专利检索 ap:("Carl Zeiss SMT GmbH") AND inv:"KIEREY, Holger" 第 1 页

1.

发明公开
OPTICAL ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开

公开(公告)号：EP3559749A1

公开(公告)日：2019-10-30

申请号：EP17807769.9

申请日：2017-11-17

申请人： Carl Zeiss SMT GmbH

发明人： MOSER, Ralf , HEROLD, Florian , SCHMITTNER, Arno , KIEREY, Holger , MERKEL, Wolfgang , METALIDIS, Georgo

IPC分类号： G03F7/20 , G02B5/08 , G21K1/06

2.

发明公开
REFLEKTIVES OPTISCHES ELEMENT FÜR DIE EUV-LITHOGRAPHIE 审中-公开

公开(公告)号：EP3491468A1

公开(公告)日：2019-06-05

申请号：EP17740385.4

申请日：2017-07-17

申请人： Carl Zeiss SMT GmbH

发明人： EHM, Dirk Heinrich , SHKLOVER, Vitaliy , AMENT, Irene , SCHMIDT, Stefan-Wolfgang , BECKER, Moritz , WIESNER, Stefan , URICH, Diana , MEIER, Robert , WINTER, Ralf , JALICS, Christof , KIEREY, Holger , EVA, Eric

IPC分类号： G03F7/20 , G21K1/06

3.

发明公开
EUV-KOLLEKTOR 审中-公开

公开(公告)号：EP3465348A1

公开(公告)日：2019-04-10

申请号：EP17725602.1

申请日：2017-05-24

申请人： Carl Zeiss SMT GmbH

发明人： SCHUSTER, Ingrid , MERKEL, Wolfgang , METALIDIS, Georgo , KIEREY, Holger

IPC分类号： G03F7/20 , G21K1/06 , G02B5/08

4.

发明公开
EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS 审中-公开

公开(公告)号：EP3440490A1

公开(公告)日：2019-02-13

申请号：EP17714716.2

申请日：2017-03-30

申请人： Carl Zeiss SMT GmbH

发明人： KIEREY, Holger , ZELLNER, Johannes

IPC分类号： G02B19/00 , G02B5/18 , G03F7/20 , G02B27/42

5.

发明公开
MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS COMPRISING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE AND METHOD FOR PRODUCING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE ON A MIRROR 审中-公开

公开(公告)号：EP3887878A2

公开(公告)日：2021-10-06

申请号：EP19809068.0

申请日：2019-11-25

申请人： Carl Zeiss SMT GmbH

发明人： JALICS, Christof , SCHUSTER, Fabian , KIEREY, Holger , SANDNER, Andreas , MEISCH, Tobias

IPC分类号： G02B5/08 , G02B27/42 , G02B5/18 , G03F7/20

6.

发明公开
METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND COMPONENT OF THIS TYPE 审中-公开
标题翻译：制造用于EUV投射曝光装置及零件这种类型的反射性光学部件

公开(公告)号：EP2686133A1

公开(公告)日：2014-01-22

申请号：EP12708143.8

申请日：2012-03-13

申请人： Carl Zeiss Laser Optics GmbH , Carl Zeiss SMT GmbH

发明人： KIEREY, Holger , SIEKMANN, Heiko , BRESAN, Andre

IPC分类号： B24B13/00 , G02B5/18

CPC分类号： G02B5/208 , B24B13/00 , G02B1/10 , G02B5/0891 , G02B5/10 , G02B5/1838 , G02B5/1852 , G02B5/1857 , G03F7/70316 , G21K2201/064 , G21K2201/065 , G21K2201/067

摘要： A method for producing a reflective optical component (10) for an EUV projection exposure apparatus, said component having a substrate (12) having a base body (14), and a reflective layer (20) arranged on the substrate (12), wherein the substrate (12) has an optically operative microstructuring (16), comprises the following steps: working the microstructuring (16) into the substrate (12), polishing the substrate (12) after the micro-structuring (16) has been worked into the substrate (12), applying the reflective layer (20) to the substrate (12). A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.