELER, Richard

IPC分类号： H01L21/00

CPC分类号： H01L21/67763 ,  H01L21/67213 ,  H01L21/67745 ,  Y10S414/139 ,  Y10S414/141

摘要： A transfer system for use with a tool for treating a work-piece at sub-atmospheric pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for treatment of work-pieces placed at a work-piece treatment station within the low pressure region. Multiple work-piece isolation load locks transfer work-pieces, one or two at a time, from a higher pressure region to the lower pressure for treatment and back to said higher pressure subsequent to said treatment. A first robot transfers work-pieces within the low pressure region from the load locks to a treatment station within the low pressure region. Multiple other robots positioned outside the low pressure region transfers work-pieces to and from the multiple work-piece isolation load locks from a source of said work-pieces prior to treatment and to a destination of said work-pieces after said treatment.

公开(公告)号：EP1692715B1

公开(公告)日：2012-03-07

申请号：EP04812930.8

申请日：2004-12-03

申请人： Axcelis Technologies, Inc.

发明人： MITCHELL, Robert ,  RYAN, Kevin

IPC分类号： H01L21/00 ,  H01J37/317

CPC分类号： H01L21/68764 ,  H01J37/3171 ,  H01J2237/2001 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68792

摘要： An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure (100) coupled to the implantation chamber and supporting the workpiece (24). The workpiece support structure includes a chuck (202) including a rotatable pedestal (204) for supporting the workpiece (24). The workpiece support structure further includes a first rotatable reel (262) coupled to and rotatable with the pedestal and a flexible, hollow cord carrying facilities such as coolant lines and electrical power conductors coupled to the first rotatable reel such that, as the pedestal is rotated in a first direction, a length of the flexible cord that is wrapped around the first reel increases and, as the pedestal is rotated in an opposite direction, a length of the flexible cord that is wrapped around the first reel decreases.

公开(公告)号：EP1611592B1

公开(公告)日：2011-11-16

申请号：EP04713445.7

申请日：2004-02-20

申请人： Axcelis Technologies, Inc.

发明人： MITCHELL, Robert

IPC分类号： H01J37/20

CPC分类号： H01J37/20 ,  H01J37/3171 ,  H01J2237/202

摘要： An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member disposed within the implantation chamber, movably coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The translation member includes a linear motor.

公开(公告)号：EP2095413A2

公开(公告)日：2009-09-02

申请号：EP07862407.9

申请日：2007-11-30

申请人： AXCELIS TECHNOLOGIES, INC.

发明人： MITCHELL, Robert ,  FERRARA, Joseph

IPC分类号： H01L21/68 ,  H01L21/00

CPC分类号： H01L21/681 ,  H01L21/67265 ,  H01L21/67745

摘要： An ion implantation apparatus, system, and method are provided for a transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

摘要翻译： 提供了一种用于在真空和大气压力之间转移多个工件的离子注入装置，系统和方法，其中对齐机构可操作以将多个工件对齐，以用于大致同时运输至双工件加载锁定腔室。 对准机构包括表征装置，升降器和用于支撑两个工件的两个垂直对齐的工件支撑件。 第一大气机器人和第二大气机器人被配置为一次同时传送两个工件，在加载锁定模块，对齐机构和FOUP之间。 第三和第四个真空机器人被配置为一次在加载锁定模块和处理模块之间转移一个工件。

公开(公告)号：EP2095401A2

公开(公告)日：2009-09-02

申请号：EP07862406.1

申请日：2007-11-30

申请人： AXCELIS TECHNOLOGIES, INC.

发明人： FERRARA, Joseph ,  MITCHELL, Robert

IPC分类号： H01L21/00 ,  H01L21/687

CPC分类号： H01L21/67213 ,  C23C14/48 ,  H01L21/67201 ,  H01L21/67265 ,  H01L21/67745

摘要： An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

公开(公告)号：EP1692715A1

公开(公告)日：2006-08-23

申请号：EP04812930.8

申请日：2004-12-03

申请人： Axcelis Technologies, Inc.

发明人： MITCHELL, Robert ,  RYAN, Kevin

IPC分类号： H01L21/00 ,  H01J37/317

CPC分类号： H01L21/68764 ,  H01J37/3171 ,  H01J2237/2001 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68792

摘要： An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure (100) coupled to the implantation chamber and supporting the workpiece (24). The workpiece support structure includes a chuck (202) including a rotatable pedestal (204) for supporting the workpiece (24). The workpiece support structure further includes a first rotatable reel (262) coupled to and rotatable with the pedestal and a flexible, hollow cord carrying facilities such as coolant lines and electrical power conductors coupled to the first rotatable reel such that, as the pedestal is rotated in a first direction, a length of the flexible cord that is wrapped around the first reel increases and, as the pedestal is rotated in an opposite direction, a length of the flexible cord that is wrapped around the first reel decreases.