公开(公告)号：EP0881987A4

公开(公告)日：1999-05-12

申请号：EP97905726

申请日：1997-02-11

申请人： CORNING INC

发明人： PAVLIK ROBERT S JR ,  SEMPOLINSKI DANIEL R ,  WASILEWSKI MICHAEL H

IPC分类号： C03B19/14 ,  C03C3/06 ,  C04B41/53 ,  C01B33/12 ,  C03B5/00 ,  C03B5/42 ,  C03B5/425 ,  C03C3/04 ,  C03C4/00

CPC分类号： C03C3/06 ,  C03B19/1407 ,  C03B19/1492 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2207/52 ,  C03B2207/54 ,  C04B41/53

摘要： An article of relatively pure silica, and a furnace and method of producing the article. The article is produced by collecting molten silica particles (24) in a refractory furnace in which at least a portion of the refractory has been exposed to a halogen-containing gas to react with contaminating metal ions in the refractory.

公开(公告)号：EP0885176A4

公开(公告)日：1999-03-17

申请号：EP97907924

申请日：1997-02-28

申请人： CORNING INC

发明人： BORRELLI NICHOLAS F ,  SEMPOLINSKI DANIEL R ,  SEWARD THOMAS P III ,  SMITH CHARLENE

IPC分类号： C03B20/00 ,  C03B19/14 ,  C03B32/00 ,  C03C21/00

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2207/32 ,  C03C4/0071 ,  C03C4/0085 ,  C03C21/007 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2203/54

摘要： The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.

公开(公告)号：EP1441994A4

公开(公告)日：2008-09-03

申请号：EP02761645

申请日：2002-09-13

申请人： CORNING INC

发明人： DOMEY JEFFREY JOHN ,  HESLIN MICHAEL ROBERT ,  LADISON JULIE L ,  LINDER MICHAEL WERNER ,  MAXON JOHN E ,  MOLL JOHANNES ,  PAVLIK JR ROBERT S ,  SEMPOLINSKI DANIEL R

IPC分类号： G02B3/00 ,  C03B20/00 ,  C03C3/06 ,  G03F7/20

CPC分类号： G03F7/70966 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70958

摘要： Fused silica members having high internal transmission and low birefringence are disclosed. Methods of making such fused silica members are also disclosed. According to the present invention, fused silica members having an internal transmission equal to or greater than 99.65%/cm at 193 nm and having an absolute maximum birefringence along the use axis of less than or equal to 0.75 nm/cm are provided.

公开(公告)号：EP1030822A4

公开(公告)日：2004-12-15

申请号：EP98945813

申请日：1998-08-31

申请人： CORNING INC

发明人： MAXON JAMES E ,  PAVLIK ROBERT S JR ,  SEMPOLINSKI DANIEL R ,  WASILEWSKI MICHAEL H

IPC分类号： C03B8/04 ,  C03B19/06 ,  C03B19/09 ,  C03B19/14 ,  C03C3/06 ,  C03B19/00 ,  C03B37/018

CPC分类号： C03B19/09 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1476 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/52 ,  C03C3/06

摘要： A method of producing, by flame hydrolysis, a fused silica glass containing titania which comprises delivering a mixture of a silica precursor and a titania precursor in vapor form to a flame, passing the vapor mixture through the flame to form SiO2-TiO2 particles, and depositing the particles within a furnace (40) where they melt to form a solid glass body (44).

公开(公告)号：EP1924431A4

公开(公告)日：2011-03-02

申请号：EP06813769

申请日：2006-08-25

申请人： CORNING INC

发明人： BURDETTE STEVEN R ,  CHU POLLY W ,  FAGAN JAMES G ,  HOBBS THOMAS W ,  LIKITVANICHKUL SUMALEE ,  SEMPOLINSKI DANIEL R ,  TAFT TERRY L ,  WALTERS MICHAEL J

IPC分类号： B32B17/06 ,  C03B23/00 ,  C03B31/00 ,  C03B33/00

CPC分类号： C03B23/04 ,  C03B23/0496 ,  C03B23/051

公开(公告)号：EP1296899A4

公开(公告)日：2004-11-17

申请号：EP01928353

申请日：2001-04-03

申请人： CORNING INC

发明人： ARAUJO ROGER J ,  BORRELLI NICHOLAS F ,  MCLAY ROBERT E ,  SEMPOLINSKI DANIEL R ,  SMITH CHARLENE M

IPC分类号： G02B1/00 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  G03F7/20

CPC分类号： G03F7/70958 ,  C03B19/1407 ,  C03B19/1423 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/50 ,  C03C3/06 ,  C03C2201/21 ,  C03C2203/40

摘要： An optical member includes a fused silica glass having a concentration of =SiH moiety below detection limit as measured by Raman spectroscopy and a concentration of molecular hydrogen of at least 1x1017 molecules/cm3. The fused silica glass exhibits an induced absorption level which quickly attains an initial peak upon exposure to irradiation and rapidly decays to a low value. The induced absorption level after decaying to the low value remains substantially unchanged by further irradiation.

公开(公告)号：EP1240556A4

公开(公告)日：2003-03-19

申请号：EP00970835

申请日：2000-10-12

申请人： CORNING INC

发明人： PRIESTLEY RICHARD S ,  SEMPOLINSKI DANIEL R ,  YU CHUNZHE C

IPC分类号： C03C3/06 ,  G03F1/50 ,  G03F1/70 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  C03C4/00 ,  G03F1/00

CPC分类号： G03F7/70566 ,  C03C3/06 ,  C03C2201/23 ,  G03F1/60

摘要： The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.