公开(公告)号：EP1235104A4

公开(公告)日：2008-10-01

申请号：EP01958481

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03F7/36 ,  G03H1/02

CPC classification number: C08L83/14 ,  C08L67/00 ,  C08L69/00 ,  C09D183/06 ,  G02B1/045 ,  G02B5/1857 ,  G02B6/124 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0757 ,  C08L2666/02 ,  C08L2666/28

Abstract: A composition having a refractive index sensitively changeable by a radiation which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes the above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated portion and a non-irradiated portion, which leads to the formation of a pattern having regions of different refractive indexes.

公开(公告)号：EP1413924A4

公开(公告)日：2006-08-02

申请号：EP02755662

申请日：2002-07-25

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  YAMADA KENJI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/312 ,  H01L23/12 ,  H05K1/00 ,  H05K1/16 ,  C08L101/00 ,  G03F7/36

CPC classification number: H05K1/162 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/26 ,  G03F7/38 ,  H01L21/02126 ,  H01L21/02186 ,  H01L21/02282 ,  H01L21/02343 ,  H01L21/02348 ,  H01L21/312 ,  H05K1/0286 ,  H05K2201/0116 ,  H05K2201/0187 ,  H05K2203/107 ,  H05K2203/1163 ,  Y10S430/106

Abstract: A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer.

公开(公告)号：EP1522567A4

公开(公告)日：2005-11-16

申请号：EP03728056

申请日：2003-05-12

Applicant: JSR CORP

Inventor： YOKOYAMA YASUAKI ,  BESSHO NOBUO ,  HANAMURA MASAAKI

IPC: B24B37/04 ,  B24B45/00 ,  C09J11/00 ,  C09J5/00 ,  C09J7/00 ,  C09J201/00 ,  H01L21/301 ,  H01L21/304

CPC classification number: B24B37/042 ,  B24B37/30 ,  H01L21/6835 ,  H01L2221/68327 ,  H01L2221/6834 ,  Y10T428/1059

Abstract: The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.

公开(公告)号：EP1375597A4

公开(公告)日：2004-05-26

申请号：EP02703943

申请日：2002-03-08

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  YAMADA KENJI

IPC: G02B1/04 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  C08L101/12 ,  G03F7/09

CPC classification number: G03F7/039 ,  G02B1/04 ,  G02B6/02033 ,  G03F7/001 ,  G03F7/0042 ,  G03F7/0043 ,  G03F7/0757 ,  C08L85/00 ,  C08L83/04

Abstract: A composition whose refractive index of a material is changed by a simple method, which can have a sufficiently large refractive index difference, and which provides a stable refractive index pattern and an optical material irrespective of their use conditions and a method for forming the refractive index pattern and the optical material. The above composition comprises (A) a decomposable compound, (B) a hydrolyzate of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium or tetramethoxysilane, or a halogen compound such as tetrachlorosilane and (C) a radiation sensitive decomposer and is sensitive to radiation.

Abstract translation: 可以通过简单的方法改变材料的折射率的组合物，其可以具有足够大的折射率差，并且不管其使用条件如何，提供稳定的折射率图案和光学材料，以及形成折射率的方法 图案和光学材料。 上述组合物包含（A）可分解化合物，（B）四丁氧基钛，四甲氧基锆，四甲氧基锗或四甲氧基硅烷等醇盐的水解产物或四氯硅烷等卤素化合物，（C）辐射敏感性分解剂， 对辐射敏感。

公开(公告)号：EP1369459A4

公开(公告)日：2008-05-21

申请号：EP02700597

申请日：2002-02-18

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  YAMADA KENJI

IPC: G02B5/18 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G02B3/00 ,  G02B5/02 ,  G02B6/00 ,  G02B6/12

CPC classification number: G03F7/001 ,  G02B5/1857 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0757 ,  Y10S428/913

Abstract: A radiation-sensitive composition capable of having a refractive index distribution which comprises (A) a decomposable compound, (B) a non-decomposable component containing inorganic oxide particles and (C) a radiation-sensitive decomposing agent; and a method for forming a refractive index pattern or an optical material which comprises irradiating the above composition with a radiation and then treating the resulting product with (D) a stabilizer. The method allows the preparation, with ease and simplicity, of a refractive index pattern or an optical material having a refractive index distribution including satisfactorily great refractive index change and being stable independently of the conditions wherein it is used.

公开(公告)号：EP1350814A4

公开(公告)日：2007-09-19

申请号：EP01270574

申请日：2001-12-06

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

CPC classification number: G03F7/0757 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/039

Abstract: A radiation-sensitive composition changing in refractive index which comprises (A) a decomposable compound, (B) a nondecomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation-sensitive decomposer, and (D) a stabilizer. When the composition is irradiated with a radiation through a pattern mask, the ingredients (C) and (A) in the irradiated areas decompose to cause a difference in refractive index between the irradiated areas and the unirradiated areas. Thus, a pattern having different refractive indexes is formed.