Beam position monitoring apparatus and charged particle beam irradiation system
    1.
    发明公开
    Beam position monitoring apparatus and charged particle beam irradiation system 有权
    STRAHLPOSITIONSÜBERWACHUNGSVORRICHTUNGUND SYSTEM ZUR BESTRAHLUNG MIT GELADENEN TEILCHEN

    公开(公告)号:EP2910279A1

    公开(公告)日:2015-08-26

    申请号:EP15156580.1

    申请日:2015-02-25

    申请人: Hitachi, Ltd.

    IPC分类号: A61N5/10

    摘要: A scanning magnet (28, 29) of an irradiation nozzle (27) is controlled to irradiate the ion beam irradiated from a synchrotron accelerator to a target position P i,j of a spot i,j in a certain layer L i of a target volume, using a scanning control apparatus (40). A deviation D j between the target position P i,j and an actual irradiation position Pa i,j is obtained. Using the deviation D j , a systematic error Es i,j and a random error Er i,j of the actual irradiation position Pa i,j are obtained. Whether the systematic error Es i,j exists within a first permissible range of the systematic error Es i,j is determined. Whether the random error Er i,j exists within a second permissible range of the random error Er i,j is determined. When the systematic error Es i,j or the random error Er i,j is deviated from the permissible range, the irradiation of the ion beam to the target volume is stopped.

    摘要翻译: 控制照射喷嘴(27)的扫描磁体(28,29)以将从同步加速器照射的离子束照射到目标的某个层L i中的点i,j的目标位置P i,j 体积,使用扫描控制装置(40)。 获得目标位置P i,j与实际照射位置Pa i,j之间的偏差D j。 使用偏差D j,获得实际照射位置Pa i,j的系统误差Es i,j和随机误差Er i,j。 系统误差Es i,j是否存在于系统误差Es i,j的第一允许范围内。 随机误差Er i,j是否存在于随机误差Er i的第二允许范围内,j被确定。 当系统误差Es i,j或随机误差Er i,j偏离容许范围时,停止对目标体积的离子束的照射。

    DNA analyzing method and device therefor
    2.
    发明公开
    DNA analyzing method and device therefor 失效
    用于DNA分析的方法和装置

    公开(公告)号:EP0711840A3

    公开(公告)日:1997-04-23

    申请号:EP95117722.9

    申请日:1995-11-09

    申请人: HITACHI, LTD.

    IPC分类号: C12Q1/68 G01N35/00

    摘要: The object of the present invention is to provide a method capable of analyzing the presence or absence of a target DNA sequence, the level and sequence characteristics thereof at a high sensitivity, and a device therefor, wherein the overall process from pretreatment to the recovery of DNA information and the analysis thereof can be completed in a speedy fashion by the simple device structure and procedures. Therefore, by preparing a single-stranded DNA fragment of a target DNA region, detecting the change in the absorbance of the single-stranded DNA sample while changing the denaturing condition of the conformation of the single-stranded DNA fragment by a denaturing condition regulatory means, and analyzing the curve of the change in the absorbance over the modification in the denaturing condition, the sequence information of the single-stranded DNA, namely the target DNA, can be generated in a rapid and simple manner.

    BEAM POSITION MONITORING APPARATUS AND CHARGED PARTICLE BEAM IRRADIATION SYSTEM

    公开(公告)号:EP2910279B1

    公开(公告)日:2018-07-04

    申请号:EP15156580.1

    申请日:2015-02-25

    申请人: Hitachi, Ltd.

    IPC分类号: A61N5/10

    摘要: A scanning magnet (28, 29) of an irradiation nozzle (27) is controlled to irradiate the ion beam irradiated from a synchrotron accelerator to a target position P i,j of a spot i,j in a certain layer L i of a target volume, using a scanning control apparatus (40). A deviation D j between the target position P i,j and an actual irradiation position Pa i,j is obtained. Using the deviation D j , a systematic error Es i,j and a random error Er i,j of the actual irradiation position Pa i,j are obtained. Whether the systematic error Es i,j exists within a first permissible range of the systematic error Es i,j is determined. Whether the random error Er i,j exists within a second permissible range of the random error Er i,j is determined. When the systematic error Es i,j or the random error Er i,j is deviated from the permissible range, the irradiation of the ion beam to the target volume is stopped.

    DNA analyzing method and device therefor
    6.
    发明公开
    DNA analyzing method and device therefor 失效
    Verfahren und Vorrichtung zur DNS Analyze

    公开(公告)号:EP0711840A2

    公开(公告)日:1996-05-15

    申请号:EP95117722.9

    申请日:1995-11-09

    申请人: HITACHI, LTD.

    IPC分类号: C12Q1/68 G01N35/00

    摘要: The object of the present invention is to provide a method capable of analyzing the presence or absence of a target DNA sequence, the level and sequence characteristics thereof at a high sensitivity, and a device therefor, wherein the overall process from pretreatment to the recovery of DNA information and the analysis thereof can be completed in a speedy fashion by the simple device structure and procedures.
    Therefore, by preparing a single-stranded DNA fragment of a target DNA region, detecting the change in the absorbance of the single-stranded DNA sample while changing the denaturing condition of the conformation of the single-stranded DNA fragment by a denaturing condition regulatory means, and analyzing the curve of the change in the absorbance over the modification in the denaturing condition, the sequence information of the single-stranded DNA, namely the target DNA, can be generated in a rapid and simple manner.

    摘要翻译: 本发明的目的是提供一种能够以高灵敏度分析目标DNA序列的存在或不存在,其水平和序列特征及其装置的方法,其中从预处理到恢复的整个过程 DNA信息及其分析可以通过简单的装置结构和程序以快速的方式完成。 因此,通过制备目标DNA区域的单链DNA片段,通过变性条件调节装置改变单链DNA片段构象的变性条件,检测单链DNA样品的吸光度变化 ,并且在变性条件下分析改性后的吸光度变化曲线,可以快速且简单地生成单链DNA(即靶DNA)的序列信息。