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1.发明公开LEVITATION TRANSPORTATION DEVICE AND LEVITATION TRANSPORTATION METHOD 审中-公开SCHWEBETRANSPORTVORRICHTUNG UND SCHWEBETSPORTVERFAHREN
公开(公告)号：EP1770032A1
公开(公告)日：2007-04-04
申请号：EP05753450.5
申请日：2005-06-22
CPC分类号： B65G51/03 , B65G47/24 , H01L21/67784
摘要： A levitation transportation device capable of adjustment when an object being transported is displaced from the center of a transportation path, A levitation transportation device having a transportation path forming a transportation router for an object to be transported, a plurality of jetting nozzles for transporting the object in a levitated manner along the transportation path, one or more detection sections for detecting the direction of the transportation of the object being transported in the transportation path and a control section for independently controlling the plurality of jetting nozzles based on a detection result by the detection sections.
摘要翻译： 一种能够在被输送物体从输送路径的中心偏移时能够进行调节的悬浮输送装置，具有形成用于被输送物体的输送路线器的输送路径的悬浮输送装置，用于输送被检体的多个喷射喷嘴 沿着传送路径以悬浮方式，一个或多个检测部分，用于检测传送路径中被传送物体的传送方向;以及控制部分，用于根据检测结果独立地控制多个喷嘴 部分。
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2.发明公开VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS 有权VERDAMPFUNGSVORRICHTUNG MIT VERDAMPFUNGSVORRICHTUNG AUSGESTATTETE FILMBILDUNGSVORRICHTUNG
公开(公告)号：EP2154711A1
公开(公告)日：2010-02-17
申请号：EP08752777.6
申请日：2008-05-15
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/407 , C23C16/4486
摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.
摘要翻译： 由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构，所以该装置难以定位喷嘴，并且该装置不能精确地控制 与要发放到蒸发单元中的原料溶液混合的载气的压力和流速，因此难以高精度地控制MOCVD膜的组成。 多个气体通道设置在平坦的盘形板上。 利用这种结构，可以使喷嘴的精确定位变得更容易，并且可以高精度地控制MOCVD膜的组成。
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3.发明公开VAPORIZER, VARIOUS APPARATUSES INCLUDING THE SAME AND METHOD OF VAPORIZATION 审中-公开VERDAMPFER，VERSCHIEDENE，DIESEN ENTHALTENDE VORRICHTUNGEN UND VERDAMPFUNGSVERFAHREN
公开(公告)号：EP1533835A1
公开(公告)日：2005-05-25
申请号：EP03733161.8
申请日：2003-05-29
IPC分类号： H01L21/205
CPC分类号： C23C16/40 , C23C16/4481 , C23C16/4486 , H01L21/6708
摘要： There is provided a vaporizer which can be used for a long period of time without being clogged and can supply a raw material stably to a reaction section. An object of the present invention is to provide a vaporizer which can supply a raw material adjusted to a stoichiometric ratio continuously and stably and has an effect of decreasing the quantity of residual carbon in a formed film, a disperser, a film forming apparatus, and a vaporizing method, and a dispersing method and a film forming method. The vaporizer for vaporizing a raw material solution contained in a carrier gas is characterized in that means for containing a solvent for the raw material solution in the carrier gas before containing the raw material solution is provided.
摘要翻译： 提供了一种长时间使用而不被堵塞并可将原料稳定地供应到反应段的蒸发器。 本发明的目的是提供一种蒸发器，其能够连续稳定地供给调整为化学计量比的原料，并且具有减少成形膜，分散器，成膜装置中的残留碳量的效果 蒸发法，分散方法和成膜方法。 用于汽化包含在载气中的原料溶液的蒸发器的特征在于，在包含原料溶液之前，提供了用于在载气中含有原料溶液的溶剂的装置。
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4.发明公开FERROELECTRIC THIN FILM, METAL THIN FILM OR OXIDE THIN FILM, AND METHOD AND APPARATUS FOR PREPARATION THEREOF, AND ELECTRIC OR ELECTRONIC DEVICE USING SAID THIN FILM 审中-公开“FERRO ELECTRIC薄膜金属薄膜的氧化物薄膜和方法以及制造装置技术ITS和电气或电子元件WITH THIN FILM”
公开(公告)号：EP1363320A1
公开(公告)日：2003-11-19
申请号：EP02715794.0
申请日：2002-01-18
发明人： YAMOTO, Hisayoshi, WACOM ELECTRIC CO., LTD , TODA, Masayuki , FUKAGAWA, Mitsuru, WACOM ELECTRIC CO, LTD , UMEDA, Masaru, KABUSHIKI KAISHA WATANABE SHOKO , FUKAGAWA, Mitsuru, c/o WACOM ELECTRIC CO., LTD
IPC分类号： H01L21/316 , H01L21/31
CPC分类号： H01L27/11502 , C23C16/40 , C23C16/4486 , H01L21/31691 , H01L27/11507 , H01L28/55
摘要： The object of the present invention is to provide a ferroelectric thin film that has the best range of the composition where an excellent remanent polarization characteristic is obtained and, at the same time, has a bismuth type layered crystal structure with high reliability.
The ferroelectric thin film of the present invention is a ferroelectric thin film of layered crystal structure comprising at least-tantalum and oxygen (O) among carbon, Strontium (Sr), bismuth (Bi), tantalum (Ta), and niobium (Nb), characterized by assuming the composition formula to be SrBi y Ta 2 O 9±d or Sr x Bi y (Ta,Nb) 2 O 9±d (provided that, 0.90≦x摘要翻译： 本发明的目的是提供一种铁电薄膜确实具有这样优异的保持性偏振特性得到，并且同时，具有可靠性高的铋型层状晶体结构的组合物的最佳范围内。 的本发明的强电介质薄膜是层状晶体结构的铁电薄膜，其含有碳中的至少 - 钽和氧（O），锶（Sr），铋（Bi），钽（Ta）和 铌（Nb），通过假设组成式为SrBiyTa2O9 +/- d或SrxBiy（钽，铌）2O9 +/-ð表征（条件是，0.90
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公开(公告)号：EP1005076A1
公开(公告)日：2000-05-31
申请号：EP98907223.6
申请日：1998-03-13
CPC分类号： H01L21/6838
摘要： It is an object of the present invention to provide a substrate body floating apparatus which insures a stable floating state of a substrate body with less vibration of a rotation axis or a surface thereof and a heater and a film-forming apparatus capable of forming a homogeneous film without losing cleanliness of a surface of a substrate body and with small temperature gradation on a surface of a substrate body as well as small density gradation of a raw material used for forming a film on a substrate body in a wide area.
The substrate body floating apparatus according to the present invention has a floating unit for floating and rotating a disk-shaped substrate body by blowing an air flow to a rear surface of the substrate body, said floating unit comprising a group of fine pores for floating the substrate body, a group of fine pores for fixing the substrate body at a center of the apparatus, a group of fine pores for rotating the substrate body at a center of the apparatus, and a group of auxiliary fine pores for suppressing vibration of the substrate body when the substrate body is rotated at a high speed. Also the substrate body floating type of heater and film-forming apparatus have the floating unit described above respectively.摘要翻译： 本发明的目的是提供一种基板体浮动装置，其确保基板主体的稳定的浮动状态，其具有较少的旋转轴线或其表面的振动，以及加热器和能够形成均匀的膜形成装置 薄膜，而不损害基板表面的清洁度，并且在基板主体的表面上具有较小的温度梯度，以及在广泛区域中用于在基板主体上形成薄膜的原料的小密度等级。 根据本发明的基板体浮置装置具有浮动单元，用于通过向基板主体的后表面吹送空气流来浮动和旋转盘形基板主体，所述浮动单元包括一组用于浮动的基板 基板主体，用于将基板固定在设备的中心的一组细孔，用于使基板主体在设备的中心旋转的一组细孔和一组用于抑制基板的振动的辅助细孔 当基板主体高速旋转时， 基板体浮动式的加热器和成膜装置也分别具有上述浮动单元。
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6.发明授权VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS 有权膨胀装置和与膨胀设备EQUIPPED成膜装置
公开(公告)号：EP2154711B1
公开(公告)日：2013-10-16
申请号：EP08752777.6
申请日：2008-05-15
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/407 , C23C16/4486
摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.
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7.发明公开CARBURETOR, VARIOUS TYPES OF DEVICES USING THE CARBURETOR, AND METHOD OF VAPORIZATION 有权VERDAMPFER UND DIE BESCHICTUNGSVORRICHTUNG MIT DEM VERDAMPFER
公开(公告)号：EP1361610A1
公开(公告)日：2003-11-12
申请号：EP02715811.2
申请日：2002-01-18
发明人： TODA, Masayuki , FUKAGAWA, Mitsuru, c/o WACOM ELECTRIC CO., LTD , UMEDA, Masaru, c/o KABUSHIKI KAISHA WATANABE SHOKO , FUKAGAWA, Mitsuru, c/o WACOM ELECTRIC CO., LTD
IPC分类号： H01L23/31
CPC分类号： H01L27/11502 , B01B1/005 , B01D3/346 , B01F3/04021 , B01F5/0646 , B01F5/0653 , B01F5/0656 , B01F5/0671 , B01F5/0676 , C23C16/40 , C23C16/409 , C23C16/4486 , H01L21/31691 , H01L27/11507 , H01L28/55 , Y10S261/65
摘要： To provide a vaporizer which can be used long time without blockage, and possible to stably supply raw materials to reaction part.
A gas passage 2 formed inside of main body of a dispersion part 1, a gas inlet opening 4 to introduce pressurized carrier gas 3 into gas passage 2, a means 6 to supply raw material solution 5 to carrier gas passing gas passage 2, a gas outlet 7 to send carrier gas including dispersed raw material solution 5 to vaporization part 22, a dispersion part 8 to flow through gas passage 2 having means 18 to cool, a vaporization pipe 20 connected with a reaction part and gas outlet 7 of dispersion part 8 of the device, and a heater 21 to heat vaporization pipe 20 is provided, a vaporization part 22 to heat and vaporizes the carrier gas where raw materials solution is dispersed is provided, and a radiation prevention portion 102 having small hole 101 for the outside of gas outlet 7 is provided.摘要翻译： 提供可以长时间不堵塞使用的蒸发器，并且可以稳定地将原料供应到反应部件。 在分散部1的主体内形成的气体通路2，将加压载气3导入气体通路2的气体导入口4，将原料溶液5供给到载气通过气体通路 2是将包含分散原料溶液5的载气送到汽化部22的气体出口7，流过具有冷却装置18的气体通路2的分散部8，与反应部连接的蒸发管20和气体出口7 设置有分散部8的加热器21和加热蒸发管20的加热器21，设置有分散有原料溶液的载气的蒸发蒸发部22，具有小孔101的防辐射部102 用于气体出口7的外部。
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8.发明公开VAPORIZER, VARIOUS DEVICES USING THE SAME, AND VAPORIZING METHOD 审中-公开VERDAMPFER，VERSCHIEDENE，DIESEN VERWENDENDE EINRICHTUNGEN UND VERDAMPFUNGSVERFAHREN
公开(公告)号：EP1492160A1
公开(公告)日：2004-12-29
申请号：EP03708661.8
申请日：2003-03-18
发明人： YAMOTO, Hisayoshi; c/o WACOM ELECTRIC CO., LTD , KUSUHARA, Mitsuru; c/o WACOM ELECTRIC CO., LTD , TODA, Masayuki
IPC分类号： H01L21/205
CPC分类号： C23C16/4481
摘要： There is provided a vaporizer that can be used for a long period of time without being clogged and can supply a raw material stably to a reaction section. The evaporator includes a dispersion section 8 having a gas passage 2 formed in a dispersion section body 1, a gas introduction port 4 for introducing a pressurized carrier gas 3 into the gas passage 2, means 6 for supplying a raw material solution 5 to the gas carrier passing through the gas passage 2, a gas outlet 7 for sending the carrier gas containing the dispersed raw material solution 5 to a vaporization section 22, and means 18 for cooling the gas passage 2; and the vaporization section 22 for heating and vaporizing the carrier gas in which the raw material solution is dispersed, having a vaporization tube 20 connected to the reaction section of an apparatus and the gas outlet 7 of the dispersion section 8, and a heater 21 for heating the vaporization tube 20, and is characterized in that the pressure of the reaction section is set lower than the pressure of the vaporization tube.
摘要翻译： 分散单元（8）的气体出口（7）将分散在气体通路（2）中的含有原料溶液（5）的载气送入蒸发单元（22）。 连接到气体出口的蒸发单元的蒸发管（20），当加热器（21）加热时，用溶液加热和蒸发载气。 还包括以下独立权利要求：（1）化学气相沉积装置; 和（2）汽化方法。
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公开(公告)号：EP1018477A1
公开(公告)日：2000-07-12
申请号：EP98917684.7
申请日：1998-04-24
CPC分类号： H01L21/67784
摘要： Air stream transfer apparatus capable of preventing particles in a transfer passage from adhering to an object to be processed and removing the particles.
The apparatus is characterized in that a transfer face and a transfer passage partition both constituting a transfer passage are made of an electroconductive material and each have a thin insulating layer on the surface; a planer dust collecting electrode is opposed to an object to be processed; means is provided for bringing the dust collecting electrode and the face to be cleared of dust close to each other while jetting air; and means is provide for applying voltages between the transfer face and the dust collecting electrode and between the transfer passage partition and the dust collecting electrode. Another apparatus is characterized in that a transfer face and a transfer passage partition both constituting a transfer passage are made of an electroconductive material and each has a thin insulating layer on the surface; means for transferring a pre-charged semiconductive plate-shaped body a float along the transfer passage is provided; and the semiconductive plate-shaped body is used as a dust collecting electrode.摘要翻译： 能够防止传送路径中的粒子附着于待处理物体并除去粒子的气流输送装置。 该装置的特征在于，构成传送通道的传送面和传送通道隔板由导电材料制成，并且每个在表面上具有薄的绝缘层; 平板式集尘电极与待处理物体相对; 提供了用于使灰尘收集电极和被清除的灰尘彼此靠近的同时喷射空气的装置; 并且提供用于在转印面和集尘电极之间以及转印通道分隔件和集尘电极之间施加电压的装置。 另一种装置的特征在于，构成传送通道的传送面和传送通道隔板由导电材料制成，并且每个在表面上具有薄的绝缘层; 提供了用于沿着传送通道传送预充电的半导体板状体浮子的装置; 并且半导体板状体用作集尘电极。
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公开(公告)号：EP0889515B1
公开(公告)日：2006-06-28
申请号：EP97912528.3
申请日：1997-11-21
IPC分类号： H01L21/00
CPC分类号： H01L21/67126 , H01L21/67724 , H01L21/67736
摘要： When a thin sheet-like substrate S is conveyed between conveying chambers (2) equipped with a processing apparatus (1) and kept in an inert gas atmosphere by using a conveying robot (30) equipped with an accommodation chamber (3) capable of accommodating the thin sheet-like substrate (S) in an inert gas atmosphere, a connection chamber (4) is interposed between the accommodation chamber (3) and the conveying chamber (2) when the thin sheet-like substrate (S) is transferred between the accommodation chamber (3) of the conveying robot (30) and the conveying chamber (2) on the side of the processing apparatus (1), and is vacuumized, and then an inert gas is introduced. Thereafter, gate valves (GV1 and GV2) of the accommodation chamber (3) and the conveying chamber (2) are opened and the thin sheet-like substrate (S) is carried in and out.
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