DIAMOND SUBSTRATE AND MANUFACTURING METHOD FOR SAME

    公开(公告)号:EP4357492A1

    公开(公告)日:2024-04-24

    申请号:EP22824748.2

    申请日:2022-05-24

    IPC分类号: C30B29/04

    CPC分类号: C30B29/04

    摘要: The present invention provides a method for manufacturing a diamond substrate, the method being a method for producing a (111) oriented diamond crystal on an underlying substrate by epitaxial growth using hydrogen-diluted methane as a main source gas by a microwave plasma CVD method, a direct current plasma CVD method, a hot-filament CVD method, or an arc discharge plasma jet CVD method, in which a growth rate is less than 3.8 µm / h. Thereby, a diamond crystal applicable to an electronic and magnetic device and a method to produce this crystal are stably provided in which the crystal with the NV axis with [111] orientation and high-density NVC obtained by the CVD method under a predetermined condition is grown on a highly oriented (111) diamond base substrate obtained by the CVD method also under a predetermined condition.