RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION
    2.
    发明公开
    RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION 审中-公开
    树脂组合物微构造FOR地层微结构的形成与方法

    公开(公告)号:EP2133747A1

    公开(公告)日:2009-12-16

    申请号:EP08711659.6

    申请日:2008-02-20

    申请人: JSR Corporation

    IPC分类号: G03F7/40 H01L21/027

    CPC分类号: G03F7/40

    摘要: A resin composition which can increase the pattern shrink rate while maintaining the advantages of capability of effectually and precisely micronizing the resist pattern gaps irrespective of the surface conditions of the substrate and forming resist patterns exceeding the wavelength limit economically at low cost in a good condition having only small defects, and a method of efficiently forming a micropattern using the resin composition are disclosed. The resin composition for forming a micropattern includes a hydroxyl group-containing resin, a crosslinking component, and an alcohol solvent which contains an alcohol and not more than 10 mass% of water relative to the total solvent. The crosslinking component includes a compound having two or more acryloyloxy groups in the molecule.

    摘要翻译: 的树脂组合物可以提高图案的收缩率,同时保持有效地能力的优点,并且精确地微粉化,而不管基片的表面状态的抗蚀剂图案的间隙和成形以低成本在具有良好的条件在经济上的抗蚀剂图案超过波长限度 只有小的缺陷,并有效地形成微图案使用该树脂组合物的方法是游离缺失光盘。 用于形成微图案的树脂组合物包括含羟基的树脂,交联组分,和在醇溶剂中在醇与不超过10%,相对于总溶剂水的质量含有。 该交联组分包括具有两个或多个丙烯酰氧基的分子中基团的化合物。

    FILLER FOR AFFINITY CHROMATOGRAPHY AND METHOD FOR ISOLATING IMMUNOGLOBULIN
    4.
    发明公开
    FILLER FOR AFFINITY CHROMATOGRAPHY AND METHOD FOR ISOLATING IMMUNOGLOBULIN 审中-公开
    FURLLSTOFFFÜRAFFINITÄTSCHROMATOGRAPHIEUND VERFAHREN ZUR ISOLIERUNG VON IMMUNGLOBULIN

    公开(公告)号:EP2574631A1

    公开(公告)日:2013-04-03

    申请号:EP11759404.4

    申请日:2011-03-23

    申请人: JSR Corporation

    摘要: Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier.

            R-R 2      (1)

    wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and R 2 represents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R 2 .

    摘要翻译: 提供具有优异的耐碱性的亲和色谱法的填充剂和分离免疫球蛋白的方法。 用于亲和层析的填料是其中由下式(1)表示的蛋白质固定在载体上的填料。 €ƒ€ƒ€ƒ€ƒ€ƒ€ƒR-R 2€ƒ€ƒ€ƒ€ƒ(1)其中R表示由含有区域的4至300个氨基酸残基组成的氨基酸序列 由4至20个连续组氨酸残基组成; 并且R 2表示能够结合免疫球蛋白的氨基酸序列,所述氨基酸序列由含有蛋白A的Z结构域或其片段的50至500个氨基酸残基或其变体组成,条件是R与C- R 2的末端或N末端。

    FILLER FOR AFFINITY CHROMATOGRAPHY
    5.
    发明公开
    FILLER FOR AFFINITY CHROMATOGRAPHY 有权
    用于亲和色谱的填充剂

    公开(公告)号:EP2562178A1

    公开(公告)日:2013-02-27

    申请号:EP11765573.8

    申请日:2011-03-29

    申请人: JSR Corporation

    摘要: Provided is a filler for affinity chromatography which is useful for protein purification and contains porous particles that have a high dynamic binding capacity for proteins and excellent pressure characteristics. The filler for affinity chromatography of the present invention is characterized in that it includes a porous particle consisting of a polymer of vinyl monomer including a cross-linkable vinyl monomer that contains hydroxyl group but does not contain epoxy group and an epoxy group-containing non-cross-linkable vinyl monomer, or a cross-linkable vinyl monomer that contains hydroxyl group and epoxy group, ligands bound to the porous particle, and ring-opened epoxy groups.

    摘要翻译: 本发明提供一种用于蛋白质纯化的亲和色谱用填充剂,其含有对蛋白质具有高动态结合能力和优异的压力特性的多孔颗粒。 本发明的亲合色谱用填充剂的特征在于,含有由乙烯基单体的聚合物构成的多孔粒子,该乙烯基单体含有含羟基但不含环氧基的交联性乙烯基单体, 可交联的乙烯基单体或含有羟基和环氧基团的可交联乙烯基单体,与多孔颗粒结合的配体和开环环氧基团。

    RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN
    6.
    发明公开
    RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN 审中-公开
    HARZZUSAMMENSETZZZZZUULLICHMACHUNG EINES RESISTMUSTERS电阻器

    公开(公告)号:EP2128706A1

    公开(公告)日:2009-12-02

    申请号:EP08721759.2

    申请日:2008-03-11

    申请人: JSR Corporation

    IPC分类号: G03F7/40 H01L21/027

    摘要: A resist pattern formation method includes (1) a step of forming a first resist pattern which includes forming a first resist layer on a substrate, selectively exposing the first resist layer to radiation through a mask, and developing the exposed first resist layer, (2) a step of insolubilizing the first resist pattern by coating the first resist pattern with a resist pattern insolubilizing resin composition, baking or curing with UV, and developing the resist pattern insolubilizing resin composition, (3) a step of forming a second resist layer on the insolubilized resist pattern and selectively exposing the second resist layer to radiation through a mask, and (4) a step of developing the exposed second resist layer to form a second resist pattern.

    摘要翻译: 抗蚀剂图案形成方法包括:(1)形成第一抗蚀剂图案的步骤,该第一抗蚀剂图案包括在基板上形成第一抗蚀剂层,通过掩模选择性地将第一抗蚀剂层暴露于辐射,以及使曝光的第一抗蚀剂层显影 )通过用抗蚀剂图案不溶化树脂组合物涂布第一抗蚀剂图案,用UV烘烤或固化并使抗蚀剂图案不溶化树脂组合物显影来使第一抗蚀剂图案不溶化的步骤,(3)在第二抗蚀剂图案上形成第二抗蚀剂层的步骤 所述不溶解的抗蚀剂图案并且通过掩模选择性地暴露所述第二抗蚀剂层,以及(4)使所述暴露的第二抗蚀剂层显影以形成第二抗蚀剂图案的步骤。