摘要:
In a lateral type p-n-p transistor, n-type semiconductor base substance and n-type base region is connected through a high resistance. Due to the high resistance, since an affect in a conjunction capacity between p-type collector (23) and n-type semiconductor base (11) substance can be lessen, a cutoff frequency in the lateral type p-n-p transistor can be heighten. Thereby, a high frequency in a high breakdown voltage lateral type semiconductor device can be improved. The contact condition is avoided by separating the interval between a high concentration of n-base region (11) having a high impurity concentration and a high concentration of p-collector region (23) having a low impurity concentration. Without the lowing in a breakdown voltage, the concentration of the p-collector region (23) having the low impurity concentration can be heighten, thereby a collector resistance can be made small. At the transistor operation time, the voltage between the emitter (21) and the base (11) can be lowered, a current capacity can be improved.
摘要:
In a lateral type p-n-p transistor, n-type semiconductor base substance and n-type base region is connected through a high resistance. Due to the high resistance, since an affect in a conjunction capacity between p-type collector (23) and n-type semiconductor base (11) substance can be lessen, a cutoff frequency in the lateral type p-n-p transistor can be heighten. Thereby, a high frequency in a high breakdown voltage lateral type semiconductor device can be improved. The contact condition is avoided by separating the interval between a high concentration of n-base region (11) having a high impurity concentration and a high concentration of p-collector region (23) having a low impurity concentration. Without the lowing in a breakdown voltage, the concentration of the p-collector region (23) having the low impurity concentration can be heighten, thereby a collector resistance can be made small. At the transistor operation time, the voltage between the emitter (21) and the base (11) can be lowered, a current capacity can be improved.
摘要:
In a semiconductor device a first diode having a pn junction and a second diode having a combination of a Schottky barrier and a pn junction in a current-passing direction are provided side by side in a direction perpendicular to the current-passing direction. When a forward current with a current density J F is passed into the second diodes, the relation is established in a forward voltage V F range of 0.1 (V) to 0.3 (V). The first diode is constituted by first and second semiconductor regions (13, 15) forming a pn junction therebetween, the second being in ohmic contact with one main electrode (3), and having an impurity concentration higher than that of the first semiconductor region (13). The second diode is constituted by first and third semiconductor regions (13, 16) forming a pn junction therebetween, the third being in contact through a Schottky barrier with the one main electrode (3) and having an impurity concentration higher than the first semiconductor region (13).