公开(公告)号：EP0968753A4

公开(公告)日：2002-10-29

申请号：EP98959174

申请日：1998-12-11

申请人： NIPPON OXYGEN CO LTD ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  ISHIHARA YOSHIO ,  MATSUMOTO KOH ,  KIMIJIMA TETSUYA

IPC分类号： B01D53/86

CPC分类号： B01D53/8659

摘要： A method for treating an exhaust gas, which comprises bringing an exhaust gas discharged from CVD equipment employing silicon-base gas into contact with a transition metal such as nickel or a silicide thereof preheated to a given temperature, thus decomposing a feed gas and high-boiling intermediates contained in the exhaust gas, and then rendering toxic components contained in the exhaust gas harmless.

摘要翻译： 一种用于处理废气的方法和装置，其中使含有含硅气体的CVD系统中排出的废气中包含的原料气体和高沸点中间产物与诸如镍的过渡金属接触 或这种过渡金属的硅化物分解或将其转化成稳定的卤化物，然后对废气中包含的有害成分进行解毒处理。

公开(公告)号：EP0889515A4

公开(公告)日：2004-10-20

申请号：EP97912528

申请日：1997-11-21

申请人： NIPPON OXYGEN CO LTD ,  TODA MASAYUKI ,  OHMI TADAHIRO

发明人： TODA MASAYUKI ,  OHMI TADAHIRO ,  ISHIHARA YOSHIO

IPC分类号： B65G49/00 ,  B65G49/07 ,  H01L21/677 ,  H01L21/68 ,  H01L21/00

CPC分类号： H01L21/67126 ,  H01L21/67724 ,  H01L21/67736

摘要： When a thin sheet-like substrate S is conveyed between conveying chambers (2) equipped with a processing apparatus (1) and kept in an inert gas atmosphere by using a conveying robot (30) equipped with an accommodation chamber (3) capable of accommodating the thin sheet-like substrate (S) in an inert gas atmosphere, a connection chamber (4) is interposed between the accommodation chamber (3) and the conveying chamber (2) when the thin sheet-like substrate (S) is transferred between the accommodation chamber (3) of the conveying robot (30) and the conveying chamber (2) on the side of the processing apparatus (1), and is vacuumized, and then an inert gas is introduced. Thereafter, gate valves (GV1 and GV2) of the accommodation chamber (3) and the conveying chamber (2) are opened and the thin sheet-like substrate (S) is carried in and out.

公开(公告)号：EP0809284A4

公开(公告)日：2001-04-18

申请号：EP96942663

申请日：1996-12-27

申请人： NIPPON OXYGEN CO LTD

发明人： TODA MASAYUKI ,  OHMI TADAHIRO ,  ISHIHARA YOSHIO

IPC分类号： B65G49/07 ,  G03F7/20 ,  H01L21/00 ,  H01L21/677 ,  H01L21/68

CPC分类号： H01L21/67253 ,  G03F7/7075 ,  G03F7/70933 ,  G03F7/70991 ,  H01L21/67242 ,  H01L21/67784 ,  Y10T29/41

摘要： A method and device by which the yield of a thin plate-like substrate of a semiconductor integrated circuit, liquid crystal panel, etc., is improved by always transferring the substrate to each processing device in a highly clean damage-free state when the substrate is subjected to various kinds of treatment. A substrate is transferred through a gas tunnel through which a purging gas composed of in insert gas or a mixed gas of an inert gas and oxygen gas is made to flow. The concentrations of impurities in the gas tunnel are measured with a semiconductor laser detector, and the transfer of the substrate is controlled based on the obtained measured data.

公开(公告)号：EP0983791A4

公开(公告)日：2000-05-03

申请号：EP98955950

申请日：1998-11-27

申请人： NIPPON OXYGEN CO LTD ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  ISHIHARA YOSHIO

IPC分类号： B01D53/46 ,  B01D53/00 ,  B01J3/00 ,  C01B23/00 ,  C23C16/44 ,  B01J3/02 ,  C23C16/50 ,  C23F4/00 ,  H01L21/203 ,  H01L21/205

CPC分类号： C01B23/001 ,  B01D53/00 ,  B01D2256/18 ,  B01D2258/0216 ,  B01J3/00 ,  C23C16/4412

摘要： A process and an apparatus for recovering a noble gas, which can recover a noble gas exhausted from a noble gas employing system efficiently and also can supply the noble gas of a predetermined purity to the noble gas employing system and which can reduce consumption of the noble gas. In the process and apparatus for recovering a noble gas, when a noble gas contained in an exhaust gas exhausted from a noble gas employing system operated under reduced pressure is recovered, switching between introduction of the exhaust gas to a recovery system and exhaustion of the exhaust gas to an exhaust system is carried out under reduced pressure, and this switching operation is carried out depending on the content of impurity components contained in the exhaust gas or on the running state of the noble gas employing system.

摘要翻译： 本发明提供一种稀有气体的回收方法和回收装置，能够使用稀有气体高效率地回收从设备排出的稀有气体，将规定纯度的稀有气体稳定地供给到同一设备，并减少稀有气体的消耗量，其中， 当从在真空下操作的稀有气体使用设备排出的废气中的稀有气体被回收时，将废气引入回收系统切换到/从相同气体排放到排气系统 根据废气中含有的杂质成分的浓度和稀有气体使用设备的运行条件进行该开关操作。