公开(公告)号：EP1521797A4

公开(公告)日：2006-12-20

申请号：EP02765835

申请日：2002-07-11

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  ARIRAM ARI ,  GUARNIERI C RICHARD ,  HUANG WU-SONG ,  KWONG RANEE ,  MOREAU WAYNE M

IPC: C08G77/04 ,  C08K5/00 ,  B05D5/00 ,  B32B9/04 ,  C08G77/14 ,  C08G77/38 ,  C08J7/18 ,  C08K5/34 ,  C08K5/42 ,  C08L83/04 ,  C08L83/06 ,  G03C1/76 ,  G03F7/075 ,  G03F7/09 ,  H01L21/312 ,  H01L21/3213

CPC classification number: G03F7/091 ,  C08G77/04 ,  C08G77/38 ,  C08K5/3445 ,  C08K5/42 ,  C08L83/04 ,  C08L83/06 ,  C09D183/04 ,  G03F7/0752 ,  C08L2666/28 ,  C08L2666/36

Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.

公开(公告)号：EP1716450A4

公开(公告)日：2007-06-27

申请号：EP04710274

申请日：2004-02-11

Applicant: IBM

Inventor： MOREAU WAYNE M ,  ANGELOPOULOS MARIE ,  HUANG WU-SONG ,  MEDEIROS DAVID R ,  PETRILLO KAREN E

IPC: G03C1/73 ,  G03F1/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC classification number: G03F7/0045 ,  G03F1/78 ,  G03F7/0392 ,  G03F7/40 ,  Y10S430/143

Abstract: Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.

Abstract translation: 抗蚀剂甚至在困难的基板良好的基础性质的组合物通过使用包括室温下为固体的基础上，和液体低蒸气压碱碱添加剂的组合获得。 该组合物的爱在金属衬底上是特别有用的：如在掩模制造常用的含铬层。