公开(公告)号：EP1635374A4

公开(公告)日：2010-02-24

申请号：EP04729530

申请日：2004-04-26

申请人： EBARA CORP

发明人： NOJI NOBUHARU ,  SATAKE TOHRU ,  SOBUKAWA HIROSI ,  KIMBA TOSHIFUMI ,  HATAKEYAMA MASAHIRO ,  YOSHIKAWA SHOJI ,  MURAKAMI TAKESHI ,  WATANABE KENJI ,  KARIMATA TSUTOMU ,  SUEMATSU KENICHI ,  TABE YUTAKA ,  TAJIMA RYO ,  TOHYAMA KEIICHI

IPC分类号： G01B15/00 ,  G01N23/225 ,  G01N23/20 ,  H01J37/05 ,  H01J37/06 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01L21/66

CPC分类号： G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2817

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25·1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25·11.