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公开(公告)号：EP1937870A1
公开(公告)日：2008-07-02
申请号：EP06779552.6
申请日：2006-09-26
申请人： Edwards Limited
CPC分类号： B01D53/007 , B01D2259/806 , B01J19/088 , B01J19/126 , B01J2219/0809 , B01J2219/0869 , B01J2219/0871 , B01J2219/0875 , B01J2219/0883 , B01J2219/1227 , B01J2219/1239 , B01J2219/1245 , B01J2219/1266 , B01J2219/1269 , B01J2219/1272 , C23C16/4412
摘要： A plasma reactor (10) comprises a microwave resonant cavity (12) having a gas inlet (18) and a gas outlet (20), a waveguide (14) for conveying microwave radiation to the resonant cavity, and a plasma torch (40) for injecting into the resonant cavity a plasma stream containing ions for reacting with a gas flowing from the gas inlet (18) to the gas outlet (20).
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公开(公告)号：EP1941073B1
公开(公告)日：2013-04-17
申请号：EP06779560.9
申请日：2006-09-28
申请人： Edwards Limited
IPC分类号： C23C16/44
CPC分类号： B01D53/32 , B01D2257/204 , B01D2257/206 , B01D2258/0216 , B01D2259/818 , C23C16/4408 , C23C16/4412 , Y02C20/30
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3.发明授权
公开(公告)号：EP1715937B1
公开(公告)日：2013-04-10
申请号：EP05717757.8
申请日：2005-02-18
申请人： Edwards Limited
CPC分类号： B01J19/088 , B01D53/68 , B01D53/70 , B01D2257/2047 , B01D2257/2066 , B01D2259/818 , B01J2219/0896 , G03F7/70925 , Y02C20/30
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公开(公告)号：EP1951407B1
公开(公告)日：2012-08-08
申请号：EP06794561.8
申请日：2006-09-25
申请人： Edwards Limited
CPC分类号： B01D53/32 , B01D53/007 , B01D2259/806 , B01D2259/818 , B01J19/126
摘要： In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
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公开(公告)号：EP1915768A1
公开(公告)日：2008-04-30
申请号：EP06765116.6
申请日：2006-07-27
申请人： Edwards Limited
IPC分类号： H01J37/32
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapor, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas.
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公开(公告)号：EP1915768B1
公开(公告)日：2014-09-10
申请号：EP06765116.6
申请日：2006-07-27
申请人： Edwards Limited
IPC分类号： H01J37/32
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
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公开(公告)号：EP1937870B1
公开(公告)日：2010-11-10
申请号：EP06779552.6
申请日：2006-09-26
申请人： Edwards Limited
CPC分类号： B01D53/007 , B01D2259/806 , B01J19/088 , B01J19/126 , B01J2219/0809 , B01J2219/0869 , B01J2219/0871 , B01J2219/0875 , B01J2219/0883 , B01J2219/1227 , B01J2219/1239 , B01J2219/1245 , B01J2219/1266 , B01J2219/1269 , B01J2219/1272 , C23C16/4412
摘要： A plasma reactor (10) comprises a microwave resonant cavity (12) having a gas inlet (18) and a gas outlet (20), a waveguide (14) for conveying microwave radiation to the resonant cavity, and a plasma torch (40) for injecting into the resonant cavity a plasma stream containing ions for reacting with a gas flowing from the gas inlet (18) to the gas outlet (20).
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公开(公告)号：EP1951422A2
公开(公告)日：2008-08-06
申请号：EP06779493.3
申请日：2006-09-21
申请人： Edwards Limited
发明人： RADOIU, Marilena
CPC分类号： B01D53/32 , A62D3/178 , A62D3/38 , B01D2257/204 , B01D2257/206 , B01D2258/0216 , B01D2259/818 , B01J19/126 , C23C16/4412 , C23C16/511 , H05H1/24 , H05H1/46 , H05H2001/4622 , H05H2001/4697 , H05H2245/121
摘要： A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapour.
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公开(公告)号：EP1951407A1
公开(公告)日：2008-08-06
申请号：EP06794561.8
申请日：2006-09-25
申请人： Edwards Limited
CPC分类号： B01D53/32 , B01D53/007 , B01D2259/806 , B01D2259/818 , B01J19/126
摘要： In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
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公开(公告)号：EP1941073A1
公开(公告)日：2008-07-09
申请号：EP06779560.9
申请日：2006-09-28
申请人： Edwards Limited
IPC分类号： C23C16/44
CPC分类号： B01D53/32 , B01D2257/204 , B01D2257/206 , B01D2258/0216 , B01D2259/818 , C23C16/4408 , C23C16/4412 , Y02C20/30
摘要： In a method of treating a gas exhausted from a process chamber, the exhaust gas is conveyed to a vacuum pump (20) and a nitrogen purge gas is added to the exhaust gas for pumping with the exhaust gas. Gas exhaust from the pump is conveyed to an abatement device (28) for abating the exhaust gas. The amount of purge gas added to the exhaust gas is adjusted in response to a variation of the composition of the exhaust gas, or the composition of the gas supplied to the process chamber, to optimise the abatement of the exhaust gas.
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