Method for inspecting a sample
    1.
    发明公开
    Method for inspecting a sample 审中-公开
    Verfahren zur Untersuchung einer Probe

    公开(公告)号:EP2278306A1

    公开(公告)日:2011-01-26

    申请号:EP09165269.3

    申请日:2009-07-13

    Applicant: FEI COMPANY

    Abstract: The invention describes a method for inspecting samples in an electron microscope. A sample carrier 500 shows electrodes504, 507 connecting pads 505, 508 with areas A on which the sample is to be placed.
    After placing the sample on the sample carrier, a conductive pattern is deposited on the sample, so that voltages and currents can be applied to localized parts of the sample. Applying the pattern on the sample may be done with, for example, Beam Induced Deposition or ink-jet printing.
    The invention also teaches building electronic components, such as resistors, capacitors, inductors and active elements such as FET's in the sample.

    Abstract translation: 本发明描述了一种在电子显微镜中检查样品的方法。 样品载体500显示电极504,407连接焊盘505,508与其上要放置样品的区域A. 将样品放在样品载体上后,导电图案沉积在样品上,从而可以将电压和电流施加到样品的局部部分。 将样品应用于样品可以用例如光束沉积或喷墨打印进行。 本发明还教导在样品中构建诸如电阻器,电容器,电感器和诸如FET的有源元件的电子部件。

    Charged-particle microscopy with occlusion detection
    2.
    发明公开
    Charged-particle microscopy with occlusion detection 有权
    Mikroskopie mit geladenen Teilchen mit Okklusionsdetektion

    公开(公告)号:EP2525386A1

    公开(公告)日:2012-11-21

    申请号:EP12167967.4

    申请日:2012-05-15

    Applicant: FEI Company

    Abstract: A method of examining a sample using a charged-particle microscope, comprising the following steps:
    - Mounting the sample on a sample holder;
    - Using a particle-optical column to direct at least one beam of particulate radiation onto the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample;
    - Using a first detector configuration C 1 to detect a first portion of the emitted radiation and produce a first image I 1 based thereupon,

    which method comprises the following steps:
    - Using at least a second detector configuration C 2 to detect a second portion of the emitted radiation and produce a second image I 2 based thereupon, whereby C 2 is different to C 1 , thus compiling a set S D = {C 1 , C 2 } of detector configurations and a set S I = {I 1 , I 2 } of corresponding images;
    - Using computer processing apparatus to automatically compare different members of S I and mathematically identify on the sample at least one occlusion region with an occluded line of sight relative to at least one member of S D .
    In a particular embodiment:
    - Plural members of S I are mathematically fused into a composite reference image IF;
    - At least one test image I T is selected from S I ;
    - Said occlusion region is identified using a technique that comprises comparing I F to I T and identifying an area in I T in which at least one of the following is observed:
    ■ A reduced correlation between I T and IF;
    ■ A reduced intensity in I T relative to I F .

    Abstract translation: 使用带电粒子显微镜检查样品的方法,包括以下步骤: - 将样品安装在样品架上; - 使用粒子 - 光学柱将至少一束颗粒辐射引导到样品上,由此产生引起发射的辐射从样品中发出的相互作用; - 使用第一检测器配置C 1来检测所发射的辐射的第一部分并基于此产生第一图像I 1,该方法包括以下步骤: - 使用至少第二检测器配置C 2检测第二部分 发射的辐射并产生基于其的第二图像I 2,由此C 2与C 1不同,从而编译检测器配置的集合SD = {C 1,C 2},并且将集合SI = {I 1,I 2} 的相应图像; - 使用计算机处理设备来自动比较S I的不同成员,并相对于S D的至少一个成员以数学方式在样本上识别具有闭塞视线的至少一个闭塞区域。 在特定实施例中:S I的多个成员在数学上融合成复合参考图像IF; - 从S I中选择至少一个测试图像I T; - 使用包括将I F与I T进行比较并识别I T中的区域的技术来识别所述遮挡区域,其中观察到以下中的至少一个: - I T和IF之间的相关性降低; - I T相对于I F的强度降低。

    Method for inspecting a sample
    3.
    发明公开
    Method for inspecting a sample 有权
    检验样品的方法

    公开(公告)号:EP2278307A1

    公开(公告)日:2011-01-26

    申请号:EP10169200.2

    申请日:2010-07-12

    Applicant: FEI COMPANY

    Abstract: The invention describes a method for inspecting samples in an electron microscope. A sample carrier 500 shows electrodes504, 507 connecting pads 505, 508 with areas A on which the sample is to be placed.
    After placing the sample on the sample carrier, a conductive pattern is deposited on the sample, so that voltages and currents can be applied to localized parts of the sample.
    Applying the pattern on the sample may be done with, for example, Beam Induced Deposition or ink-jet printing.
    The invention also teaches building electronic components, such as resistors, capacitors, inductors and active elements such as FET's in the sample.

    Abstract translation: 本发明描述了一种用于在电子显微镜中检查样品的方法。 样本载体500示出了电极504,507,连接焊盘505,508与样本将放置在其上的区域A. 将样品放置在样品载体上之后,将导电图案沉积在样品上,以便可以将电压和电流施加到样品的局部部分。 在样品上施加图案可以用例如光束诱导沉积或喷墨印刷完成。 本发明还教导了在样本中构建电子组件,诸如电阻器,电容器,电感器和诸如FET的有源元件。

    Charged-particle microscope
    6.
    发明公开
    Charged-particle microscope 审中-公开
    Ladungsträger-Mikroskop

    公开(公告)号:EP2525385A1

    公开(公告)日:2012-11-21

    申请号:EP11166206.0

    申请日:2011-05-16

    Applicant: FEI COMPANY

    Inventor: Phifer, Daniel

    Abstract: A method of examining a region of interest of a sample using a charged-particle microscope, comprising the following steps:
    - Mounting the sample on a movable sample holder;
    - Providing a particle-optical column that can be used to direct at least one beam of particulate radiation onto at least said region, thereby producing an interaction that causes emitted radiation to emanate from the sample;
    - In a measurement of a first type, using a first detector to detect a first type of said emitted radiation;
    - Using an output of said first detector as a basis to perform at least one of the following actions:
    - Assign a value of a measurand to a given coordinate position within said region, for one or more such coordinate positions;
    - Construct an image of said region,
    wherein the following steps are additionally performed:
    - In a measurement of a second type, using a second detector to detect a second type of said emitted radiation;
    - Providing computer processing apparatus;
    - Using said computer processing apparatus to automatically perform the following actions:
    - Based on an output of said second detector, construct a topographical map of at least a portion of the sample proximal to said region of interest;
    - Based on said topographical map, identify at least one locus of said sample where sample topography is expected to detrimentally affect accuracy of a measurement of the first type performed at that locus, for at least one geometric attitude of said locus with respect to at least one of said beam and said first detector.


    Said computer processing apparatus can be employed to automatically perform at least one of the following actions:
    - Draw the attention of a user of said charged-particle microscope to the existence of said locus;
    - For said locus, indicate an extent to which said accuracy is expected to be detrimentally affected;
    - Calculate at least one modification of said measurement of the first type aimed at improving said accuracy;
    - Enact said modification.

    Abstract translation: 使用带电粒子显微镜检查样品的感兴趣区域的方法,包括以下步骤: - 将样品安装在可移动的样品架上; - 提供可用于将至少一束颗粒辐射引导到至少所述区域的颗粒光学柱,从而产生引起发射的辐射从样品发出的相互作用; - 在第一类型的测量中,使用第一检测器来检测第一类型的所述发射的辐射; - 使用所述第一检测器的输出作为执行以下动作中的至少一个的基础: - 对于一个或多个这样的坐标位置,将被测量的值分配给所述区域内的给定坐标位置; - 构造所述区域的图像,其中另外执行以下步骤: - 在第二类型的测量中,使用第二检测器来检测所述发射的辐射的第二类型; - 提供计算机处理设备; - 使用所述计算机处理装置自动执行以下动作: - 基于所述第二检测器的输出,构建所述样本的至少一部分的至少一部分的地形图,所述至少一部分附近靠近所述感兴趣区域; - 基于所述地形图,识别所述样本的至少一个轨迹,其中样本地形预期会不利地影响在所述轨迹处执行的第一类型的测量的精度,对于至少一个所述轨迹相对于至少一个几何姿态 所述光束和所述第一检测器中的一个。 所述计算机处理装置可以用于自动执行以下动作中的至少一个: - 引起所述带电粒子显微镜的用户对所述轨迹的存在的注意; - 对于所述场所,表示预期会有不良影响的程度; - 计算第一类型的所述测量的至少一个修改,目的是提高所述精度; - 发表修改。

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