PRESSURE-SENSITIVE ADHESIVE TAPE
    1.
    发明公开

    公开(公告)号:EP3636722A1

    公开(公告)日:2020-04-15

    申请号:EP18813362.3

    申请日:2018-05-25

    摘要: An adhesive tape has superior mechanical properties, and can suppress occurrence of cracks after being exposed to high temperature conditions for a long period of time. The adhesive tape includes a substrate and an adhesive layer formed on one side of the substrate; wherein the substrate is made of a resin composition including 40 to 65 parts by mass of high boiling point plasticizer and 5 to 15 parts by mass of antimony trioxide with respect to 100 parts by mass of polyvinyl chloride resin.

    ADHESIVE SHEET FOR REAR SURFACE GRINDING, SEMICONDUCTOR WAFER MANUFACTURING METHOD, AND BASE MATERIAL SHEET

    公开(公告)号:EP4333025A1

    公开(公告)日:2024-03-06

    申请号:EP22811161.3

    申请日:2022-05-11

    摘要: The present invention aims to provide an adhesive sheet for back grinding capable of suppressing peeling of an adhesive layer and capable of peeling a wafer easily from an adhesive sheet.
    According to the present invention, provided is an adhesive sheet for back grinding of a semiconductor wafer having a convex part, comprising: a base material layer; and an adhesive layer provided on the base material layer, wherein: the adhesive layer comprises an opening part having a diameter smaller than a diameter of the semiconductor wafer; the adhesive layer is adhered to an outer peripheral part of the semiconductor wafer so shat the convex part of the semiconductor wafer is placed in the opening part; the adhesive layer is configured so that the convex part is protected by the base material layer with the semiconductor wafer adhered to the adhesive layer; the base material layer comprises a cushion layer and a surface treatment layer provided thereon; the adhesive layer is provided on the surface treatment layer; the surface treatment layer is formed of an acrylic resin composition containing an acrylic resin; the acrylic resin is cross-linked by light irradiation or heating; and the adhesive layer is formed of an acrylic resin composition containing an acrylic resin.

    ADHESIVE SHEET, PROTECTIVE MATERIAL, AND WIRE HARNESS

    公开(公告)号:EP3693431A1

    公开(公告)日:2020-08-12

    申请号:EP18863821.7

    申请日:2018-08-23

    摘要: [Problem] To provide: an adhesive sheet capable of bonding adhesive layers together at normal temperatures, with little stickiness of the adhesive layers due to a plasticizer seeping out from a substrate; a protective material using the adhesive sheet; and a wire harness.
    [Solution] An adhesive sheet comprising: a substrate containing 20-100 parts by mass of a polyester-based plasticizer (B) with respect to 100 parts by mass of a vinyl halide-based resin (A); a primer layer; and adhesive layers in which an included amount of a tackifier (D) is 0-250 parts by mass and an included amount of inorganic microparticles (E) is 0-250 parts by mass with respect to 100 parts by mass of an elastomer (C), and a total value of the included amounts of the tackifier (D) and the inorganic microparticles (E) is 0-350 parts by mass; wherein the adhesive layers have a probe tack of 7 N/cm 2 or less in accordance with ASTM D 2979, and the adhesive force between the adhesive layers having a width of 15 mm is 1.5 N or more.

    ADHESIVE SHEET FOR BACKGRINDING, SEMICONDUCTOR WAFER MANUFACTURING METHOD, AND SUBSTRATE SHEET

    公开(公告)号:EP4333026A1

    公开(公告)日:2024-03-06

    申请号:EP22811162.1

    申请日:2022-05-11

    摘要: The present invention aims to provide an adhesive sheet for back grinding capable of enhance followability of a base material layer to a convex part of a semiconductor wafer.
    According to the present invention, provided is an adhesive sheet for back grinding of a semiconductor wafer having a convex part, comprising: a base material layer; and an adhesive layer provided on the base material layer, wherein: the adhesive layer comprises an opening part having a diameter smaller than a diameter of the semiconductor wafer; the adhesive layer is adhered to an outer peripheral part of the semiconductor wafer such shat the convex part of the semiconductor wafer is placed in the opening part; the adhesive layer is configured so that the convex part is protected by the base material layer with the semiconductor wafer adhered to the adhesive layer; the base material layer comprises a cushion layer and a barrier layer; and an oxygen permeability of the base material layer at 25°C and at RH0% measured base on JIS K 7126-2 (isobaric method) is 1000 ml/(m 2 ·24h·atm) or lower.