摘要:
Laser singulation of electronic devices 12 from semiconductor substrates including wafers 180 is performed using up to 3 lasers 150, 160, 170 from 2 wavelength ranges. Using up to 3 lasers 150, 160, 170 from 2 wavelength ranges permits laser singulation of wafers 180 held by die attach film 184 while avoiding problems caused by single-wavelength dicing. In particular, using up to 3 lasers 150, 160, 170 from 2 wavelength ranges permits efficient dicing of semiconductor wafers 180 while avoiding debris and thermal problems associated with laser processing die attach tape 184.
摘要:
An improved method for singulation of electronic substrates into dice uses a laser to first form cuts in the substrate and then chamfers the edges of the cuts by altering the laser parameters. The chamfers increase die break strength by reducing the residual damage and removes debris caused by the initial laser cut without requiring additional process steps, additional equipment or consumable supplies.
摘要:
Tailored laser pulse shapes are used for processing workpieces. Laser dicing of semiconductor device wafers on die-attach film (DAF), for example, may use different tailored laser pulse shapes for scribing device layers down to a semiconductor substrate, dicing the semiconductor substrate, cutting the underlying DAF, and/or post processing of the upper die edges to increase die break strength. Different mono-shape laser pulse trains may be used for respective recipe steps or passes of a laser beam over a scribe line. In another embodiment, scribing a semiconductor device wafer includes only a single pass of a laser beam along a scribe line using a mixed-shape laser pulse train that includes at least two laser pulses that are different than one another. In addition, or in other embodiments, one or more tailored pulse shapes may be selected and provided to the workpiece on-the-fly. The selection may be based on sensor feedback.