摘要:
According to an embodiment of the present disclosure, a method for patterning a substrate is provided. In some embodiments, the method includes patterning a hydrophobic film formed on a surface of a substrate, applying a target material, and oxidizing at least the surface of the applied target material. In some embodiments, the method further includes removing the hydrophobic film from the substrate.
摘要:
A method of selectively exposing a liquid photopolymer printing blank to actinic radiation to create a relief image printing plate and a liquid platemaking exposure system. The method includes: (1) positioning a programmable screen programmed with an image file of a desired image between the top glass and an upper source of actinic radiation; (2) exposing the layer of liquid photopolymer to actinic radiation from the upper source of actinic radiation through the programmable screen to crosslink and cure at least a portion of the liquid photopolymer adjacent to the backing sheet and create a floor layer therein; and (3) imagewise exposing the layer of liquid photopolymer to actinic radiation from a lower source of actinic radiation through a negative of the relief image to crosslink and cure selective portions of the liquid photopolymer on the floor layer and create the relief image therein.
摘要:
Oxime ester compounds of the formula V wherein Z 2 is for example unsubstituted or substituted C 7 -C 20 aroyl; R 1 , R 2 , R 3 , R 4 , R 5 and R 6 for example are hydrogen, halogen, or unsubstituted or substituted C 1 -C 20 alkyl, unsubstituted or substituted C 6 -C 20 aryl, or unsubstituted or substituted C 4 -C 20 heteroaryl; R 10 for example is hydrogen, halogen, OR 16 , unsubstituted or substituted C 1 -C 20 alkyl; R 14 is for example unsubstituted or substituted C 6 -C 20 aryl or C 3 -C 20 heteroaryl Q 3 is for example phenylene; L is for example O-alkylene-O-; R 15 is for example hydrogen or C 1 -C 20 alkyl; R 20 is for example hydrogen, or unsubstituted or substituted C 1 -C 20 alkyl; are effective photoinitiators.
摘要:
Provided is a hyperbranched polymer having such a backbone that is readily decomposable by an acid. The hyperbranched polymer is derived from, via reaction, monomers including a monomer (X) and a monomer (Y). The monomer (X) contains three or more hydroxy groups per molecule. The monomer (Y) contains two or more groups represented by General Formula (y) per molecule. The monomer (X) includes at least one compound selected from the group consisting of cyclodextrins, compounds represented by General Formula (I), pillararenes, compounds represented by General Formula (II), compounds represented by General Formula (III), and compounds represented by General Formula (IV). The monomer (Y) includes a compound represented by General Formula (1). General Formulae (y), (I), (II), (III), (IV), and (1) are expressed as follows:
摘要:
An object of the present invention is to provide photosensitive resin composition which can achieve both resolution of a fine pattern and conductivity after a heat treatment. The present invention provides a photosensitive resin composition including: (A) conductive fine particles whose surfaces are coated with an elemental carbon and/or a carbon compound, and (B) an alkali-soluble resin having an acid dissociating group.
摘要:
The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): wherein, each R° independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.
摘要:
The present invention relates to a method for manufacturing vertical optical coupling structures (1) between first optical or optoelectronic components (2) and second optical or optoelectronic components (3). Said vertical optical coupling structures are made by: (i) depositing a main layer (A) onto a substrate (25) including second optical or optoelectronic components; and (ii) lithography and/or physico-chemical etching of the main layer. Each vertical optical coupling structure is made such as to be located facing and making contact with a second optical component located in the substrate. The unitary main layer comprises generally frusto-conical coupling portions (12) consisting of a material having a refractive index greater than the refractive index of air. The coupling portions each have: a first transverse end surface (121) for making contact with the sending or receiving surface (21) of a first optical or optoelectronic component; and a second transverse end surface (122) that is in contact with the sending or receiving surface (31) of the second optical or optoelectronic component.
wherein Z 2 is for example unsubstituted or substituted C 7 -C 20 aroyl; R 1 , R 2 , R 3 , R 4 , R 5 and R 6 for example are hydrogen, halogen, or unsubstituted or substituted C 1 -C 20 alkyl, unsubstituted or substituted C 6 -C 20 aryl, or unsubstituted or substituted C 4 -C 20 heteroaryl; R 10 for example is hydrogen, halogen, OR 16 , unsubstituted or substituted C 1 -C 20 alkyl; R 14 is for example unsubstituted or substituted C 6 -C 20 aryl or C 3 -C 20 heteroaryl Q 3 is for example phenylene; L is for example O-alkylene-O-; R 15 is for example hydrogen or C 1 -C 20 alkyl; R 20 is for example hydrogen, or unsubstituted or substituted C 1 -C 20 alkyl; are effective photoinitiators.
摘要:
A method of patterning a conductive polymer includes providing a conductive polymer layer (13) coated over a first support (11) followed by pattern-wise transferring a layer containing polyvinyl acetal (22) from a second support (21) onto the conductive polymer (13) to form a mask (25) with at least one opening. The masked conductive polymer (13) is subjected to treatment through the opening that changes the conductivity of the conductive polymer (13) by at least one order of magnitude in areas not covered by the mask (25).
摘要:
The present invention relates to substrates for biological testing produced from photo-curable epoxy compositions which further include carboxyl-containing monomers such as acrylic acid, 2-carboxyethyl acrylic acid, 4-vinylbenzoic acid, or 3-Acrylamido-3-methyl-1-butanoic acid, or glycidyl methacrylate, etc. The photo-curable compositions may be used to cast films or fabricate beads, magnetic beads, or magnetic beads containing nickel barcodes. The resulting various kinds of films, beads, magnetic beads, or magnetic beads containing nickel barcodes may find use in clinical or biological applications.