公开(公告)号：EP2356516B1

公开(公告)日：2017-10-25

申请号：EP09788097.5

申请日：2009-12-11

申请人： FUJIFILM Corporation

发明人： SAEGUSA, Hiroshi ,  IWATO, Kaoru ,  HIRANO, Shuji ,  IIZUKA, Yusuke

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041

公开(公告)号：EP2356517B1

公开(公告)日：2017-01-25

申请号：EP09788098.3

申请日：2009-12-11

申请人： FUJIFILM Corporation

发明人： HIRANO, Shuji ,  IWATO, Kaoru ,  SAEGUSA, Hiroshi ,  IIZUKA, Yusuke

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC分类号： C07D307/93 ,  C07D407/12 ,  C07D493/08 ,  C07D493/18 ,  C07D495/18 ,  C08F24/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

公开(公告)号：EP2577397A1

公开(公告)日：2013-04-10

申请号：EP11786732.5

申请日：2011-05-20

申请人： FUJIFILM Corporation

发明人： IWATO, Kaoru ,  TAKAHASHI, Hidenori ,  HIRANO, Shuji ,  KAMIMURA, Sou ,  KATO, Keita

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40 ,  Y10T428/24

摘要： Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.

摘要翻译： 提供了形成极限分辨能力，粗糙度特性，曝光宽容度（EL）和桥缺陷性能优异的图案和光化射线或辐射敏感性树脂组合物的方法。 形成图案的方法包括：（1）将光化学射线或辐射敏感性树脂组合物形成膜，（2）将膜曝光，和（3）用含有机溶剂的显影剂显影曝光膜 。 光化射线或辐射敏感性树脂组合物含有（A）含有具有结构部分的重复单元的树脂，其结构部分被配置为当暴露于光化射线或辐射时分解，从而产生酸，和（B）溶剂。

公开(公告)号：EP2478415A1

公开(公告)日：2012-07-25

申请号：EP10817324.6

申请日：2010-09-16

申请人： FUJIFILM Corporation

发明人： IIZUKA, Yusuke ,  TAKAHASHI, Hidenori ,  SHIRAKAWA, Michihiro ,  YOSHIDOME, Masahiro ,  HIRANO, Shuji

IPC分类号： G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

CPC分类号： C08F220/26 ,  G03F7/0397 ,  G03F7/2041

摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid when exposed to actinic rays or radiation.

摘要翻译： 根据一个实施方案，光化射线或辐射敏感树脂组合物包含含有重复单元（A）的树脂，所述重复单元（A）含有通过酸的作用分解的结构部分（S1），从而产生碱溶性 基团和通过碱性显影剂的作用分解以增加其溶解到碱性显影剂中的速率的结构部分（S2），以及当暴露于光化射线或辐射时产生酸的化合物。

公开(公告)号：EP2356516A2

公开(公告)日：2011-08-17

申请号：EP09788097.5

申请日：2009-12-11

申请人： FUJIFILM Corporation

发明人： SAEGUSA, Hiroshi ,  IWATO, Kaoru ,  HIRANO, Shuji ,  IIZUKA, Yusuke

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041

摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.

摘要翻译： 提供了一种光化射线敏感或辐射敏感树脂组合物包括：（A）能够通过酸的作用而超过碱显影剂中增加的溶解度的树脂，（B），能够在酸照射时在生成的化合物 光化射线或辐射，和（C）具有至少一个极性转换基团的重复单元和具有至少任一个氟原子或硅原子其中含有树脂（c）。

公开(公告)号：EP2260352A1

公开(公告)日：2010-12-15

申请号：EP09727087.0

申请日：2009-03-31

申请人： FUJIFILM Corporation

发明人： FUJII, Kana ,  TOMIGA, Takamitsu ,  TSUCHIHASHI, Toru ,  MIZUTANI, Kazuyoshi ,  YOKOYAMA, Jiro ,  SUGIYAMA, Shinichi ,  HIRANO, Shuji ,  FUJIMORI, Toru

IPC分类号： G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  H01L21/027

CPC分类号： G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.

公开(公告)号：EP3674796A8

公开(公告)日：2020-08-12

申请号：EP18848452.1

申请日：2018-06-26

申请人： FUJIFILM Corporation

发明人： MIYAKAWA, Yuya ,  HIRANO, Shuji

IPC分类号： G03F7/004 ,  B41N1/08 ,  B41N1/14 ,  C08F20/10 ,  C08F20/56 ,  C08F22/40 ,  G03F7/00

摘要： Provided are a negative-type planographic printing plate precursor having an image-recording layer on an aluminum support, in which the image-recording layer includes a polymer particle 1 having a constitutional unit made of a monomer having a solubility parameter of 23 MPa 1/2 or more, a thermoplastic polymer particle 2, and an infrared absorber, and at least any of fusion or aggregation of the thermoplastic polymer particle 2 is caused by heat during exposure, whereby an image can be formed and a method for producing a planographic printing plate using the negative-type planographic printing plate precursor.

公开(公告)号：EP3632694A1

公开(公告)日：2020-04-08

申请号：EP18808732.4

申请日：2018-05-08

申请人： FUJIFILM Corporation

发明人： HIRANO, Shuji ,  ENOMOTO, Kazuaki ,  NOGOSHI, Keisuke

IPC分类号： B41N1/14 ,  C08F2/44 ,  C08F290/06 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038

摘要： Provided are a lithographic printing plate precursor having an image-recording layer on a hydrophilic support, in which the image-recording layer includes a polymer having a constituent unit derived from a monomer having a solubility parameter of 20 MPa 1/2 or more, an infrared absorber, and a polymer particle; a resin composition for producing a lithographic printing plate precursor including the polymer, an infrared absorber, and a polymer particle; and a method for producing a lithographic printing plate in which the lithographic printing plate precursor is used.

公开(公告)号：EP2691809A1

公开(公告)日：2014-02-05

申请号：EP12763123.2

申请日：2012-03-29

申请人： FUJIFILM Corporation

发明人： TAKAHASHI, Toshiya ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki ,  HIRANO, Shuji ,  TSUCHIMURA, Tomotaka

IPC分类号： G03F7/039 ,  G03F7/004 ,  H01L21/027

CPC分类号： G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.

公开(公告)号：EP2411873A1

公开(公告)日：2012-02-01

申请号：EP10756267.0

申请日：2010-03-23

申请人： FUJIFILM Corporation

发明人： FUJI, Kana ,  HIRANO, Shuji ,  YAMADA, Shinki ,  FUJIMORI, Toru

IPC分类号： G03F7/039 ,  C08F8/12 ,  C08F212/14 ,  C08F220/12 ,  G03F7/004 ,  H01L21/027

CPC分类号： C08F212/14 ,  C08F8/12 ,  C08F220/20 ,  C08F2220/1825 ,  C08K5/375 ,  C08K5/41 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  C08F2220/281 ,  C08F220/30

摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R
1 and R
11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R
12 represents a phenyl group which may have a substituent.