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    Process for preparing phosphor pattern for field emission panel, photosensitive element for field emission display panel, phosphor pattern for field emission display panel and field emission display panel
    2.
    发明公开
    Process for preparing phosphor pattern for field emission panel, photosensitive element for field emission display panel, phosphor pattern for field emission display panel and field emission display panel 失效
    一种制备荧光图案用于场致发射显示面板中，用于场致发射显示面板的光敏元件与荧光体图案，和场致发射显示面板的过程

    公开(公告)号：EP0887833A3

    公开(公告)日：2000-02-02

    申请号：EP98401222.9

    申请日：1998-05-20

    申请人： Hitachi Chemical Co., Ltd.

    发明人： Tai, Seiji ,  Horibe, Yoshiyuki ,  Tanaka, Hiroyuki ,  Nojiri, Takeshi ,  Satou, Kazuya ,  Kimura, Naoki ,  Shimamura, Mariko

    IPC分类号： H01J9/227

    CPC分类号： H01J9/2271

    摘要： Disclosed are a process for preparing a phosphor pattern for a field emission display panel which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) irradiating active light to (A) the photosensitive resin composition layer containing a phosphor imagewisely; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been imagewisely irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form a phosphor pattern, a photosensitive element for a FED display panel, phosphor pattern for a FED display panel, and a FED display panel.

    摘要翻译： 本发明公开了用于制备荧光图案用于场致发射显示面板，其包括以下步骤的方法：（I）形成的（A）的感光性树脂组合物层含有上有导电层中形成衬底磷; （II）照射活性光线（A）含有荧光体成像方式的感光性树脂组合物层; （III）中除去选择性（A）到哪个活性光已经通过显影被成像方式照射而形成图案的感光性树脂组合物层; 和（IV）煅烧所述图案，以除去不必要的部分，以形成荧光体图案，对于FED显示面板的光敏元件，用于FED显示面板的荧光体图案和FED显示面板。

    Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same
    4.
    发明公开
    Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same 失效
    Phosphormuster，Verfahren zur Herstellung desselben und lichtempfindliches verwendetes Elementdafür

    公开(公告)号：EP1387384A1

    公开(公告)日：2004-02-04

    申请号：EP03024548.4

    申请日：1997-01-21

    申请人： Hitachi Chemical Co., Ltd.

    发明人： Nojiri, Takeshi ,  Tsuiki, Hideyasu ,  Tanaka, Hiroyuki ,  Wada, Yumiko ,  Tai, Seiji ,  Tanno, Seiichi ,  Kakumaru, Hajime ,  Sato, Kazuya ,  Kimura, Naoki ,  Mukai, Ikuo

    IPC分类号： H01J9/227 ,  H01J17/49 ,  G03F7/032 ,  G03F7/00

    CPC分类号： G03F1/56 ,  G03F7/0007 ,  H01J9/2271 ,  H01J2211/42 ,  H01J2217/49

    摘要： Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate,
       wherein when the length from the bottom of the concave portion to the top of a convex portion is L (µm), the phosphor pattern thickness ratio (x)/(y) of the thickness (x) of the phosphor pattern formed on an uneven wall surface at a position of 0.9 x L from the bottom of the concave portion toward the top of the convex portion to the thickness (y) of the phosphor pattern formed on the uneven wall surface at a position of 0.4 x L from the bottom of the concave portion toward the top of the convex portion satisfies a range of 0.1 to 1.5, and processes for preparing the same.

    摘要翻译： 公开了一种荧光体图案，其包括具有凹凸的基板和形成在基板的凹部的内表面上的荧光体层，其中，当从凹部的底部到凸部的顶部的长度为L（mu m），形成在从凹部的底部朝向顶部的0.9×L的位置处的不平坦壁面上的荧光体图案的厚度（x）的荧光体图案厚度比（x）/（y） 形成在从凹部的底部到凸部的顶部的0.4×L的位置处形成在不平坦壁面上的荧光体图案的厚度（y）的凸部满足0.1〜1.5的范围， 准备一样

    Process for preparing phosphor pattern for field emission panel, photosensitive element for field emission display panel, phosphor pattern for field emission display panel and field emission display panel
    6.
    发明公开
    Process for preparing phosphor pattern for field emission panel, photosensitive element for field emission display panel, phosphor pattern for field emission display panel and field emission display panel 失效
    菲律宾zur Herstellung eines Phosphormustersfüreine Feldemissionsanzeigetafel und photoempfindliches Element

    公开(公告)号：EP0887833A2

    公开(公告)日：1998-12-30

    申请号：EP98401222.9

    申请日：1998-05-20

    申请人： Hitachi Chemical Co., Ltd.

    发明人： Tai, Seiji ,  Horibe, Yoshiyuki ,  Tanaka, Hiroyuki ,  Nojiri, Takeshi ,  Satou, Kazuya ,  Kimura, Naoki ,  Shimamura, Mariko

    IPC分类号： H01J9/227

    CPC分类号： H01J9/2271

    摘要： Disclosed are a process for preparing a phosphor pattern for a field emission display panel which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) irradiating active light to (A) the photosensitive resin composition layer containing a phosphor imagewisely; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been imagewisely irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form a phosphor pattern, a photosensitive element for a FED display panel, phosphor pattern for a FED display panel, and a FED display panel.

    摘要翻译： 公开了一种制备场发射显示面板的荧光体图案的方法，包括以下步骤：（I）在形成有导电层的基板上形成（A）含有荧光体的感光性树脂组合物层; （II）向（A）成像含有荧光体的感光性树脂组合物层照射活性光; （III）选择性地除去（A）通过显影成像照射活性光的感光性树脂组合物层以形成图案; 和（IV）煅烧图案以除去不需要的部分以形成荧光体图案，用于FED显示面板的感光元件，用于FED显示面板的荧光体图案和FED显示面板。

    Processes for preparing phosphor pattern, phosphor pattern prepared by the same and back plate for plasma display panel
    8.
    发明公开
    Processes for preparing phosphor pattern, phosphor pattern prepared by the same and back plate for plasma display panel 失效
    一种制备磷光体的图案，由此制得的荧光体图形和背面板的等离子显示面板的过程

    公开(公告)号：EP0865067A2

    公开(公告)日：1998-09-16

    申请号：EP98400575.1

    申请日：1998-03-11

    申请人： HITACHI CHEMICAL CO., LTD.

    发明人： Satou, Kazuya ,  Tanaka, Hiroyuki ,  Nojiri, Takeshi ,  Kimura, Naoki ,  Ashizawa, Toranosuke ,  Tai, Seiji ,  Mukai, Ikuo ,  Tanno, Seikichi

    IPC分类号： H01J9/227 ,  H01J17/49

    CPC分类号： H01J9/2271

    摘要： Disclosed are a process for preparing a phosphor pattern of the present invention comprises the steps of:

    (I) forming a phosphor-containing photosensitive resin composition layer (A) on a substrate having unevenness,
    (II) irradiating a scattered light to the layer (A) imagewisely,
    (III) developing the layer (A) by removing the portion to which the scattered light is imagewisely irradiated to form a pattern, and
    (IV) calcinating the formed pattern to remove an unnecessary portion from the pattern formed in the step (III) to form a phosphor pattern,
    a phosphor pattern produced by the above process and a back plate for the plasma display panel provided with the phosphor pattern on a substrate for a plasma display panel.

    摘要翻译： （（i）形成在具有凹凸的衬底的含磷感光性树脂组合物层（A），（II）照射散射光的层：本发明公开了用于制备本发明的荧光体图案的方法包括以下步骤 A）成像方式，（III）通过去除到的散射光成像方式照射而形成图案的部分显影的层（A），和（IV）煅烧所形成的图案在不需要的部分从在所述步骤中形成的图案以除去 （III）以形成荧光剂图案，通过上述方法和用于设置有在基板上的荧光体图案用于等离子体显示面板的等离子体显示面板的背板产生的荧光图案。

    Process for preparing printed circuit board
    9.
    发明公开
    Process for preparing printed circuit board 失效
    制备印刷电路板的过程

    公开(公告)号：EP0630173A3

    公开(公告)日：1996-07-03

    申请号：EP94303930.5

    申请日：1994-06-01

    申请人： Hitachi Chemical Co., Ltd. ,  HITACHI, LTD.

    发明人： Ohta, Fumihiko ,  Nojiri, Takeshi ,  Tsuchikawa, Shinji ,  Nakano, Akio ,  Ishimaru, Toshiaki ,  Yamazaki, Hiroshi ,  Akaboshi, Haruo ,  Kawamoto, Mineo ,  Takahashi, Akio

    IPC分类号： H05K3/18 ,  G03F7/033 ,  C23C18/16

    CPC分类号： G03F7/033 ,  C23C18/1605 ,  C23C18/2013 ,  C23C18/2033 ,  C23C18/24 ,  C23C18/30 ,  C23C18/405 ,  H05K3/0076 ,  H05K3/184 ,  H05K2203/0793

    摘要： Disclosed is a process for preparing a printed circuit board, which comprises the steps of:
    (1) forming, on the surface of an insulating substrate on a necessitate portion of which electrolessly plated copper is to be precipitated, a layer of a light-sensitive resin composition comprising (a) 40 to 80 parts by weight of a vinyl-polymerized high molecular weight binder having an acid value of 10 to 46 mgKOH/g, (b) 20 to 60 parts by weight of a compound having at least two polymerizable unsaturated double bonds in a molecule, with the total amount of Components (a) and (b) being 100 parts by weight, and (c) a photopolymerization initiator generating free radicals by irradiation of active light in an amount of 0.1 to 10 parts by weight based on 100 parts by weight of Components (a) and (b); (2) forming a negative pattern of the light-sensitive resin composition on the surface of the substrate by irradiating active light imagewisely and developing with a semi-aqueous developing solution; and (3) forming a circuit pattern by electroless copper plating by using the negative pattern of the light-sensitive resin composition on the surface of the substrate as a plating resist.

    摘要翻译： 本发明公开了一种制备印刷电路板的方法，该方法包括以下步骤：（1）在需要沉积无电镀铜的必需部分的绝缘基板的表面上形成光敏层 （a）40-80重量份的酸值为10-46mgKOH / g的乙烯基聚合的高分子量粘合剂，（b）20-60重量份的具有至少两个可聚合的化合物的树脂组合物 （a）和（b）的总量为100重量份的分子内具有不饱和双键的光聚合引发剂，和（c）通过活性光照射产生自由基的光聚合引发剂，其量为0.1-10份 基于100重量份的组分（a）和（b）的重量; （2）通过图像照射活性光线并用半水显影液显影，在基材表面上形成光敏树脂组合物的负图案; 和（3）通过在衬底的表面上使用光敏树脂组合物的负图案作为电镀抗蚀剂，通过无电镀铜形成电路图案。