公开(公告)号：EP2798669A4

公开(公告)日：2015-08-19

申请号：EP12863340

申请日：2012-12-27

申请人： ENTEGRIS INC

发明人： BARNES JEFFREY A ,  COOPER EMANUEL I ,  CHEN LI-MIN ,  LIPPY STEVEN ,  RAJARAM REKHA ,  TU SHENG-HUNG

IPC分类号： H01L21/3213 ,  H01L21/311

CPC分类号： C09K13/10 ,  C09K13/00 ,  C09K13/06 ,  C09K13/08 ,  C11D7/02 ,  C11D7/08 ,  C11D7/3209 ,  C11D11/0047 ,  C23F1/02 ,  C23F1/30 ,  C23F1/40 ,  H01L21/02063 ,  H01L21/31144 ,  H01L21/32134

摘要： Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.

公开(公告)号：EP2847364A4

公开(公告)日：2015-10-28

申请号：EP13787810

申请日：2013-05-10

申请人： ENTEGRIS INC

发明人： CHEN TIANNIU ,  BILODEAU STEVEN M ,  COOPER EMANUEL I ,  CHEN LI-MIN ,  BARNES JEFFREY A ,  BISCOTTO MARK ,  BOGGS KARL E ,  RAJARAM REKHA

IPC分类号： C23F1/08 ,  H01L21/302

CPC分类号： H01L21/32134 ,  C23F1/28 ,  C23F1/30 ,  C23F1/44 ,  H01L21/02068 ,  H01L21/28518

公开(公告)号：EP2593964A4

公开(公告)日：2017-12-06

申请号：EP11807569

申请日：2011-07-15

申请人： ENTEGRIS INC

发明人： BARNES JEFFREY ,  LIPPY STEVEN ,  ZHANG PENG ,  RAJARAM REKHA

IPC分类号： H01L21/311

CPC分类号： C11D11/0041 ,  C11D3/042 ,  G03F7/42 ,  H01L21/02063 ,  H01L21/02071

摘要： Cleaning compositions and processes for cleaning post-plasma etch residue from a microelectronic device having said residue thereon. The composition achieves highly efficacious cleaning of the residue material, including titanium-containing, copper-containing, tungsten-containing, and/or cobalt-containing post-etch residue from the microelectronic device while simultaneously not damaging the interlevel dielectric, metal interconnect material, and/or capping layers also present thereon.