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1.发明公开Regeneration of spent ferric chloride etchants 失效Regenerierung von verbrauchten Ferrichlorid-Ätzmitteln。
公开(公告)号：EP0396984A1
公开(公告)日：1990-11-14
申请号：EP90108083.8
申请日：1990-04-27
IPC分类号： C23F1/46
CPC分类号： C23F1/46
摘要： Spent ferric chloride etching compositions are regenerated by electrolysis which includes introducing spent ferric chloride etching composition containing total iron content substantially equal to the original total iron content of fresh etching composition into the anode compartment of an electrolysis cell that contains an anode compartment, a cathode compartment, and an anion-exchange membrane separating the compartments, and applying voltage of +0.6 to +1.5 volts versus a saturated calomel electrode to the anode.
摘要翻译： 通过电解再生废铁氯化物蚀刻组合物，其包括将含有总铁含量基本上等于新鲜蚀刻组合物的原始总铁含量的废三氯化铁蚀刻组合物引入到包含阳极室的电解池的阳极室中， 以及分离隔室的阴离子交换膜，并且相对于饱和甘汞电极向阳极施加+0.6至+1.5伏特的电压。
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公开(公告)号：EP0271837A3
公开(公告)日：1989-07-26
申请号：EP87118383.6
申请日：1987-12-11
IPC分类号： C23C18/18
CPC分类号： H05K3/181 , C23C18/1893
摘要： A dielectric substrate is conditioned for plating from an electroless metal plating bath by providing the surface or surfaces of the substrate that are to be plated with semiconductor material whereby the semiconductor material, in the case of n-type material, exhibits energy band where the valence band is equal to or higher than and, in the case of p-type material, exhibits energy band where the valence band is equal to or lower than the redox potential of the metallic ions in the electroless plating bath that are to be deposited as metal on the substrate.
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公开(公告)号：EP0117290A3
公开(公告)日：1986-01-22
申请号：EP83111416
申请日：1983-11-15
CPC分类号： H01M4/90 , C25B11/0494 , H01M8/08
摘要： Fuel cell catalysts which are efficient, long-lived, and refurbishable in-situ include gold carrying a UPD (underpotential deposited) deposit of another element. UPD Ag, Pt, Pd, Ir, Rh, or Tl, Pb, Bi is formed on Au crystallites which are carried on and bonded to the surfaces of substrate carbon particles. The crystallites cause dissociative adsorption of the oxygen molecules so that four electrons are produced per molecule during the reduction reaction which is involved. In an alkaline electrolyte, the catalyst metals such as Pd, lr, Ag, Rh and Ptshow no tendency to poison the counter electrode (counter relative to the other electrode) since each of those metals is a good catalyst for both electrodes. Suitable fuels include methanol (CH 3 OH), formaldehyde (HCHO), and formic acid (HCOOH).
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4.发明公开Method for determining the concentrations of organic additives in plating baths 失效用于确定镀层中有机添加剂浓度的方法
公开(公告)号：EP0114647A3
公开(公告)日：1985-10-02
申请号：EP84100446
申请日：1984-01-17
IPC分类号： G01N27/46
CPC分类号： G01N27/4161
摘要： The concentration of at least one organic additive in a plating bath is determined by providing a polished and preplated cathode, a reference electrode and anode in an electrolytic copper plating bath, passing an electric current from the anode to the cathode; measuring the voltage difference between the cathode and reference electrode; and comparing the difference to values for known concentrations of the at least one organic additive.
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公开(公告)号：EP0106197A2
公开(公告)日：1984-04-25
申请号：EP83109324.0
申请日：1983-09-20
CPC分类号： H01M4/926 , B01J23/40 , B01J23/50 , B01J37/348 , C25B11/0473 , H01M4/86 , H01M4/92 , H01M2300/0005 , H01M2300/0014 , Y10S204/09
摘要： A substrate (8) such as carbon, graphite, or various semiconductors is coated with a "two-dimensional" thin film plurality of characteristically dispersed or isolated flat crystallites (7) of platinum, palladium or silver to form a catalyst useful in a fuel cell. The method of formation of the catalyst is to place the substrate in an electrolyte such as H 2 PtCL 6 about 1% and one molar sulfuric acid. The potentiostatic pulse plating method is employed. A high potential pulse of very short duration is followed by a low potential of substantial duration. The very high potential nucleates crystals at various randomly distributed nucleation sites such as imperfections in the surface of the substrate. The resulting catalyst has a large surface area of hexagonal crystals about 20 to 40 Angstroms in diameter.
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6.发明公开System and method for automatically monitoring and maintaining desired concentrations of metal plating baths 失效用于自动监测和维护金属镀层的预期浓度的系统和方法
公开(公告)号：EP0180090A3
公开(公告)日：1987-03-18
申请号：EP85113091
申请日：1985-10-15
发明人： Arbach, Gary Vincent , Bindra, Perminder Singh , Light, David Noel , Rath, David Lee , Roldan, Judith Marie
CPC分类号： C23C18/1617 , C25D21/12
摘要： A system for the automatic, on-line analysis and control of additives in chemical processing solutions in manufacturing processes is disclosed. The automatic control system embodiment includes a sensing system such as measuring a cell (10) in which appropriate sensors are located. For electrochemical measurements, a three electrode cell with a rotating disk sensor is employed to control agitation of the sample solution. Other sensors on electrodes are used to measure pH and a thermometer is provided to monitor temperature. The sensing process, like the sampling process, is automatically controlled by a controller (18). The system, in addition to the sensing means and controller, further includes a plating tank (20), a mixing tank (22), a pump or control valve (24) and a reservoir (26). The measuring cell (10) may be disposed in the bath in a standard plating tank in which the plating bath solution is contained. Alternatively, a flow through tank may be used in which the plating solution may flow into and from as desired. When the sensing means so determines, a replenishment bath from the reservoir can be pumped into the mixing tank by means of the pump or control valve means under the command of signals from the controller which in turn receives output signals from the measuring cell.
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公开(公告)号：EP0106197A3
公开(公告)日：1985-11-27
申请号：EP83109324
申请日：1983-09-20
CPC分类号： H01M4/926 , B01J23/40 , B01J23/50 , B01J37/348 , C25B11/0473 , H01M4/86 , H01M4/92 , H01M2300/0005 , H01M2300/0014 , Y10S204/09
摘要： A substrate (8) such as carbon, graphite, or various semiconductors is coated with a "two-dimensional" thin film plurality of characteristically dispersed or isolated flat crystallites (7) of platinum, palladium or silver to form a catalyst useful in a fuel cell. The method of formation of the catalyst is to place the substrate in an electrolyte such as H 2 PtCL 6 about 1% and one molar sulfuric acid. The potentiostatic pulse plating method is employed. A high potential pulse of very short duration is followed by a low potential of substantial duration. The very high potential nucleates crystals at various randomly distributed nucleation sites such as imperfections in the surface of the substrate. The resulting catalyst has a large surface area of hexagonal crystals about 20 to 40 Angstroms in diameter.
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8.发明公开Methods for monitoring metal ion concentrations in plating baths 失效一种用于监测在Metallisierbädern金属离子的浓度的方法。
公开(公告)号：EP0151926A2
公开(公告)日：1985-08-21
申请号：EP85100107.3
申请日：1985-01-11
IPC分类号： G01N27/416 , G01N27/48 , G01N27/49
摘要： A rotating disk electrode system operates at constant speed in a solution whose metal ion concentration is held constant at multiple concentrations within a range of concentration. The current at the working electrode (16) is recorded, while the potential at the working electrode is swept by potential source (20) at a predetermined rate for each of the concentration values. The diffusion limiting current is determined by recorder (24) for each of the concentration values. Then the rotating disk electrode system is operated continuously in a metal plating bath (12) whose metal ion concentration can vary. A voltage applied to the working electrode produces a current at the electrode whose magnitude is compared to the values of the previous calibration to determine the current metal ion concentration. Alternatively, a rotating disk electrode system is operated over a range of speeds in a solution whose ion concentration is held constant over a range of concentration. Current at the working electrode is measured for a given electric potential applied to the working electrode. In this way, a calibration relationship between the current at the electrode and the range of metal ion concentrations is established which can be used with current measured in the plating bath under the same conditions as those that established the calibration curve to predict the concentration of the bath. ;
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公开(公告)号：EP0151926B1
公开(公告)日：1992-08-05
申请号：EP85100107.3
申请日：1985-01-11
IPC分类号： G01N27/416 , G01N27/48 , G01N27/49
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公开(公告)号：EP0151926A3
公开(公告)日：1988-08-31
申请号：EP85100107
申请日：1985-01-11
IPC分类号： G01N27/46
摘要： A rotating disk electrode system operates at constant speed in a solution whose metal ion concentration is held constant at multiple concentrations within a range of concentration. The current at the working electrode (16) is recorded, while the potential at the working electrode is swept by potential source (20) at a predetermined rate for each of the concentration values. The diffusion limiting current is determined by recorder (24) for each of the concentration values. Then the rotating disk electrode system is operated continuously in a metal plating bath (12) whose metal ion concentration can vary. A voltage applied to the working electrode produces a current at the electrode whose magnitude is compared to the values of the previous calibration to determine the current metal ion concentration. Alternatively, a rotating disk electrode system is operated over a range of speeds in a solution whose ion concentration is held constant over a range of concentration. Current at the working electrode is measured for a given electric potential applied to the working electrode. In this way, a calibration relationship between the current at the electrode and the range of metal ion concentrations is established which can be used with current measured in the plating bath under the same conditions as those that established the calibration curve to predict the concentration of the bath. ;
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