公开(公告)号：EP1554322A2

公开(公告)日：2005-07-20

申请号：EP03809914.9

申请日：2003-05-13

申请人： Brewer Science, Inc.

发明人： XU, Gu ,  MEADOR, Jimmy, D. ,  BHAVE, Mander, R. ,  DESHPANDE, Shreeram, V. ,  NOWAK, Kelly, A.

IPC分类号： C08F212/08 ,  C09D129/08 ,  C09D101/00

CPC分类号： H01L21/76808 ,  G02B1/111 ,  G03F7/091 ,  Y10S430/136 ,  Y10S430/151

摘要： New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

公开(公告)号：EP3092658A1

公开(公告)日：2016-11-16

申请号：EP15735186.7

申请日：2015-01-06

申请人： Brewer Science, Inc.

发明人： BAI, Dongshun ,  XU, Gu ,  BLUMENSHINE, Debbie

IPC分类号： H01L21/58

CPC分类号： H01L21/6835 ,  B32B7/06 ,  B32B7/12 ,  B32B27/08 ,  B32B27/283 ,  B32B27/325 ,  B32B2255/10 ,  B32B2255/205 ,  B32B2457/14 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381

摘要： The invention broadly relates to cyclic olefin polymer bonding compositions and release compositions, to be used independently or together, that enable thin wafer handling during microelectronics manufacturing, especially during a full-wafer mechanical debonding process. The release compositions comprise compositions made from siloxane polymers and copolymers blended in a polar solvent, and that are stable at room temperature for longer than one month. The cyclic olefin polymer bonding compositions provide high thermal stability, can be bonded to fully-treated carrier wafers, can be mechanically or laser debonded after high-temperature heat treatment, and are easily removed with an industrially-acceptable solvent. Wafers bonded according to the invention demonstrate lower overall post-grind stack TTV compared to other commercial bonding materials and can survive 200°C PECVD processing.

摘要翻译： 本发明广泛地涉及单独或一起使用的环烯烃聚合物粘合组合物和释放组合物，其能够在微电子制造期间实现薄晶片处理，特别是在全晶片机械剥离过程中。 释放组合物包含由硅氧烷聚合物和共聚物在极性溶剂中共混制成的组合物，并且在室温下稳定长达一个月。 环烯烃聚合物粘合组合物提供高热稳定性，可以结合到完全处理的载体晶片上，可以在高温热处理后机械或激光脱粘，并且易于用工业上可接受的溶剂去除。 根据本发明的结合的晶片与其他商业粘合材料相比表现出较低的整体后研磨叠层TTV，并且能够经受200℃的PECVD处理。

公开(公告)号：EP2188335B1

公开(公告)日：2012-12-19

申请号：EP08798953.9

申请日：2008-08-29

申请人： Brewer Science, Inc.

发明人： XU, Gu ,  YESS, Kimberly, A. ,  FLAIM, Tony, D.

IPC分类号： C09D125/12 ,  C09D163/04 ,  H01L21/027 ,  B81C1/00

CPC分类号： H01L21/0271 ,  B81C1/00801 ,  C08L63/04 ,  C09D125/12 ,  Y10T428/31511 ,  Y10T428/31663 ,  C08L2666/14

公开(公告)号：EP2188335A2

公开(公告)日：2010-05-26

申请号：EP08798953.9

申请日：2008-08-29

申请人： Brewer Science, Inc.

发明人： XU, Gu ,  YESS, Kimberly, A. ,  FLAIM, Tony, D.

IPC分类号： C08L25/04 ,  C09D125/04

CPC分类号： H01L21/0271 ,  B81C1/00801 ,  C08L63/04 ,  C09D125/12 ,  Y10T428/31511 ,  Y10T428/31663 ,  C08L2666/14

摘要： New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.

摘要翻译： 提供了用于半导体和MEMS器件生产期间的湿法蚀刻工艺的新的保护涂层。 这些层包括底漆层，第一保护层和任选的第二保护层。 底漆层优选在溶剂体系中包含有机硅烷化合物。 第一保护层包括由苯乙烯，丙烯腈和相容性化合物如单体，低聚物和包含环氧基团的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 和它们的混合物。 第二保护层包含高度卤化的聚合物，例如氯化聚合物，其可以在加热时交联或不交联。

公开(公告)号：EP2419926A1

公开(公告)日：2012-02-22

申请号：EP10810300.3

申请日：2010-03-19

申请人： Brewer Science, Inc.

发明人： TANG, Tingji ,  XU, Gu ,  ZHONG, Xing-Fu ,  HONG, Wenbin ,  FLAIM, Tony, D. ,  YESS, Kimberly ,  TRICHUR, Ramachandran, K.

IPC分类号： H01L21/312

CPC分类号： B81C1/00801 ,  B81C2201/053 ,  C08G61/08 ,  C08G2261/3324 ,  C08G2261/418 ,  G03F7/033 ,  G03F7/094 ,  H01L21/0274 ,  H01L21/3081 ,  Y10T428/31645 ,  Y10T428/31667 ,  Y10T428/31692 ,  Y10T428/31855 ,  Y10T428/31909

摘要： New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.

摘要翻译： 提供了在生产半导体和MEMS器件期间使用这些组合物作为保护层的新组合物和方法。 该组合物包含分散或溶解在溶剂体系中的环烯烃共聚物，并且可用于形成在酸蚀刻和其他处理和处理期间保护基材的层。 保护层可以是光敏或非光敏的，并且可以在保护层下具有或不具有底漆层的情况下使用。 优选的底漆层在溶剂体系中包含碱性聚合物。

公开(公告)号：EP4193221A1

公开(公告)日：2023-06-14

申请号：EP21856496.1

申请日：2021-08-09

申请人： Brewer Science Inc.

发明人： ZHONG, Xing-Fu ,  HUANG, Runhui ,  XU, Gu ,  SIMMONS, Sean ,  SWEAT, Daniel ,  KOZA, Jakub

IPC分类号： G03F7/11 ,  C08L79/08 ,  C08K5/13 ,  C08K5/053 ,  C08K5/49 ,  C08G73/10 ,  H01L21/033 ,  H01L21/02

公开(公告)号：EP1554322B1

公开(公告)日：2007-07-25

申请号：EP03809914.9

申请日：2003-05-13

申请人： Brewer Science, Inc.

发明人： XU, Gu ,  MEADOR, Jimmy, D. ,  BEHAVE, Mander, R. ,  DESHPANDE, Shreeram, V. ,  NOWAK, Kelly, A.

IPC分类号： C08F212/08 ,  C09D129/08 ,  C09D101/00

CPC分类号： H01L21/76808 ,  G02B1/111 ,  G03F7/091 ,  Y10S430/136 ,  Y10S430/151

摘要： New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

公开(公告)号：EP1311563A1

公开(公告)日：2003-05-21

申请号：EP01920482.5

申请日：2001-03-15

申请人： Brewer Science, Inc.

发明人： XU, Gu ,  BREWER, Dan, W. ,  LIMMER, Timothy ,  STRODER, Mike ,  FOWLER, Shelly ,  MAYO, Jonathon

IPC分类号： C08F8/32 ,  C08F212/08 ,  G03C1/72 ,  G03F9/00

CPC分类号： G03F7/033 ,  C08F8/00 ,  C08F8/32 ,  G03F7/0007 ,  Y10S522/904 ,  Y10S522/905 ,  Y10T428/10 ,  Y10T428/1036 ,  Y10T428/1086 ,  C08F212/08 ,  C08F222/06

摘要： New polymers, compositions comprising these polymers, and methods of using these compositions are provided. The polymers comprise styrene and maleic anhydride monomers with at least some of the maleic anhydride monomers having certain functional groups bonded thereto. Preferred functional groups include those derived from adhesion promoters (e.g., 2-aminophenol), photoinitiators (e.g., 4-aminoacetophenone), and solubilizers (e.g., 4-aminobenzoic acid). The polymers can be incorporated according to conventional processes into compositions which are then used to form a color filter to be used in a liquid crystal display. The final color filter has a high resolution, is highly resistant to solvents typically used in the color filter manufacturing process, is strongly adhered to the color filter substrate, has superior optical clarity, is highly soluble in a wide range of alkali developers, and has excellent heat and UV light stability.