摘要:
An exposure apparatus includes a light source for exposing a wafer (2) through a mask (1); a light blocking device (4) being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system (6) for detecting positional deviation between the mask and the wafer; and a drive control system (31,61) for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
摘要:
A composition for an intraocular lens comprising, an organopolysiloxane (A) having a viscosity of 10,000 cp or below and comprising at least one unsaturated aliphatic group, an organopolysiloxane (B) comprising at least three hydrogenated silyl units and a platinum compound; wherein the platinum compound based on its platinum content constitutes 10 - 200 ppm by weight of the composition. The composition provides a homogeneous intraocular lens even when it is injected into a crystalline capsule through a slender tube such as an injection needle.
摘要:
A length measuring device for performing length measurement and an exposure apparatus for performing an exposure operation on a first object (2) having a plurality of alignment patterns (2a,2b) thereon, includes an alignment detector for detecting the relative positional relation between the first object (2) and a second object (1) having a plurality of reference alignment patterns (1a,1b) used for aligning the first object therewith, and for detecting an alignment condition between the alignment patterns of the first and second objects, a movement device for moving the first and second objects relative to each other, a measurement device for measuring the amount of movement of the movement device, and a length measurement device for performing measurement of the space between the plurality of alignment patterns formed on the first object. The length measurement device performs length measurement on the basis of successive alignment conditions detected by successive alignment condition detection operations of the alignment detector between the plurality of reference alignment patterns on the second object and the pluralty of alignment patterns on the first object, as well as the amount of movement of the movement device measured by the measurement device during the successive alignment condition detection operations of the alignment detector.
摘要:
Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern (u) and a second pattern (L), printed on an article such as a semiconductor wafer (14) at different times, the measurement being based on detection of interference of diffraction lights (fA1u, fB2U, fA1L, fB2L) from at least one of the first and second printed patterns.
摘要:
A device for detecting positional relationship between opposed first and second objects, includes a light source for projecting light to the first and second objects; a photodetecting system for detecting two lights from one of the first and second objects illuminated by the light from the light source, the photodetecting system detecting those two lights the position of incidence of each of which on a predetermined plane is changeable with the positional relationship between the first and second objects in a direction perpendicular to the direction in which the first and second objects are opposed; a position detecting system for detecting the positional relationship between the first and second objects in a direction perpendicular to the opposing direction of the first and second objects, on the basis of the relationship of the two lights, on the predetermined plane, as detected by the photodetecting system; and an interval detecting system for detecting the positional relationship between the first and second objects in the opposing direction, by using at least one of the two lights detected by the photodetecting system.
摘要:
A device for detecting positional relationship between opposed first and second objects, includes a light source for projecting light to the first and second objects; a photodetecting system for detecting two lights from one of the first and second objects illuminated by the light from the light source, the photodetecting system detecting those two lights the position of incidence of each of which on a predetermined plane is changeable with the positional relationship between the first and second objects in a direction perpendicular to the direction in which the first and second objects are opposed; a position detecting system for detecting the positional relationship between the first and second objects in a direction perpendicular to the opposing direction of the first and second objects, on the basis of the relationship of the two lights, on the predetermined plane, as detected by the photodetecting system; and an interval detecting system for detecting the positional relationship between the first and second objects in the opposing direction, by using at least one of the two lights detected by the photodetecting system.