Abstract:
A vertical type GaN series field effect transistor having excellent pinch-off characteristics is provided. A compound semiconductor device includes a conductive semiconductor substrate, a drain electrode formed on a bottom surface of the conductive semiconductor substrate, a current blocking layer formed on a top surface of the conductive semiconductor substrate, made of high resistance compound semiconductor or insulator, and having openings, an active layer of compound semiconductor burying the openings and extending on an upper surface of the current blocking layer, a gate electrode formed above the openings and above the active layer, and a source electrode formed laterally spaced from the gate electrode and formed above the active layer.
Abstract:
A compound semiconductor device is provided with a first nitride semiconductor layer (1) of a first conductivity type, a second nitride semiconductor layer (5) of the first conductivity type which is formed over the first nitride semiconductor layer (1) and being in contact with the first nitride semiconductor layer (1), a third nitride semiconductor layer (4) of a second conductivity type being in contact with the second nitride semiconductor layer (5), a fourth nitride semiconductor layer (3) of the first conductivity type being in contact with the third nitride semiconductor layer (4), and an insulating film (2) insulating the first nitride semiconductor layer (1) and the fourth nitride semiconductor layer (3) from each other. A source electrode (8) is positioned inside an outer edge of the insulating film (2) in planar view.
Abstract:
A vertical type GaN series field effect transistor having excellent pinch-off characteristics is provided. A compound semiconductor device includes a conductive semiconductor substrate, a drain electrode formed on a bottom surface of the conductive semiconductor substrate, a current blocking layer formed on a top surface of the conductive semiconductor substrate, made of high resistance compound semiconductor or insulator, and having openings, an active layer of compound semiconductor burying the openings and extending on an upper surface of the current blocking layer, a gate electrode formed above the openings and above the active layer, and a source electrode formed laterally spaced from the gate electrode and formed above the active layer.
Abstract:
A compound semiconductor device is provided with a first nitride semiconductor layer (1) of a first conductivity type, a second nitride semiconductor layer (5) of the first conductivity type which is formed over the first nitride semiconductor layer (1) and being in contact with the first nitride semiconductor layer (1), a third nitride semiconductor layer (4) of a second conductivity type being in contact with the second nitride semiconductor layer (5), a fourth nitride semiconductor layer (3) of the first conductivity type being in contact with the third nitride semiconductor layer (4), and an insulating film (2) insulating the first nitride semiconductor layer (1) and the fourth nitride semiconductor layer (3) from each other. A source electrode (8) is positioned inside an outer edge of the insulating film (2) in planar view.