公开(公告)号：EP1495365A4

公开(公告)日：2009-06-03

申请号：EP03723925

申请日：2003-04-01

申请人： IBM

发明人： PFEIFFER DIRK ,  ANGELOPOULOS MARIE ,  BABICH KATHERINA ,  BROCK PHILLIP ,  HUANG WU-SONG ,  MAHOROWALA ARPAN P ,  MEDEIROS DAVID R ,  SOORIYAKUMARAN RATNAM

IPC分类号： G03F7/11 ,  G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  G03F7/09 ,  H01L21/027 ,  G03F7/00 ,  G03F7/26 ,  H01L21/312

CPC分类号： H01L21/0276 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/091 ,  Y10S430/151

摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantagously useful with shorter wavelenght lithographic processes and/or have minimal residual acid content.

公开(公告)号：EP1716450A4

公开(公告)日：2007-06-27

申请号：EP04710274

申请日：2004-02-11

申请人： IBM

发明人： MOREAU WAYNE M ,  ANGELOPOULOS MARIE ,  HUANG WU-SONG ,  MEDEIROS DAVID R ,  PETRILLO KAREN E

IPC分类号： G03C1/73 ,  G03F1/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC分类号： G03F7/0045 ,  G03F1/78 ,  G03F7/0392 ,  G03F7/40 ,  Y10S430/143

摘要： Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.

摘要翻译： 抗蚀剂甚至在困难的基板良好的基础性质的组合物通过使用包括室温下为固体的基础上，和液体低蒸气压碱碱添加剂的组合获得。 该组合物的爱在金属衬底上是特别有用的：如在掩模制造常用的含铬层。